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You searched on: Author: michael fasolka

Displaying records 51 to 60 of 67 records.
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51. Mapping Chemical Heterogeneity of Polymeric Materials with Chemical Force Microscopy
Published: 1/1/2004
Authors: Tinh Nguyen, Xiaohong Gu, Michael J Fasolka, Kimberly A Briggman, Jeeseong Hwang, Alamgir Karim, Jonathan W. Martin
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853919

52. Characterizing Surface Roughness of Thin Films by Polarized Light Scattering
Published: 11/1/2003
Authors: Thomas Avery Germer, Michael J Fasolka
Abstract: The polarization of light scattered by the surface of a material contains information that can be used to identify the sources of that scatter. In this paper, first order vector perturbation theory for light scattering from interfacial roughness of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841994

53. Fourier Analysis Near-Field Polarimetry for Measurement of Local Optical Properties of Thin Films
Published: 7/1/2003
Authors: Lori S. Goldner, Michael J Fasolka, S Nougier, H P Nguyen, Garnett W Bryant, Jeeseong Hwang, K D. Weston, Kathryn L Beers, A Urbas, Edwin L Thomas
Abstract: We present measurements of the local dichroism and birefringence of thin film specimens us ing techniques that combine near-field scanning optical microscopy (NSOM) and a novel polarization modulation (PM) polarimetry utilizing Fourier analysis of th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841663

54. Chemically Amplified Resist Fundamentals Studies by Combinatorial approaches
Published: 3/1/2003
Authors: M Wang, Vivek M Prabhu, Eric K Lin, Michael J Fasolka, Alamgir Karim
Abstract: Sub-100 nm lithography requires more understanding of photoresist material properties and processing conditions to achieve necessary critical dimension control of patterned structures. As resist thickness and feature linewidth decrease, fundamental ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852278

55. Near-Field Polarimetric Characterization of Semi-Crystalline Polymer Systems
Published: 3/1/2003
Authors: S N Goldie, Michael J Fasolka, Lori S. Goldner, Jeeseong Hwang, Kathryn L Beers
Abstract: We have studied crystallization in thin films of isotactic polystyrene (iPS) to better understand the morphology and formation of these structures through the use of polarization modulation near-field scanning optical microscopy (PM-NSOM). Polymer cr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841696

56. Enhancing Sensitivity of Atomic Force Microscopy for Characterizing Surface Chemical Heterogeneity
Published: 2/26/2003
Authors: Xiaohong Gu, Mark R VanLandingham, Michael J Fasolka, Jonathan W. Martin, J Y Jean, Tinh Nguyen
Abstract: In this study, a well-controlled humidity system is used to enhance the sensitivity of A-FM in characterizing surface chemical heterogeneity. The relative humidity of the tip-sample environment is controlled using a humidity generator and a novel sm ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=860482

57. Nanoscale Chemical Imaging of Polymeric Materials With Atomic Force Microscopy
Published: 2/26/2003
Authors: Xiaohong Gu, Tinh Nguyen, Michael J Fasolka, D Julthongpiput, Lei Chen, Mark R VanLandingham, Y C Jean, Jonathan W. Martin
Abstract: Nanoscale spatial chemical information is essential to developing a molecular-level understanding of a variety of phenomena occurring at surfaces and interfaces, including adhesion, friction, and surface reactivity. Therefore, the ability to probe an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=860547

58. Measuring Local Optical Properties: Near-Field Polarimetry of Photonic Block Copolymer Morphology
Published: 1/10/2003
Authors: Michael J Fasolka, Lori S. Goldner, Jeeseong Hwang, A Urbas, P DeRege, T Swager, Edwin L Thomas
Abstract: Due to their microphase separated morphology, block copolymers (BC) can exhibit photonic behavior if their domain periodicity is sufficiently large (>100 nm) [1]. Classical spectroscopic characterization of these optical properties is routine, but o ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841534

59. Combinatorial Methods Study of Confinement Effects on the Reaction Front in Ultrathin Chemically Amplified Photoresists
Published: 1/1/2003
Authors: M Wang, Eric K Lin, Alamgir Karim, Michael J Fasolka
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853895

60. Enhancing Sensitivity of Atomic Force Microscopy for Characterizing Surface Chemical Heterogeneity
Published: 1/1/2003
Authors: Xiaohong Gu, Mark R VanLandingham, Michael J Fasolka, Jonathan W. Martin, J Y Jean, Tinh Nguyen
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853857



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