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Author: shannon hill
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11. Optics go to extremes in EUV lithography
Steven Grantham, Charles S. Tarrio, Shannon Bradley Hill, Thomas B Lucatorto
12. Patterning of Octadecylsiloxane Self-assembled Monolayers on Si(100) using Ar(^u3^P^d0^,2) Atoms
Shannon Bradley Hill, C Haich, F Dunning, G Walters, Jabez J McClelland, Robert Celotta, H Craighead, J Han, D Tannenbaum
^u^^d^ We report the use of metastable (Ar^u3^P^d0,2^) atoms and a physical mask to pattern octadecylsiloxane self-assembled monolayers grown directly onsilicon surfaces. The damage to the monolayer is confirmed using lateral force microscopy, change ...
13. SURF III: A flexible Synchrotron Radiation Source for Radiometry and Research
Uwe Arp, Charles W Clark, Lu Deng, Nadir Sabirovich Faradzhev, Alex P. Farrell, Mitchell L. Furst, Steven Grantham, Edward Walter Hagley, Shannon Bradley Hill, Thomas B Lucatorto, Ping-Shine Shaw, Charles S. Tarrio, Robert Edward Vest
The calculability of synchrotron radiation (SR) makes electron storage rings wonderful light sources for radiometry. The broadband nature of SR allows coverage of the whole spectral region from the x-ray to the far-infrared. Compact low-energy storag ...
14. Saturation effects in solid state photodiodes and impact on EUVL pulse energy measurements,
Robert Edward Vest, Shannon Bradley Hill, Steven Grantham
15. The NIST EUV facility for advanced photoresist
qualification using the witness-sample test
Steven Grantham, Charles S. Tarrio, Shannon Bradley Hill, Lee J Richter, Thomas B Lucatorto, J. van Dijk, C. Kaya, N. Harned, R. Hoefnagels, M. Silova, J. Steinhoff
Before being used in an extreme-ultraviolet (EUV) scanner, photoresists must first be qualified to ensure that they will not excessively contaminate the scanner optics or other parts of the vacuum environment of the scanner. At the National Institute ...