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Author: thomas lucatorto

Displaying records 91 to 100 of 101 records.
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91. XUV Optics Characterization at NIST,
Published: 1/1/1992
Authors: R N. Watts, Charles S Tarrio, Thomas B Lucatorto, R P. Madden, R Deslattes, Ariel Caticha, A Henins
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100210

92. XUV Optics Characterization at NIST,
Published: 1/1/1992
Authors: R N. Watts, Charles S Tarrio, Thomas B Lucatorto, R P. Madden, R Deslattes, Ariel Caticha, Albert Henins
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101843

93. National Institute of Standards and Technology Metrology for Soft-X-Ray Multilayer Optics,
Published: 1/1/1991
Authors: R N. Watts, D L Ederer, Thomas B Lucatorto, M Isaacson
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100212

94. National Institute of Standards and Technology Metrology for Soft-X-Ray Multilayer Optics,
Published: 1/1/1991
Authors: R N. Watts, D L Ederer, Thomas B Lucatorto, M Isaacson
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101839

95. Upgraded Facility for Multilayer Mirror Characterization at NIST, ed. by N.M. Ceglio
Published: 1/1/1991
Authors: R N. Watts, D L Ederer, R Deslattes, Thomas B Lucatorto, W T Estler, C J Evans, Theodore Vincent Vorburger
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100211

96. Upgraded Facility for Multilayer Mirror Characterization at NIST, ed. by N.M. Seglio
Published: 1/1/1991
Authors: R N. Watts, D L Ederer, R Deslattes, Thomas B Lucatorto, W T Estler, C J Evans, T V Vorburger
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=102936

97. At-Wavelength Metrology for EUV Lithography at NIST
Published: Date unknown
Authors: Charles S Tarrio, Steven E Grantham, Robert Edward Vest, Thomas B Lucatorto
Abstract: The National Institute of Standards and Technology (NIST) is active in many areas of metrology impacting extreme ultraviolet lithography. We will describe our activities in the areas of reflectometry, pulsed radiometry, and long-term multiplayer mir ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841693

98. Effect of Xenon Bombardment on Ruthenium-Coated Grazing Incidence Collector Mirror Lifetime for EUV Lithography
Published: Date unknown
Authors: M Nieto, J P Allain, V Titov, M R Hendricks, A Hassanein, D Rokusek, C Chrobak, Charles S Tarrio, Yaniv Barad, Steven E Grantham, Thomas B Lucatorto, Bryan Rice
Abstract: The effect of energetic Xenon ion bombardment on the extreme ultraviolet (EUV) reflectivity performance of mirrors is of vital importance for the performance of discharge- and laser-produced plasma extreme ultraviolet lithography (EUVL) sources. To s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840246

99. Facility for Pulsed Extreme Ultraviolet Detector Calibration
Published: Date unknown
Authors: Steven E Grantham, Robert Edward Vest, Charles S Tarrio, Thomas B Lucatorto
Abstract: All of the Extreme Ultraviolet light sources currently under consideration for Extreme Ultraviolet lithography are based on plasmas that emit radiation with a wavelength of approximately 13.4 nm. These sources whether they are produced by a discharg ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841761

100. Metrology for EUV Lithography Sources and Tools
Published: Date unknown
Authors: Steven E Grantham, Charles S Tarrio, Robert Edward Vest, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840201



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