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Author: andras vladar

Displaying records 31 to 40 of 148 records.
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31. Sample Preparation Protocols for Realization of Reproducible Characterization of Single-walled Carbon Nanotubes
Published: 12/1/2009
Authors: Angela R Hight Walker, Jeffrey A Fagan, Stephanie A Hooker, Michael T Postek, Stephen A Wise, Andras Vladar, Rolf Louis Zeisler
Abstract: Harmonized sample pre-treatment is an integral first step in ensuring metrological quality of measurements as regards repeatability, inter-laboratory reproducibility and commutability. The development of standard preparation methods for SWCNT sample ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901229

32. Results of an international photomask linewidth comparison of NIST and PTB
Published: 10/9/2009
Authors: Bernd Bodermann, D Bergmann, Egbert Buhr, W Haebler-Grohne, Harald Bosse, James Edward Potzick, Ronald G Dixson, Richard Quintanilha, Michael T. Stocker, Andras Vladar, Ndubuisi George Orji
Abstract: In preparation of the international Nano1 linewidth comparison on photomasks between 9 national metrology institutes, NIST and PTB have started a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to tes ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903776

33. Nanometrology Solutions Using an Ultra-High Resolution In-lens SEM
Published: 9/1/2009
Authors: Michael T Postek, Andras Vladar, John S Villarrubia
Abstract: The imaging and measurement of nanostructures such as particles, carbon nanotubes, and quantum dots have placed new demands on the high resolution imaging capabilities of scanning electron microscopes. A barrier to accurate dimensional metrology is t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902308

34. Recent Progress in Understanding the Imaging and Metrology using the Helium Ion Microscope
Published: 9/1/2009
Authors: Michael T Postek, Andras Vladar, Bin Ming
Abstract: Nanotechnology is pushing imaging and measurement instrument technology to high levels of required performance. As this continues, new barriers confronting innovation in this field are encountered. Particle beam instrument resolution remains one of t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902762

35. Optimization of Accurate SEM Imaging by Use of Artificial Images
Published: 5/22/2009
Authors: Petr Cizmar, Andras Vladar, Michael T Postek
Abstract: Today the vast majority of the scanning electron microscopes (SEMs) are incapable of taking repeatable and accurate images at high magnifications. Geometric distortions are common, so are drift, vibration, and problems related to disturbing electro-m ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902635

36. On the Sub-Nanometer Resolution of Scanning Electron and Helium Ion Microscopes
Published: 3/1/2009
Authors: Andras Vladar, Michael T Postek, Bin Ming
Abstract: All forms of microscopy are being pushed to the limit by nanotechnology. Hence, there is a relentless quest to achieve better and better resolution with various electron and ion microscopes and to monitor and maintain these instruments to achieve the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901833

37. On the Sub-Nanometer Resolution of Scanning Electron and Scanning Helium Ion Microscopes
Published: 3/1/2009
Authors: Michael T Postek, Andras Vladar, Bin Ming
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901569

38. Understanding Imaging and Metrology with the Helium Ion Microscope
Published: 3/1/2009
Authors: Michael T Postek, Andras Vladar, Bin Ming
Abstract: The development of accurate metrology for the characterization of nanomaterials is one barrier to innovation confronting all phases of nanotechnology. Ultra-high resolution microscopy is a key technology needed to achieve this goal. But, current micr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902394

39. Design of an on-chip microscale nanoassembly system
Published: 2/10/2009
Authors: Jason John Gorman, Yong Sik Kim, Andras Vladar, Nicholas G Dagalakis
Abstract: A microscale nanoassembly system has been designed for the fabrication of nanodevices and in situ electromechanical characterisation of nanostructures. This system consists of four Microelectromechanical Systems(MEMS)-based nanomanipulators positione ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901179

40. Helium Ion Microscopy and its Application to Nanotechnology and Nanometrology
Published: 11/4/2008
Authors: Michael T Postek, Andras Vladar
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824682



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