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Author: nien zhang

Displaying records 41 to 50 of 65 records.
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41. Statistical Process Monitoring for Autocorrelated Data
Published: 10/1/2001
Author: Nien F Zhang
Abstract: In the past years statistical process methodologies have been widely used in industry for process monitoring. However, the assumption that the process data are statistically independent is often invalid. This article discusses the approaches to dea ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=151775

42. Reference Material 8091: New Scanning Electron Microscope Sharpness Standard
Published: 8/1/2001
Authors: Andras Vladar, Michael T Postek, Nien F Zhang, Robert D. Larrabee, Samuel N Jones, Russell E Hajdaj
Abstract: All scanning electron microscope-based inspection instruments, whether they are in a laboratory or on the production line, slowly lose their performance and then the instrument is no longer capable of providing as good quality, sharp images as before ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821578

43. Reference Material 8091: New Scanning Electron Microscope Sharpness Standard
Published: 8/1/2001
Authors: Andras Vladar, Michael T Postek, Nien F Zhang, Robert D. Larrabee, Samuel N Jones, Russell E Hajdaj
Abstract: Reference Material (RM 8091) is intended primarily for use in checking the sharpness performance of scanning electron microscopes. It is supplied as a small, approximately 2 mm x 2 mm diced semiconductor chip. This sample is capable of being mounted ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823136

44. Bayesian Approach to Combining Results From Multiple Methods
Published: 1/1/2001
Authors: Hung-Kung Liu, Nien F Zhang
Abstract: Many solutions to the problem of estimating the consensus mean from the results of multiple methods or laboratories have been proposed. In a Bayesian analysis, the consensus mean is specified through probabilistic dependency as either a ¿parent¿ or ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=51092

45. An Approach to Combining Results From Multiple Methods Motivated by the ISO GUM
Series: Journal of Research (NIST JRES)
Published: 8/1/2000
Authors: M Levenson, D L. Banks, K Eberhardt, L M. Gill, William F Guthrie, Hung-Kung Liu, M Vangel, James H Yen, Nien F Zhang
Abstract: The problem of determining a consensus value and its uncertainty from the results of multiple methods or laboratories is discussed. Desirable criteria of a solution are presented. A solution based on the ISO Guide to the Expression of Uncertainty i ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=151758

46. Potentials of On-Line Scanning Electron Microscope Performance Analysis Using NIST Reference Material 8091
Published: 6/1/2000
Authors: Michael T Postek, Andras Vladar, Nien F Zhang, Robert D. Larrabee
Abstract: Fully automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an important aspect ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820975

47. Thermal Modeling of Calorimeters for Excimer Lasers at 193 nm Wavelength
Published: 6/1/2000
Authors: D X Chen, Marla L Dowell, Christopher L Cromer, Nien F Zhang
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=23431

48. Potentials of Online Scanning Electron Microscope Performance Analysis Using NIST Reference Material 8091
Published: 3/1/2000
Authors: Michael T Postek, Andras Vladar, Nien F Zhang, Robert D. Larrabee
Abstract: Fully automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an important aspect ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823128

49. Far-Infrared Transmittance and Reflectance of YBa^d2^Cu^d3^O^d7-x^ Films on Si Substrates
Published: 12/31/1999
Authors: A. R. Kumar, Nien F Zhang, V. A. Boychev, D. B. Tanner, Leila R Vale, David A Rudman
Abstract: The transmittance and reflectance of superconductive YBa^d2^Cu^d3^O^d7-{gamma} (YBCO) thin films deposited on Si substrates have been measured in the far-infrared frequency region from 10 to 100 cm^u-1^ (wavelength from 1000 to 100 micro {mu}) at tem ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=6104

50. Image Sharpness Measurement in Scanning Electron Microscope - Part III
Published: 7/1/1999
Authors: Samuel N Jones, Robert D. Larrabee, Michael T Postek, Andras Vladar, Nien F Zhang
Abstract: Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821795



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