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You searched on: Author: andras vladar

Displaying records 31 to 40 of 163 records.
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31. Fractional Diffusion, Low Exponent Levy Stable Laws, and Slow Motion Denoising of Helium Ion Microscope Nanoscale Imagery
Series: Journal of Research (NIST JRES)
Report Number: 117.006
Published: 2/22/2012
Authors: Andras Vladar, Alfred S Carasso
Abstract: Helium ion microscopes (HIM) are capable of acquiring images with better than 1nm resolution, and HIM images are particularly rich in morphological surface details. However, such images are generally quite noisy. A major challenge is to denoise the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906607

32. Strategies for Nanoscale Contour Metrology using Critical Dimension Atomic Force Microscopy
Published: 9/30/2011
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Michael T Postek
Abstract: Contour metrology is one of the techniques used to verify optical proximity correction (OPC) in lithography models. The use of these methods, which are known as resolution enhancement techniques (RET), are necessitated by the continued decrease in f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909559

33. Real-Time Image Composition with Correction of Drift Distortion
Published: 9/20/2011
Authors: Petr Cizmar, Andras Vladar, Michael T Postek
Abstract: In this article, a new scanning electron microscopy (SEM) image composition technique is de- scribed, which can significantly reduce drift-distortion related image corruptions. Drift-distortion commonly causes blur and distortions in the SEM ima ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903741

34. Development of the Metrology and Imaging of Cellulose Nanocrystals
Published: 9/19/2011
Authors: Michael T Postek, Andras Vladar, John A Dagata, Natalia Farkas, Bin Ming, Ryan Wagner, Arvind Raman, Robert J Moon, Ronald Sabo, Theodore H Wegner, James Beecher
Abstract: The development of metrology for nanoparticles is a significant challenge. Cellulose nanocrystals (CNC) are one group of nanoparticles that have high potential economic value but present substantial challenges to the development of the measurement ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905543

35. Review of Current Progress in Nanometrology with Helium Ions
Published: 9/19/2011
Authors: Michael T Postek, Andras Vladar, Bin Ming, Charles Archie
Abstract: Scanning electron microscopy has been employed as an imaging and measurement tool for more than 50 years and it continues as a primary tool in many research and manufacturing facilities across the world. A new challenger to this work is the helium ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905541

36. Accurate Nanometer-Scale Imaging and Measurements with SEM
Published: 8/18/2011
Authors: Bradley N Damazo, Bin Ming, Premsagar Purushotham Kavuri, Andras Vladar, Michael T Postek
Abstract: Scanning electron microscopes (SEMs) are incredibly versatile instruments for millimeter to nanometer scale imaging and measurements of size and shape. New methods to improve repeatability and accuracy have been implemented on the so-called Referenc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909147

37. Modeling for Accurate Dimensional Scanning Electron Microscope Metrology: Then and Now
Published: 7/20/2011
Authors: Michael T Postek, Andras Vladar
Abstract: A review of the evolution of modeling for accurate dimensional scanning electron microscopy is presented with an emphasis on developments in the Monte Carlo technique for SEM dimensional metrology. The progress of modeling for accurate metrology is d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908153

38. Advanced Image Composition with Intra-Frame Drift Correction
Published: 7/19/2011
Authors: Petr Cizmar, Andras Vladar, Michael T Postek
Abstract: Drift Corrected Image Composition (DCIC) is a real-time technique that allows for acquiring significantly more accurate images compare to traditional slow or fast imaging methods.[Ref.] It is especially useful in nanometer-scale imaging and metrolog ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908494

39. TSOM Method for Semiconductor Metrology
Published: 4/18/2011
Authors: Ravikiran Attota, Ronald G Dixson, John A Kramar, James Edward Potzick, Andras Vladar, Benjamin D. Bunday, Erik Novak, Andrew C. Rudack
Abstract: Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement resolution using conventional optical microscopes; measurement sensitivities are comparable to what is typical using Scatterometry, SEM ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908177

40. FRACTIONAL DIFFUSION, LOW EXPONENT LEVY STABLE LAWS, AND SLOW MOTION DENOISING OF HELIUM ION MICROSCOPE NANOSCALE IMAGERY
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 7727
Published: 9/30/2010
Authors: Alfred S Carasso, Andras Vladar
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906883



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