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Author: andras vladar

Displaying records 21 to 30 of 146 records.
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21. Modeling for Accurate Dimensional Scanning Electron Microscope Metrology: Then and Now
Published: 7/20/2011
Authors: Michael T Postek, Andras Vladar
Abstract: A review of the evolution of modeling for accurate dimensional scanning electron microscopy is presented with an emphasis on developments in the Monte Carlo technique for SEM dimensional metrology. The progress of modeling for accurate metrology is d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908153

22. Advanced Image Composition with Intra-Frame Drift Correction
Published: 7/19/2011
Authors: Petr Cizmar, Andras Vladar, Michael T Postek
Abstract: Drift Corrected Image Composition (DCIC) is a real-time technique that allows for acquiring significantly more accurate images compare to traditional slow or fast imaging methods.[Ref.] It is especially useful in nanometer-scale imaging and metrolog ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908494

23. TSOM Method for Semiconductor Metrology
Published: 4/18/2011
Authors: Ravikiran (Ravikiran) Attota, Ronald G Dixson, John A Kramar, James Edward Potzick, Andras Vladar, Benjamin D. Bunday, Erik Novak, Andrew C. Rudack
Abstract: Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement resolution using conventional optical microscopes; measurement sensitivities are comparable to what is typical using Scatterometry, SEM ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908177

24. FRACTIONAL DIFFUSION, LOW EXPONENT LEVY STABLE LAWS, AND SLOW MOTION DENOISING OF HELIUM ION MICROSCOPE NANOSCALE IMAGERY
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 7727
Published: 9/30/2010
Authors: Alfred S Carasso, Andras Vladar
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906883

25. Advances in Modeling of Scanning Charged-Particle-Microscopy Images
Published: 9/19/2010
Authors: Petr Cizmar, Andras Vladar, Michael T Postek
Abstract: Modeling scanning electron microscope (SEM) and scanning ion microscope images has recently become necessary, because of its ability to provide repeatable images with a priori determined parameters. Modeled artificial images have been used in eva ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905723

26. NEW Scanning Electron Microscope Magnification Calibration Reference Material (RM) 8820
Published: 8/19/2010
Authors: Michael T Postek, Andras Vladar, William J. Keery, Michael Bishop, Benjamin Bunday, John Allgair
Abstract: Reference Material 8820 (RM 8820) is a new scanning electron microscope calibration reference material for nanotechnology and nanomanufacturingtion recently released by NIST. This standard was developed to be used primarily for X and Y scale (or magn ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905372

27. Reference Material (RM) 8820: A Versatile New NIST Standard for Nanometrology
Published: 7/19/2010
Authors: Michael T Postek, Andras Vladar, William J. Keery, Michael R Bishop, Benjamin Bunday, John Allgair
Abstract: A new multipurpose instrument calibration standard has been released by NIST. This standard was developed to be used primarily for X and Y scale (or magnifi cation) calibrations of scanning electron microscopes from less than 10 times magnification t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905034

28. Proximity-associated errors in contour metrology
Published: 3/31/2010
Authors: John S Villarrubia, Ronald G Dixson, Andras Vladar
Abstract: In contour metrology the CD-SEM (critical dimension scanning electron microscope) assigns a continuous boundary to extended features in an image. The boundary is typically assigned as a simple function of the signal intensity, for example by a bright ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905141

29. Sample Preparation Protocols for Realization of Reproducible Characterization of Single-walled Carbon Nanotubes
Published: 12/1/2009
Authors: Angela R Hight Walker, Jeffrey A Fagan, Stephanie A Hooker, Michael T Postek, Stephen A Wise, Andras Vladar, Rolf Louis Zeisler
Abstract: Harmonized sample pre-treatment is an integral first step in ensuring metrological quality of measurements as regards repeatability, inter-laboratory reproducibility and commutability. The development of standard preparation methods for SWCNT sample ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901229

30. Results of an international photomask linewidth comparison of NIST and PTB
Published: 10/9/2009
Authors: Bernd Bodermann, D Bergmann, Egbert Buhr, W Haebler-Grohne, Harald Bosse, James Edward Potzick, Ronald G Dixson, Richard Quintanilha, Michael T. Stocker, Andras Vladar, Ndubuisi George Orji
Abstract: In preparation of the international Nano1 linewidth comparison on photomasks between 9 national metrology institutes, NIST and PTB have started a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to tes ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903776



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