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You searched on: Author: nien zhang

Displaying records 41 to 50 of 71 records.
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41. Performance Evaluation of Approaches to Combining Results From Multiple Methods
Published: 4/1/2003
Authors: Hung-Kung Liu, Nien F Zhang
Abstract: The problem of determining a consensus mean and its uncertainty from the results of multiple measurement methods or laboratories is an important problem. Many solutions, both Bayesian and non-Bayesian, to this problem have been proposed over the ye ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=50804

42. Statistical Uncertainty Analysis of Key Comparison CCEM-K2
Published: 4/1/2003
Authors: Nien F Zhang, N Sedransk, Dean G Jarrett
Abstract: The details of a statistical uncertainty analysis applied to key comparison CCEM-K2 are reported. The analysis presented here provides an approach for addressing known correlations which have been of concern in reporting key comparison results. Un ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=51094

43. A Study on the Variance Estimation for a Stationary Process in SPC
Published: 2/1/2003
Author: Nien F Zhang
Abstract: Recently, statistical process control (SPC) methodologies have been developed to accommodate autocorrelated data. To construct control charts for stationary process data, the process variance needs to be estimated. For an independently identically d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=50811

44. Statistical Uncertainty Analysis of CCEM-K2 Comparisions of Resistance Standards
Published: 6/1/2002
Authors: Nien F Zhang, N Sedransk, Dean G Jarrett
Abstract: Details of the statistical uncertainty analysis applied to key comparison CCEM-K2 are reported. Formulas were derived to determine the uncertainty of the combined difference between the measurements of multiple artifacts by an NMI and the correspondi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=30821

45. Statistical Uncertainty Analysis of CCEM-K2 Comparisons of Resistance Standards
Published: 6/1/2002
Authors: Nien F Zhang, N Sedransk, Dean G Jarrett
Abstract: Details of the statistical uncertainty analysis applied to key comparison CCEM-K2 are reported. Formulas were derived to determine the uncertainty of the combined difference between the measurements of multiple artifacts by an NMI and the correspon ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=51095

46. Thermal Response and Inequivalence of Pulsed Ultraviolet-Laser Calorimeters
Published: 1/1/2002
Authors: D X Chen, Marla L Dowell, Christopher L. (Christopher L.) Cromer, Nien F Zhang
Abstract: A finite element model has been developed to study the thermal response of pulsed-laser calorimeters. Comparisons between pulsed- and average-laser power heating will be shown. Comparisons between laser and electrical heating will be presented and t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=20886

47. Statistical Process Monitoring for Autocorrelated Data
Published: 10/1/2001
Author: Nien F Zhang
Abstract: In the past years statistical process methodologies have been widely used in industry for process monitoring. However, the assumption that the process data are statistically independent is often invalid. This article discusses the approaches to dea ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=151775

48. Reference Material 8091: New Scanning Electron Microscope Sharpness Standard
Published: 8/1/2001
Authors: Andras Vladar, Michael T Postek, Nien F Zhang, Robert D. Larrabee, Samuel N Jones, Russell E Hajdaj
Abstract: All scanning electron microscope-based inspection instruments, whether they are in a laboratory or on the production line, slowly lose their performance and then the instrument is no longer capable of providing as good quality, sharp images as before ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821578

49. Reference Material 8091: New Scanning Electron Microscope Sharpness Standard
Published: 8/1/2001
Authors: Andras Vladar, Michael T Postek, Nien F Zhang, Robert D. Larrabee, Samuel N Jones, Russell E Hajdaj
Abstract: Reference Material (RM 8091) is intended primarily for use in checking the sharpness performance of scanning electron microscopes. It is supplied as a small, approximately 2 mm x 2 mm diced semiconductor chip. This sample is capable of being mounted ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823136

50. Bayesian Approach to Combining Results From Multiple Methods
Published: 1/1/2001
Authors: Hung-Kung Liu, Nien F Zhang
Abstract: Many solutions to the problem of estimating the consensus mean from the results of multiple methods or laboratories have been proposed. In a Bayesian analysis, the consensus mean is specified through probabilistic dependency as either a ¿parent¿ or ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=51092



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