You searched on: Author: theodore vorburger
Displaying records 11 to 20 of 204 records.
Resort by: Date / Title
11. On CD-AFM bias related to probe bending
Vladimir A Ukraintsev, Ndubuisi George Orji, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Richard M Silver
Critical Dimension AFM (CD-AFM) is a widely used reference metrology. To characterize modern semiconductor devices, very small and flexible probes, often 15 nm to 20 nm in diameter, are now frequently used. Several recent publications have reported ...
12. Development of Ballistics Identification ‹ From Image Comparison to Topography Measurement in Surface Metrology-
Jun-Feng Song, Theodore Vincent Vorburger, Robert Meryln Thompson, Thomas B Renegar, Xiaoyu A Zheng, James H Yen, Richard M Silver, Wei Chu
Fired bullets and ejected cartridge cases have unique ballistics signatures left by the firearm. By analyzing the ballistics signatures, forensic examiners can trace these bullets and cartridge cases to the firearm used in a crime scene. Current au ...
13. Stylus Tip-Size Effect on the Calibration of Periodic Roughness Specimens with Rectangular Profiles
Thomas B Renegar, Johannes A Soons, Balasubramanian Muralikrishnan, John S Villarrubia, Xiaoyu A Zheng, Theodore Vincent Vorburger, Jun-Feng Song
Stylus instruments are widely used for surface characterization. It is well known that the size and shape of the stylus tip affects the measured surface geometry and parameters. In most cases, increasing the tip size decreases the measured Ra value b ...
14. The National Ballistics Imaging Comparison (NBIC) Project
Jun-Feng Song, Theodore Vincent Vorburger, Susan M Ballou, Robert Meryln Thompson, James H Yen, Thomas B Renegar, Xiaoyu A Zheng, Richard M Silver, Martin Ols
In response to the guidelines issued by the ASCLD/LAB-International (American Society of Crime Laboratory Directors/Laboratory Accreditation Board) to establish traceability and quality assurance in U.S. crime laboratories, a NIST/ATF joint project e ...
15. An Iterative Algorithm for Calculating Stylus Radius Unambiguously
Theodore Vincent Vorburger, Xiaoyu A Zheng, Thomas B Renegar, Jun-Feng Song, Li Ma
The stylus radius is an important specification for stylus instruments and is commonly provided by instrument manufacturers. However, it is difficult to measure the stylus radius unambiguously. Accurate profiles of the stylus tip may be obtained by ...
16. User's Guide for SRM 2494 and 2495: The MEMS 5-in-1, 2011 Edition
Special Publication (NIST SP)
Janet M Cassard, Jon C Geist, Theodore Vincent Vorburger, David Thomas Read, David G Seiler
The Microelectromechanical Systems (MEMS) 5-in-1 is a standard reference device sold as a NIST
Standard Reference Material (SRM) that contains MEMS test structures on a test chip. The two SRM
chips (2494 and 2495) provide for both dimensional an ...
17. Selecting Valid Correlation Areas for Automated Bullet Identification Systems Based on Striation Detection
Wei Chu, Jun-Feng Song, Theodore Vincent Vorburger, Robert Meryln Thompson, Richard M Silver
18. Light Scattering Methods
Theodore Vincent Vorburger, Richard M Silver, Rainer Brodmann, Boris Brodmann, Jorg Seewig
Light scattering belongs to a class of techniques known as area-integrating methods for measuring surface texture. Rather than being based on coordinate measurement, these methods probe an area of the surface altogether and yield parameters that are ...
19. Multi-laboratory Comparison of Traceable Atomic Force Microscope Measurements of 70 nm Grating Pitch
Ronald G Dixson, Donald Chernoff, Shihua Wang, Theodore Vincent Vorburger, Siew-Leng Tan, Ndubuisi George Orji, Joseph Fu
The National Institute of Standards and Technology (NIST), Advanced Surface Microscopy (ASM), and the National Metrology Centre (NMC) of the Agency for Science, Technology, and Research (A*STAR) in Singapore have completed a three-way interlaboratory ...
20. Nano- and Atom-scale Length Metrology
Theodore Vincent Vorburger, Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, Richard A Allen, Michael W. Cresswell, Vincent A Hackley
Measurements of length at the nano-scale have increasing importance in manufacturing, especially in the electronics and biomedical industries. The properties of linewidth and step height are critical to the function and specification of semiconducto ...