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Author: quandou wang

Displaying records 11 to 20 of 27 records.
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11. Measuring the Phase Transfer Function of a Phase-Shifting Interferometer
Published: 8/13/2008
Authors: JiYoung Chu, Quandou Wang, John P. Lehan, Ulf Griesmann, Guangjun Gao
Abstract: In characterizing the performance of a phase-shifting interferometer, the dependence of the measured height on the spatial frequency is rarely considered. We describe a test mirror with a special height relief that can be used to measure the height t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824685

12. Stationary and non-stationary deformations in three-flat tests
Published: 7/7/2008
Authors: Ulf Griesmann, Quandou Wang, Nicolas Laurenchet, Johannes A Soons
Abstract: Calibration procedures for optical reference flats of phase-shifting interferometers (three-flat tests) are critically important if flatness measurements with low uncertainty are desired. In these tests, all combinations of three flats with unknown f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824679

13. Three-Flat Test Solutions Including Mounting-Induced Deformations
Published: 9/1/2007
Authors: Ulf Griesmann, Quandou Wang, Johannes A Soons
Abstract: We investigate three-flat calibration methods for circular flats, based on rotation symmetry and mirror symmetry, for absolute interferometric flatness measurements in the presence of deformations caused by the support mechanism for the flats, which ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823338

14. Manufacture and Metrology of 300 mm Silicon Wafers with Ultra-Low Thickness Variations
Report Number: 823030
Published: 1/2/2007
Authors: Ulf Griesmann, Quandou Wang, Marc Tricard, Paul Dumas, Christopher Hill
Abstract: With the evolution of exposure tools for optical lithography towards larger numerical apertures, the semiconductor industry expects continued demand for improved wafer flatness at the exposure site. The Allowable site flatness for 300 mm wafers is ex ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823030

15. Mini-Fizeau Interferometer for Curvature Sensing in the NIST Geometry Measuring Machine
Published: 1/1/2006
Authors: Quandou Wang, Ulf Griesmann
Abstract: We describe the design of a miniature Fizeau interferometer, which is intended to be an accurate curvature sensor for the NIST Geometry Measuring (GEMM), which is used to measure aspheric and free form surfaces. The interferometer was designed for s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822280

16. A Tool Kit to Generate 3D Animated CAESAR Bodies
Published: 10/1/2005
Authors: Quandou Wang, Sanford P Ressler
Abstract: The Civilian American and European Surface Anthropometry Resource (CAESAR) database provides a comprehensive source for body measurement in numerous industries such as apparel, aerospace, and automobile. Generating animated CAESAR body sequences fro ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=150282

17. Uncertainties in Aspheric Profile Measurements with the Geometry Measuring Machine at NIST
Published: 7/31/2005
Authors: Ulf Griesmann, Nadia Machkour-Deshayes, Byoung Chang Kim, Quandou Wang, Lahsen Assoufid
Abstract: The Geometry Measuring Machine (GEMM) of the National Institute of Standards and Technology (NIST) is a profilometer for free-form surfaces. A profile is reconstructed from local curvature of a test part surface, measured at several locations along ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822308

18. Interferometric Thickness Calibration of 300mm Silicon Wafers
Published: 7/20/2005
Authors: Quandou Wang, Ulf Griesmann, Robert S. Polvani
Abstract: The Improved Infrared Interferometer (IR3) at the National Institute of Standards and Technology (NIST) is a phase-measuring interferometer, operating at a wavelength of 1550 nm, which is being developed for measuring the thickness and thickness vari ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822291

19. Optical Flatness Metrology for 300 mm Silicon Wafers
Published: 4/1/2005
Authors: Ulf Griesmann, Quandou Wang, T D Raymond
Abstract: At the National Institute of Standards and Technology (NIST), we are developing two interferometric methods for measuring the thickness variation and flatness of free-standing and chucked silicon wafers with diameters up to 300mm. The eXtremely accu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822272

20. A Simple Ball Averager for Reference Sphere Calibrations
Published: 1/1/2005
Authors: Ulf Griesmann, Quandou Wang, Johannes A Soons, Remi Carakos
Abstract: When measuring the form errors of precision optics with an interferometer, the calibration of the reference wavefront is of central importance.  Ball averaging, or random ball testing, has in recent years emerged as a robust method for calibrati ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822303



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