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You searched on: Author: nien zhang

Displaying records 41 to 50 of 72 records.
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41. Serial Correlation of QC Data on the Use of Proper Control Charts
Published: 5/1/2004
Authors: P Winkel, Nien F Zhang
Abstract: Biochemical quality control data have been reported to be autocorrelated. Serial correlation may increase the rate of false alarms and decrease that of true alarms if traditional control charts are used. In this paper, the times series were examin ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=50809

42. A Kurtosis-Based Statistical Measure for Two-Dimensional Processes and Its Applications to Image Sharpness
Published: 6/30/2003
Authors: Nien F Zhang, Andras Vladar, Michael T Postek, Robert D. Larrabee
Abstract: Fully automated or semiautomatic scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. It is required that these automated instruments be routinely capable of 3 nanometer (nm) or bett ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=50812

43. Performance Evaluation of Approaches to Combining Results From Multiple Methods
Published: 4/1/2003
Authors: Hung-Kung Liu, Nien F Zhang
Abstract: The problem of determining a consensus mean and its uncertainty from the results of multiple measurement methods or laboratories is an important problem. Many solutions, both Bayesian and non-Bayesian, to this problem have been proposed over the ye ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=50804

44. Statistical Uncertainty Analysis of Key Comparison CCEM-K2
Published: 4/1/2003
Authors: Nien F Zhang, N Sedransk, Dean G Jarrett
Abstract: The details of a statistical uncertainty analysis applied to key comparison CCEM-K2 are reported. The analysis presented here provides an approach for addressing known correlations which have been of concern in reporting key comparison results. Un ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=51094

45. A Study on the Variance Estimation for a Stationary Process in SPC
Published: 2/1/2003
Author: Nien F Zhang
Abstract: Recently, statistical process control (SPC) methodologies have been developed to accommodate autocorrelated data. To construct control charts for stationary process data, the process variance needs to be estimated. For an independently identically d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=50811

46. Statistical Uncertainty Analysis of CCEM-K2 Comparisions of Resistance Standards
Published: 6/1/2002
Authors: Nien F Zhang, N Sedransk, Dean G Jarrett
Abstract: Details of the statistical uncertainty analysis applied to key comparison CCEM-K2 are reported. Formulas were derived to determine the uncertainty of the combined difference between the measurements of multiple artifacts by an NMI and the correspondi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=30821

47. Statistical Uncertainty Analysis of CCEM-K2 Comparisons of Resistance Standards
Published: 6/1/2002
Authors: Nien F Zhang, N Sedransk, Dean G Jarrett
Abstract: Details of the statistical uncertainty analysis applied to key comparison CCEM-K2 are reported. Formulas were derived to determine the uncertainty of the combined difference between the measurements of multiple artifacts by an NMI and the correspon ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=51095

48. Thermal Response and Inequivalence of Pulsed Ultraviolet-Laser Calorimeters
Published: 1/1/2002
Authors: D X Chen, Marla L Dowell, Christopher L. Cromer, Nien F Zhang
Abstract: A finite element model has been developed to study the thermal response of pulsed-laser calorimeters. Comparisons between pulsed- and average-laser power heating will be shown. Comparisons between laser and electrical heating will be presented and t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=20886

49. Statistical Process Monitoring for Autocorrelated Data
Published: 10/1/2001
Author: Nien F Zhang
Abstract: In the past years statistical process methodologies have been widely used in industry for process monitoring. However, the assumption that the process data are statistically independent is often invalid. This article discusses the approaches to dea ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=151775

50. Reference Material 8091: New Scanning Electron Microscope Sharpness Standard
Published: 8/1/2001
Authors: Andras Vladar, Michael T Postek, Nien F Zhang, Robert D. Larrabee, Samuel N Jones, Russell E Hajdaj
Abstract: All scanning electron microscope-based inspection instruments, whether they are in a laboratory or on the production line, slowly lose their performance and then the instrument is no longer capable of providing as good quality, sharp images as before ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821578



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