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Author: joseph kopanski
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Displaying records 81 to 90 of 105 records.
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81. Assessment of Reliability Concerns for Wide-Temperature Operation of Semiconductor Devices and Circuits
Published: 1/20/1996
Authors: Joseph J Kopanski, David L. Blackburn, George Gibson Harman, David W. Berning
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=5016

82. 2D-Scanning Capacitance Microscopy Measurement of Cross-Sectional VLSI Test Structures
Published: 12/31/1995
Authors: G. Neubauer, A. Erickson, C. C. Williams, Joseph J Kopanski, M. Rodgers, D. Adderton
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=18647

83. Characterization of Two-Dimensional Dopant Profiles: Status and Review
Published: 12/31/1995
Authors: Alain C. Diebold, M. Kump, Joseph J Kopanski, David G Seiler
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=24280

84. Oxidation of SiC, in Properties of Silicon Carbide
Published: 12/31/1995
Author: Joseph J Kopanski
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=9046

85. Scanning Capacitance Microscopy Measurements and Modeling: Progress Towards Dopant Profiling of Silicon
Published: 12/31/1995
Authors: Joseph J Kopanski, Jay F. Marchiando, J R. Lowney
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=9950

86. Scanned Probe Techniques for the Electrical Characterization of Semiconductor Devices
Published: 7/1/1995
Authors: John A. Dagata, Joseph J Kopanski
Abstract: The spatial resolution, sensitivity, and accuracy required for electrical characterization of device structures in the semiconductor industry suggest that scanned probe microscopy (SPM) tools may offer an alternative to existing measurement technique ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820733

87. Scanning Probe Techniques for the Electrical Characterization of Semiconductor Devices
Published: 7/1/1995
Authors: John A. Dagata, Joseph J Kopanski
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=16678

88. Characterization of Two-Dimensional Dopant Profiles: Status and Review, Extended Abstracts
Published: 12/31/1994
Authors: Alain C. Diebold, M. Kump, Joseph J Kopanski, David G Seiler
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=1068

89. Scanning Capacitance Microscopy for Profiling PN-Junctions in Silicon
Series: NIST Interagency/Internal Report (NISTIR)
Published: 12/1/1994
Authors: Joseph J Kopanski, Jay F. Marchiando, J R. Lowney, David G Seiler
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=27180

90. Semiconductor Measurement Technology: Improved Characterization and Evaluation Measurements for HgCdTe Detector Materials, Processes and Devices Used on the GOES and TIROS Satellites
Series: Special Publication (NIST SP)
Published: 4/1/1994
Authors: David G Seiler, J R. Lowney, W. Robert Thurber, Joseph J Kopanski, George Gibson Harman
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=13439



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