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You searched on: Author: andras vladar

Displaying records 11 to 20 of 163 records.
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11. Low-Loss Electron Imagine for Enhanced Surface Detail in the Scanning Electron Microscope: The Contributions of Oliver C. Wells
Published: 1/7/2015
Authors: Michael T Postek, Andras Vladar
Abstract: Low-loss electron (LLE) imaging in the scanning electron microscope (SEM) is based on the collection of energy-filtered backscattered electrons that have undergone minimal elastic interactions within a sample and therefore can carry high-resolution, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=917444

12. Recovery of background structures in nanoscale Helium Ion Microscope imaging, and the use of progressive fractional diffusion smoothing.
Series: Journal of Research (NIST JRES)
Report Number: 119.030
Published: 12/31/2014
Author: Andras Vladar
Abstract: This paper discusses a two step enhancement technique applicable to noisy Helium Ion Microscope images in which background structures are not easily discernible due to a weak signal. The method is based on a preliminary adaptive histogram equaliz ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=917366

13. Nanomanufacturing Concerns about Measurements made in the SEM Part III: Vibration and Drift
Published: 12/1/2014
Authors: Michael T Postek, Andras Vladar, Petr Cizmar
Abstract: Many advanced manufacturing processes employ scanning electron microscopes (SEM) for on-line critical measurements for process and quality control. This is the third of a series of papers discussing various causes of measurement uncertainty in scanne ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=916170

14. 3D Monte Carlo modeling of the SEM: Are there applications to photomask metrology?
Published: 10/23/2014
Authors: John S Villarrubia, Andras Vladar, Michael T Postek
Abstract: The ability to model the effect of fields due to charges trapped in insulators with floating conductors has been added to JMONSEL (Java Monte Carlo simulator for Secondary Electrons) and applied to a simple photomask metal on glass geometry. These ca ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=917204

15. Does Your SEM Really Tell the Truth? - How would you know? Part 3: Vibration and Drift
Published: 8/1/2014
Authors: Michael T Postek, Andras Vladar, Petr Cizmar
Abstract: This is the third of a series of papers discussing various causes of measurement uncertainty in scanned particle beam instruments, and some of the solutions researched and developed at NIST. Scanned particle beam instruments especially the scanning e ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=916112

16. Does Your SEM Really Tell the Truth? How Would You Know? Part 2
Published: 5/30/2014
Authors: Michael T Postek, Andras Vladar, Premsagar Purushotham Kavuri
Abstract: The scanning electron microscope (SEM)has gone through a tremendous evolution to become indispensable for many and diverse scientific and industrial applications. The improvements have significantly enriched and augmented the overall SEM performance ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915610

17. Optimizing Hybrid Metrology through a Consistent Multi-Tool Parameter Set and Uncertainty Model
Published: 4/14/2014
Authors: Richard M Silver, Bryan M Barnes, Nien F Zhang, Hui Zhou, Andras Vladar, John S Villarrubia, Regis J Kline, Daniel Franklin Sunday, Alok Vaid
Abstract: There has been significant interest in hybrid metrology as a novel method for reducing overall measurement uncertainty and optimizing measurement throughput (speed) through rigorous combinations of two or more different measurement techniques into a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915846

18. 10 nm Three-Dimensional CD-SEM Metrology
Published: 4/10/2014
Authors: Andras Vladar, John S Villarrubia, Bin Ming, Regis J Kline, Jasmeet Chawla, Scott List, Michael T Postek
Abstract: The shape and dimensions of a challenging pattern have been measured using a model-based library scanning electron microscope (MBL SEM) technique. The sample consisted of a 4-line repeating pattern. Lines were narrow (10 nm), asymmetric (different ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915705

19. Optical volumetric inspection of sub-20 nm patterned defects with wafer noise
Published: 4/2/2014
Authors: Bryan M Barnes, Francois R. Goasmat, Martin Y Sohn, Hui Zhou, Richard M Silver, Andras Vladar, Abraham Arceo
Abstract: We have previously introduced a new data analysis method that more thoroughly utilizes scattered optical intensity data collected during defect inspection using bright-field microscopy. This volumetric approach allows conversion of focus resolved 2-D ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915807

20. Documentation for Reference Material (RM) 8820: A Versatile, Multipurpose Dimensional Metrology Calibration Standard for Scanned Particle Beam, Scanned Probe and Optical Microscopy
Series: Special Publication (NIST SP)
Report Number: 1170
Published: 2/3/2014
Authors: Michael T Postek, Andras Vladar, Bin Ming, Bunday Benjamin
Abstract: Reference Material (RM) 8820 is a multipurpose instrument calibration standard available from NIST. This is a dimensional standard initially developed to replace the out of stock RM 8090 used for X and Y scale calibrations of scanned particle beam mi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914808



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