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Author: andras vladar

Displaying records 21 to 30 of 150 records.
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21. Development of the Metrology and Imaging of Cellulose Nanocrystals
Published: 9/19/2011
Authors: Michael T Postek, Andras Vladar, John A Dagata, Natalia Farkas, Bin Ming, Ryan Wagner, Arvind Raman, Robert J Moon, Ronald Sabo, Theodore H Wegner, James Beecher
Abstract: The development of metrology for nanoparticles is a significant challenge. Cellulose nanocrystals (CNC) are one group of nanoparticles that have high potential economic value but present substantial challenges to the development of the measurement ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905543

22. Review of Current Progress in Nanometrology with Helium Ions
Published: 9/19/2011
Authors: Michael T Postek, Andras Vladar, Bin Ming, Charles Archie
Abstract: Scanning electron microscopy has been employed as an imaging and measurement tool for more than 50 years and it continues as a primary tool in many research and manufacturing facilities across the world. A new challenger to this work is the helium ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905541

23. Accurate Nanometer-Scale Imaging and Measurements with SEM
Published: 8/18/2011
Authors: Bradley N Damazo, Bin Ming, Premsagar Purushotham Kavuri, Andras Vladar, Michael T Postek
Abstract: Scanning electron microscopes (SEMs) are incredibly versatile instruments for millimeter to nanometer scale imaging and measurements of size and shape. New methods to improve repeatability and accuracy have been implemented on the so-called Referenc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909147

24. Modeling for Accurate Dimensional Scanning Electron Microscope Metrology: Then and Now
Published: 7/20/2011
Authors: Michael T Postek, Andras Vladar
Abstract: A review of the evolution of modeling for accurate dimensional scanning electron microscopy is presented with an emphasis on developments in the Monte Carlo technique for SEM dimensional metrology. The progress of modeling for accurate metrology is d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908153

25. Advanced Image Composition with Intra-Frame Drift Correction
Published: 7/19/2011
Authors: Petr Cizmar, Andras Vladar, Michael T Postek
Abstract: Drift Corrected Image Composition (DCIC) is a real-time technique that allows for acquiring significantly more accurate images compare to traditional slow or fast imaging methods.[Ref.] It is especially useful in nanometer-scale imaging and metrolog ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908494

26. TSOM Method for Semiconductor Metrology
Published: 4/18/2011
Authors: Ravikiran Attota, Ronald G Dixson, John A Kramar, James Edward Potzick, Andras Vladar, Benjamin D. Bunday, Erik Novak, Andrew C. Rudack
Abstract: Through-focus scanning optical microscopy (TSOM) is a new metrology method that achieves 3D nanoscale measurement resolution using conventional optical microscopes; measurement sensitivities are comparable to what is typical using Scatterometry, SEM ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908177

27. FRACTIONAL DIFFUSION, LOW EXPONENT LEVY STABLE LAWS, AND SLOW MOTION DENOISING OF HELIUM ION MICROSCOPE NANOSCALE IMAGERY
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 7727
Published: 9/30/2010
Authors: Alfred S Carasso, Andras Vladar
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906883

28. Advances in Modeling of Scanning Charged-Particle-Microscopy Images
Published: 9/19/2010
Authors: Petr Cizmar, Andras Vladar, Michael T Postek
Abstract: Modeling scanning electron microscope (SEM) and scanning ion microscope images has recently become necessary, because of its ability to provide repeatable images with a priori determined parameters. Modeled artificial images have been used in eva ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905723

29. NEW Scanning Electron Microscope Magnification Calibration Reference Material (RM) 8820
Published: 8/19/2010
Authors: Michael T Postek, Andras Vladar, William J. Keery, Michael Bishop, Benjamin Bunday, John Allgair
Abstract: Reference Material 8820 (RM 8820) is a new scanning electron microscope calibration reference material for nanotechnology and nanomanufacturingtion recently released by NIST. This standard was developed to be used primarily for X and Y scale (or magn ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905372

30. Reference Material (RM) 8820: A Versatile New NIST Standard for Nanometrology
Published: 7/19/2010
Authors: Michael T Postek, Andras Vladar, William J. Keery, Michael R Bishop, Benjamin Bunday, John Allgair
Abstract: A new multipurpose instrument calibration standard has been released by NIST. This standard was developed to be used primarily for X and Y scale (or magnifi cation) calibrations of scanning electron microscopes from less than 10 times magnification t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905034



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