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You searched on: Author: andras vladar

Displaying records 31 to 40 of 154 records.
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31. FRACTIONAL DIFFUSION, LOW EXPONENT LEVY STABLE LAWS, AND SLOW MOTION DENOISING OF HELIUM ION MICROSCOPE NANOSCALE IMAGERY
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 7727
Published: 9/30/2010
Authors: Alfred S Carasso, Andras Vladar
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906883

32. Advances in Modeling of Scanning Charged-Particle-Microscopy Images
Published: 9/19/2010
Authors: Petr Cizmar, Andras Vladar, Michael T Postek
Abstract: Modeling scanning electron microscope (SEM) and scanning ion microscope images has recently become necessary, because of its ability to provide repeatable images with a priori determined parameters. Modeled artificial images have been used in eva ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905723

33. NEW Scanning Electron Microscope Magnification Calibration Reference Material (RM) 8820
Published: 8/19/2010
Authors: Michael T Postek, Andras Vladar, William J. Keery, Michael Bishop, Benjamin Bunday, John Allgair
Abstract: Reference Material 8820 (RM 8820) is a new scanning electron microscope calibration reference material for nanotechnology and nanomanufacturingtion recently released by NIST. This standard was developed to be used primarily for X and Y scale (or magn ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905372

34. Reference Material (RM) 8820: A Versatile New NIST Standard for Nanometrology
Published: 7/19/2010
Authors: Michael T Postek, Andras Vladar, William J. Keery, Michael R Bishop, Benjamin Bunday, John Allgair
Abstract: A new multipurpose instrument calibration standard has been released by NIST. This standard was developed to be used primarily for X and Y scale (or magnifi cation) calibrations of scanning electron microscopes from less than 10 times magnification t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905034

35. Nanoparticle size and shape evaluation using the TSOM optical microscopy method
Published: 6/6/2010
Authors: Ravikiran Attota, Richard J Kasica, Lei Chen, Premsagar Purushotham Kavuri, Richard M Silver, Andras Vladar
Abstract: We present a novel optical TSOM (through-focus scanning optical microscopy - pronounced as 'tee-som') method that produces nanoscale dimensional measurement sensitivity using a conventional optical microscope. The TSOM method uses optical information ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905490

36. Proximity-associated errors in contour metrology
Published: 3/31/2010
Authors: John S Villarrubia, Ronald G Dixson, Andras Vladar
Abstract: In contour metrology the CD-SEM (critical dimension scanning electron microscope) assigns a continuous boundary to extended features in an image. The boundary is typically assigned as a simple function of the signal intensity, for example by a bright ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905141

37. Sample Preparation Protocols for Realization of Reproducible Characterization of Single-walled Carbon Nanotubes
Published: 12/1/2009
Authors: Angela R Hight Walker, Jeffrey A Fagan, Stephanie A Hooker, Michael T Postek, Stephen A Wise, Andras Vladar, Rolf Louis Zeisler
Abstract: Harmonized sample pre-treatment is an integral first step in ensuring metrological quality of measurements as regards repeatability, inter-laboratory reproducibility and commutability. The development of standard preparation methods for SWCNT sample ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901229

38. Results of an international photomask linewidth comparison of NIST and PTB
Published: 10/9/2009
Authors: Bernd Bodermann, D Bergmann, Egbert Buhr, W Haebler-Grohne, Harald Bosse, James Edward Potzick, Ronald G Dixson, Richard Quintanilha, Michael T. Stocker, Andras Vladar, Ndubuisi George Orji
Abstract: In preparation of the international Nano1 linewidth comparison on photomasks between 9 national metrology institutes, NIST and PTB have started a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to tes ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903776

39. Nanometrology Solutions Using an Ultra-High Resolution In-lens SEM
Published: 9/1/2009
Authors: Michael T Postek, Andras Vladar, John S Villarrubia
Abstract: The imaging and measurement of nanostructures such as particles, carbon nanotubes, and quantum dots have placed new demands on the high resolution imaging capabilities of scanning electron microscopes. A barrier to accurate dimensional metrology is t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902308

40. Recent Progress in Understanding the Imaging and Metrology using the Helium Ion Microscope
Published: 9/1/2009
Authors: Michael T Postek, Andras Vladar, Bin Ming
Abstract: Nanotechnology is pushing imaging and measurement instrument technology to high levels of required performance. As this continues, new barriers confronting innovation in this field are encountered. Particle beam instrument resolution remains one of t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902762



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