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11. Nanotechnology with Atom Optics
Jabez J McClelland, Shannon Bradley Hill, M Pichler, Robert Celotta
A brief review of atom optics is presented, with emphasis on how it can be applied in the field of nanotechnology. Two specific examples are discussed: laser-focused atomic deposition and deterministic production of single atoms. Results are summar ...
12. A Fast, Deterministic Source of Single Cr Atoms
Jabez J McClelland, Shannon Bradley Hill
We produce single Cr atoms on demand by feedback control of loading and loss from a magneto-optical trap. We observe single-atom occupation probabilities of over 98% and efficient ejection at rates up to 10 Hz.
13. Characterization of an Infrared Spectrograph for Non-Contact Thermometry Applications Using a Sodium Heat Pipe Blackbody, ed. by A.E. Rozlosnik and R.B. Dinwiddie
Benjamin K Tsai, J F Widmann, M Bundy, Shannon Bradley Hill
14. Patterning of Octadecylsiloxane Self-assembled Monolayers on Si(100) using Ar(^u3^P^d0^,2) Atoms
Shannon Bradley Hill, C Haich, F Dunning, G Walters, Jabez J McClelland, Robert Celotta, H Craighead, J Han, D Tannenbaum
^u^^d^ We report the use of metastable (Ar^u3^P^d0,2^) atoms and a physical mask to pattern octadecylsiloxane self-assembled monolayers grown directly onsilicon surfaces. The damage to the monolayer is confirmed using lateral force microscopy, change ...
15. Optics for Extreme Ultraviolet Lithography
Steven Grantham, Charles S. Tarrio, Shannon Bradley Hill, Thomas B Lucatorto
Extreme Ultraviolet Lithography (EUVL) is considered by many to be the next generation lithography that will fabricate integrated circuits in the next decade. Although EUVL is conceptually similar to optical or deep-UV lithography, it represents a m ...