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Author: nien zhang

Displaying records 41 to 50 of 64 records.
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41. Reference Material 8091: New Scanning Electron Microscope Sharpness Standard
Published: 8/1/2001
Authors: Andras Vladar, Michael T Postek, Nien F Zhang, Robert D. Larrabee, Samuel N Jones, Russell E Hajdaj
Abstract: All scanning electron microscope-based inspection instruments, whether they are in a laboratory or on the production line, slowly lose their performance and then the instrument is no longer capable of providing as good quality, sharp images as before ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821578

42. Reference Material 8091: New Scanning Electron Microscope Sharpness Standard
Published: 8/1/2001
Authors: Andras Vladar, Michael T Postek, Nien F Zhang, Robert D. Larrabee, Samuel N Jones, Russell E Hajdaj
Abstract: Reference Material (RM 8091) is intended primarily for use in checking the sharpness performance of scanning electron microscopes. It is supplied as a small, approximately 2 mm x 2 mm diced semiconductor chip. This sample is capable of being mounted ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823136

43. Bayesian Approach to Combining Results From Multiple Methods
Published: 1/1/2001
Authors: Hung-Kung Liu, Nien F Zhang
Abstract: Many solutions to the problem of estimating the consensus mean from the results of multiple methods or laboratories have been proposed. In a Bayesian analysis, the consensus mean is specified through probabilistic dependency as either a ¿parent¿ or ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=51092

44. An Approach to Combining Results From Multiple Methods Motivated by the ISO GUM
Series: Journal of Research (NIST JRES)
Published: 8/1/2000
Authors: M Levenson, D L. Banks, K Eberhardt, L M. Gill, William F Guthrie, Hung-Kung Liu, M Vangel, James H Yen, Nien F Zhang
Abstract: The problem of determining a consensus value and its uncertainty from the results of multiple methods or laboratories is discussed. Desirable criteria of a solution are presented. A solution based on the ISO Guide to the Expression of Uncertainty i ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=151758

45. Potentials of On-Line Scanning Electron Microscope Performance Analysis Using NIST Reference Material 8091
Published: 6/1/2000
Authors: Michael T Postek, Andras Vladar, Nien F Zhang, Robert D. Larrabee
Abstract: Fully automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an important aspect ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820975

46. Thermal Modeling of Calorimeters for Excimer Lasers at 193 nm Wavelength
Published: 6/1/2000
Authors: D X Chen, Marla L Dowell, Christopher L Cromer, Nien F Zhang
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=23431

47. Potentials of Online Scanning Electron Microscope Performance Analysis Using NIST Reference Material 8091
Published: 3/1/2000
Authors: Michael T Postek, Andras Vladar, Nien F Zhang, Robert D. Larrabee
Abstract: Fully automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an important aspect ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823128

48. Far-Infrared Transmittance and Reflectance of YBa^d2^Cu^d3^O^d7-x^ Films on Si Substrates
Published: 12/31/1999
Authors: A. R. Kumar, Nien F Zhang, V. A. Boychev, D. B. Tanner, Leila R Vale, David A Rudman
Abstract: The transmittance and reflectance of superconductive YBa^d2^Cu^d3^O^d7-{gamma} (YBCO) thin films deposited on Si substrates have been measured in the far-infrared frequency region from 10 to 100 cm^u-1^ (wavelength from 1000 to 100 micro {mu}) at tem ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=6104

49. Image Sharpness Measurement in Scanning Electron Microscope - Part III
Published: 7/1/1999
Authors: Samuel N Jones, Robert D. Larrabee, Michael T Postek, Andras Vladar, Nien F Zhang
Abstract: Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821795

50. Comparisons of Control Charts for Autocorrelated Data
Published: 1/1/1999
Author: Nien F Zhang
Abstract: Recently, statistical process control (SPC) methodolgies have been developed to accommodate autocorrelated data. A primary method to deal with autocorrelated data is the use of residual charts. Although this methodology has the advantage that it ca ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=151733



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