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Author: john woodward iv
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1. -Component Segregation in Model Chemically Amplified Resists,-
Published: 1/1/2007
Authors: John Taylor Woodward IV, T H Fedynyshyn, D K Astolfi, Susan Cann, J R Roberts, M K Leeson
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104253

2. A novel apparatus to measure reflected sunlight from the Moon
Published: 9/19/2013
Authors: Claire Elizabeth Cramer, Gerald T Fraser, Keith R Lykke, John Taylor Woodward IV, Alan W. Smith
Abstract: We describe a new apparatus for measuring the spectral irradiance of the Moon at visible wavelengths. Our effort builds upon the United States Geological Survey‰s highly successful Robotic Lunar Observatory (ROLO), which determined a precise model fo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914538

3. Absolute Flux Calibration of Stars; Calibration of the Reference Telescope
Published: 6/2/2009
Authors: Allan W. Smith, John Taylor Woodward IV, Colleen Alana Jenkins, Steven W Brown, Keith R Lykke
Abstract: Absolute stellar photometry is based on 1970s terrestrial measurements of the star Vega with instruments calibrated using the Planckian radiance from a Cu fixed-point blackbody. Significant advances in absolute radiometry have been made in the last 3 ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900900

4. Atomic Force Microscopy of Hybrid Bilayer Membranes
Published: 2/1/2000
Author: John Taylor Woodward IV
Abstract: Hybrid bilayer membranes (HBM) are synthetic membrane mimics designed to form a biomimetic surface. The basic HBM system consists of a lipid monolayer adsorbed to an alkanethiol self-assembled monolayer. More advanced versionshave used different thio ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830155

5. Atomic force microscope imaging of molecular aggregation during self-assembled monolayer growth
Published: 11/1/2000
Authors: I. Doudevski, W. A. Hayes, John Taylor Woodward IV, D. K. Schwartz
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903984

6. Biomimetic Membranes on Metal Supports
Published: 5/1/2003
Authors: John T Elliott, Curtis W Meuse, Vitalii Ivanovich Silin, Susan T Krueger, John Taylor Woodward IV, T Petralli-Mallow, Anne L Plant
Abstract: Biological membranes are complex and dynamic structures. The biological functions associated with membranes involve a number of different molecular species, and theories of how the molecular species are organized are still evolving. The fluid mosa ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830376

7. Cell Membrane Hybrid Bilayers Containing the G-Protein-Coupled Receptor CCR5
Published: 8/1/2002
Authors: N M. Rao, Vitalii Ivanovich Silin, K D. Ridge, John Taylor Woodward IV, Anne L Plant
Abstract: A hybrid bilayer membrane is a planar model membrane that is formed at an alkanethiol monolayer-coated gold surface by the spontaneous reorganization of phospholipid vesicles. Membrane vesicles from monkey kidney COS-cells also reorganize at an alka ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830169

8. Characterization of the Latent Image to Developed Image in Model EUV Photoresists
Published: 2/22/2008
Authors: John Taylor Woodward IV, Kwang-Woo Choi, Vivek M Prabhu, Shuhui Kang, Kristopher Lavery, Wen-Li Wu, Michael Leeson, Anuja De Silva, Nelson Felix, Christopher K. Ober
Abstract: Current extreme ultraviolet (EUV) photoresist materials do not yet meet exposure-dose sensitivity, line-width roughness, and resolution requirements. In order to quantify how trade-offs are related to the materials properties of the resist and proc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853583

9. Chemical Force Microscopy for Imaging Chemical Distributions in Undeveloped Resists
Published: Date unknown
Authors: John Taylor Woodward IV, Jeeseong Hwang, Bryan D. Vogt, Vivek M Prabhu, Eric K Lin, Kwang-Woo Choi, Harun Solak, Michael Leeson
Abstract: Controlling line width roughness (LWR) is a critical problem in the development of EUV resists. Contributing to the difficulty of reducing LWR is the limited knowledge of the nanoscale morphology of the resist film throughout the process. Generally ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841144

10. Chemical Force Microscopy of 30 nm Half-Pitch Latent Images in Poly(Methyl-Methacrylate)
Published: Date unknown
Authors: John Taylor Woodward IV, Harun Solak
Abstract: Poly(methyl-methacrylate) (PMMA) thin films were spun cast on silicon and exposed to a 30 nm half-pitch EUV interference pattern. The sample was imaged by chemical force microscope (CFM) using a methyl functionalized AFM tip in lateral force mode. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841049



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