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Author: quandou wang
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1. A Simple Ball Averager for Reference Sphere Calibrations
Ulf Griesmann, Quandou Wang, Johannes A Soons, Remi Carakos
When measuring the form errors of precision optics with an interferometer, the calibration of the reference wavefront is of central importance. Ball averaging, or random ball testing, has in recent years emerged as a robust method for calibrati ...
2. A Simple Method to Improve Etching Uniformity when Making Phase Type CGHs on a Thick Glass Substrate
A simple method to optimize the etching uniformity when making a Computer generated halogram on a thick optical glass substrate is described, which uses a Teflon ring to enclose the substrate during reactive-ion etching (RIE).
3. A Tool Kit to Generate 3D Animated CAESAR Bodies
Quandou Wang, Sanford P Ressler
The Civilian American and European Surface Anthropometry Resource (CAESAR) database provides a comprehensive source for body measurement in numerous industries such as apparel, aerospace, and automobile. Generating animated CAESAR body sequences fro ...
4. A VRML Integration Methodology for Manufacturing Applications
Sanford P Ressler, Afzal A Godil, Quandou Wang, G S Seidman
This paper describes several methods for using the Virtual Reality Modeling Language (VRML) as the visualization integration tech-nology for manufacturing simulation systems. One of our goals was to develop an integration methodology based on the use ...
5. A modified Roberts-Langenbeck test for measuring thickness and refractive index variation of silicon wafers
Jungjae Park, Lingfeng Chen, Quandou Wang, Ulf Griesmann
We describe a method to simultaneously measure thickness variation and refractive index homogeneity of 300 mm diameter silicon wafers using a wavelength shifting Fizeau interferometer operating at 1550 nm. Only three measurements are required, corres ...
6. A versatile bilayer resist for laser lithography at 405 nm on glass substrates
Quandou Wang, Ulf Griesmann
We describe a simple bilayer photoresist that is particularly well suited for laser lithography at an exposure wavelength of 405 nm on glass substrates, which is often used for the fabrication of binary diffractive optics and computer generated holog ...
7. Binary amplitude holograms made from dyed photoresist
Quandou Wang, Ulf Griesmann, John H Burnett
A method for fabricating binary amplitude holograms from a dyed
photoresist is described. It is of particular interest for
holograms that are used as null lenses in the form metrology of
aspheric surfaces and wavefronts. A pigment that stron ...
8. Characterization of Precision Spheres With XCALIBIR
Ulf Griesmann, Johannes A Soons, Quandou Wang
The geometry of a nearly spherical surface, for example that of a precision optic, is completely determined by the radius-of-curvature at one point and the deviation from the perfect spherical form at all other points of the sphere. Measurements of ...
9. Deformation-Free Form Error Measurements of Thin, Plane-Parallel Optics Floated on a Heavy
JiYoung Chu, Ulf Griesmann, Quandou Wang, Johannes A Soons, Eric C Benck
We describe a novel method for measuring the unconstrained flatness error of
thin, plane parallel precision optics by floating them on high-density aqueous
metatungstate solutions while measuring the flatness error with an interferometer. The
10. Figure metrology for x-ray focusing mirrors with Fresnel holograms and photon sieves
Ulf Griesmann, Johannes A Soons, Quandou Wang, Lahsen Assoufid
We report on interferometric measurements of the figure error of an ultra-precise
mirror with the shape of an elliptical toroid for the diffraction limited focusing of hard x-rays
from an undulator x-ray source. We describe measurement configuratio ...