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Author: quandou wang
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1. A Simple Ball Averager for Reference Sphere Calibrations
Published: 1/1/2005
Authors: Ulf Griesmann, Quandou Wang, Johannes A Soons, Remi Carakos
Abstract: When measuring the form errors of precision optics with an interferometer, the calibration of the reference wavefront is of central importance.  Ball averaging, or random ball testing, has in recent years emerged as a robust method for calibrati ...

2. A Simple Method to Improve Etching Uniformity when Making Phase Type CGHs on a Thick Glass Substrate
Published: 6/13/2010
Author: Quandou Wang
Abstract: A simple method to optimize the etching uniformity when making a Computer generated halogram on a thick optical glass substrate is described, which uses a Teflon ring to enclose the substrate during reactive-ion etching (RIE).

3. A Tool Kit to Generate 3D Animated CAESAR Bodies
Published: 10/1/2005
Authors: Quandou Wang, Sanford P Ressler
Abstract: The Civilian American and European Surface Anthropometry Resource (CAESAR) database provides a comprehensive source for body measurement in numerous industries such as apparel, aerospace, and automobile. Generating animated CAESAR body sequences fro ...

4. A VRML Integration Methodology for Manufacturing Applications
Published: 8/24/1998
Authors: Sanford P Ressler, Afzal A Godil, Quandou Wang, G S Seidman
Abstract: This paper describes several methods for using the Virtual Reality Modeling Language (VRML) as the visualization integration tech-nology for manufacturing simulation systems. One of our goals was to develop an integration methodology based on the use ...

5. A modified Roberts-Langenbeck test for measuring thickness and refractive index variation of silicon wafers
Published: 8/17/2012
Authors: Jungjae Park, Lingfeng Chen, Quandou Wang, Ulf Griesmann
Abstract: We describe a method to simultaneously measure thickness variation and refractive index homogeneity of 300 mm diameter silicon wafers using a wavelength shifting Fizeau interferometer operating at 1550 nm. Only three measurements are required, corres ...

6. A versatile bilayer resist for laser lithography at 405 nm on glass substrates
Published: 10/23/2013
Authors: Quandou Wang, Ulf Griesmann
Abstract: We describe a simple bilayer photoresist that is particularly well suited for laser lithography at an exposure wavelength of 405 nm on glass substrates, which is often used for the fabrication of binary diffractive optics and computer generated holog ...

7. Binary amplitude holograms made from dyed photoresist
Published: 5/13/2011
Authors: Quandou Wang, Ulf Griesmann, John H Burnett
Abstract: A method for fabricating binary amplitude holograms from a dyed photoresist is described. It is of particular interest for holograms that are used as null lenses in the form metrology of aspheric surfaces and wavefronts. A pigment that stron ...

8. Characterization of Precision Spheres With XCALIBIR
Published: 1/1/2004
Authors: Ulf Griesmann, Johannes A Soons, Quandou Wang
Abstract: The geometry of a nearly spherical surface, for example that of a precision optic, is completely determined by the radius-of-curvature at one point and the deviation from the perfect spherical form at all other points of the sphere. Measurements of ...

9. Deformation-Free Form Error Measurements of Thin, Plane-Parallel Optics Floated on a Heavy Liquid
Published: 4/1/2010
Authors: JiYoung Chu, Ulf Griesmann, Quandou Wang, Johannes A Soons, Eric C Benck
Abstract: We describe a novel method for measuring the unconstrained flatness error of thin, plane parallel precision optics by floating them on high-density aqueous metatungstate solutions while measuring the flatness error with an interferometer. The supp ...

10. Figure metrology for x-ray focusing mirrors with Fresnel holograms and photon sieves
Published: 6/20/2014
Authors: Ulf Griesmann, Johannes A Soons, Quandou Wang, Lahsen Assoufid
Abstract: We report on interferometric measurements of the figure error of an ultra-precise mirror with the shape of an elliptical toroid for the diffraction limited focusing of hard x-rays from an undulator x-ray source. We describe measurement configuratio ...

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  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series