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You searched on: Author: nien zhang

Displaying records 41 to 50 of 68 records.
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41. Statistical Uncertainty Analysis of CCEM-K2 Comparisions of Resistance Standards
Published: 6/1/2002
Authors: Nien F Zhang, N Sedransk, Dean G Jarrett
Abstract: Details of the statistical uncertainty analysis applied to key comparison CCEM-K2 are reported. Formulas were derived to determine the uncertainty of the combined difference between the measurements of multiple artifacts by an NMI and the correspondi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=30821

42. Statistical Uncertainty Analysis of CCEM-K2 Comparisons of Resistance Standards
Published: 6/1/2002
Authors: Nien F Zhang, N Sedransk, Dean G Jarrett
Abstract: Details of the statistical uncertainty analysis applied to key comparison CCEM-K2 are reported. Formulas were derived to determine the uncertainty of the combined difference between the measurements of multiple artifacts by an NMI and the correspon ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=51095

43. Thermal Response and Inequivalence of Pulsed Ultraviolet-Laser Calorimeters
Published: 1/1/2002
Authors: D X Chen, Marla L Dowell, Christopher L Cromer, Nien F Zhang
Abstract: A finite element model has been developed to study the thermal response of pulsed-laser calorimeters. Comparisons between pulsed- and average-laser power heating will be shown. Comparisons between laser and electrical heating will be presented and t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=20886

44. Statistical Process Monitoring for Autocorrelated Data
Published: 10/1/2001
Author: Nien F Zhang
Abstract: In the past years statistical process methodologies have been widely used in industry for process monitoring. However, the assumption that the process data are statistically independent is often invalid. This article discusses the approaches to dea ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=151775

45. Reference Material 8091: New Scanning Electron Microscope Sharpness Standard
Published: 8/1/2001
Authors: Andras Vladar, Michael T Postek, Nien F Zhang, Robert D. Larrabee, Samuel N Jones, Russell E Hajdaj
Abstract: All scanning electron microscope-based inspection instruments, whether they are in a laboratory or on the production line, slowly lose their performance and then the instrument is no longer capable of providing as good quality, sharp images as before ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821578

46. Reference Material 8091: New Scanning Electron Microscope Sharpness Standard
Published: 8/1/2001
Authors: Andras Vladar, Michael T Postek, Nien F Zhang, Robert D. Larrabee, Samuel N Jones, Russell E Hajdaj
Abstract: Reference Material (RM 8091) is intended primarily for use in checking the sharpness performance of scanning electron microscopes. It is supplied as a small, approximately 2 mm x 2 mm diced semiconductor chip. This sample is capable of being mounted ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823136

47. Bayesian Approach to Combining Results From Multiple Methods
Published: 1/1/2001
Authors: Hung-Kung Liu, Nien F Zhang
Abstract: Many solutions to the problem of estimating the consensus mean from the results of multiple methods or laboratories have been proposed. In a Bayesian analysis, the consensus mean is specified through probabilistic dependency as either a ¿parent¿ or ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=51092

48. An Approach to Combining Results From Multiple Methods Motivated by the ISO GUM
Series: Journal of Research (NIST JRES)
Published: 8/1/2000
Authors: M Levenson, D L. Banks, K Eberhardt, L M. Gill, William F Guthrie, Hung-Kung Liu, M Vangel, James H Yen, Nien F Zhang
Abstract: The problem of determining a consensus value and its uncertainty from the results of multiple methods or laboratories is discussed. Desirable criteria of a solution are presented. A solution based on the ISO Guide to the Expression of Uncertainty i ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=151758

49. Potentials of On-Line Scanning Electron Microscope Performance Analysis Using NIST Reference Material 8091
Published: 6/1/2000
Authors: Michael T Postek, Andras Vladar, Nien F Zhang, Robert D. Larrabee
Abstract: Fully automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an important aspect ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820975

50. Thermal Modeling of Calorimeters for Excimer Lasers at 193 nm Wavelength
Published: 6/1/2000
Authors: D X Chen, Marla L Dowell, Christopher L Cromer, Nien F Zhang
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=23431



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