Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).

View the beta site
NIST logo

Publications Portal

You searched on: Author: andras vladar

Displaying records 11 to 20 of 166 records.
Resort by: Date / Title


11. Optimizing Hybrid Metrology: Rigorous Implementation of Bayesian and Combined Regression
Published: 3/19/2015
Authors: Mark Alexander Henn, Richard M Silver, Nien F Zhang, Hui Zhou, Bryan M Barnes, Bin Ming, Andras Vladar, John S Villarrubia
Abstract: Hybrid metrology, e.g. the combination of several measurement techniques to determine critical dimensions, is an important approach to meet the needs of semiconductor industry. A proper use of hybrid metrology may not only yield more reliable estimat ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=918217

12. Effects of wafer noise on the detection of 20 nm defects using optical volumetric inspection
Published: 2/11/2015
Authors: Bryan M Barnes, Francois R. Goasmat, Martin Y Sohn, Hui Zhou, Andras Vladar, Richard M Silver
Abstract: Patterning imperfections in semiconductor device fabrication may either be noncritical [e.g., line edge roughness (LER)] or critical, such as defects that impact manufacturing yield. As the sizes of the pitches and linewidths decrease in lithography, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=916347

13. New Insights into Subsurface Imaging of Carbon Nanotubes in Polymer Composites via Scanning Electron Microscopy
Published: 2/4/2015
Authors: Minhua Zhao, Bin Ming, Jae-Woo Kim, Luke J Gibbons, Xiaohong Gu, Tinh Nguyen, Cheol Park, Peter T Lillehei, John S Villarrubia, Andras Vladar, James Alexander Liddle
Abstract: Despite many studies of subsurface imaging of carbon nanotube (CNT)-polymer composites via scanning electron microscopy (SEM), significant controversy exists concerning the imaging depth and contrast mechanisms. We studied CNT-polyimide composites an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=917530

14. Low-Loss Electron Imagine for Enhanced Surface Detail in the Scanning Electron Microscope: The Contributions of Oliver C. Wells
Published: 1/7/2015
Authors: Michael T Postek, Andras Vladar
Abstract: Low-loss electron (LLE) imaging in the scanning electron microscope (SEM) is based on the collection of energy-filtered backscattered electrons that have undergone minimal elastic interactions within a sample and therefore can carry high-resolution, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=917444

15. Recovery of background structures in nanoscale Helium Ion Microscope imaging, and the use of progressive fractional diffusion smoothing.
Series: Journal of Research (NIST JRES)
Report Number: 119.030
Published: 12/31/2014
Author: Andras Vladar
Abstract: This paper discusses a two step enhancement technique applicable to noisy Helium Ion Microscope images in which background structures are not easily discernible due to a weak signal. The method is based on a preliminary adaptive histogram equaliz ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=917366

16. Nanomanufacturing Concerns about Measurements made in the SEM Part III: Vibration and Drift
Published: 12/1/2014
Authors: Michael T Postek, Andras Vladar, Petr Cizmar
Abstract: Many advanced manufacturing processes employ scanning electron microscopes (SEM) for on-line critical measurements for process and quality control. This is the third of a series of papers discussing various causes of measurement uncertainty in scanne ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=916170

17. 3D Monte Carlo modeling of the SEM: Are there applications to photomask metrology?
Published: 10/23/2014
Authors: John S Villarrubia, Andras Vladar, Michael T Postek
Abstract: The ability to model the effect of fields due to charges trapped in insulators with floating conductors has been added to JMONSEL (Java Monte Carlo simulator for Secondary Electrons) and applied to a simple photomask metal on glass geometry. These ca ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=917204

18. Does Your SEM Really Tell the Truth? - How would you know? Part 3: Vibration and Drift
Published: 8/1/2014
Authors: Michael T Postek, Andras Vladar, Petr Cizmar
Abstract: This is the third of a series of papers discussing various causes of measurement uncertainty in scanned particle beam instruments, and some of the solutions researched and developed at NIST. Scanned particle beam instruments especially the scanning e ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=916112

19. Does Your SEM Really Tell the Truth? How Would You Know? Part 2
Published: 5/30/2014
Authors: Michael T Postek, Andras Vladar, Premsagar Purushotham Kavuri
Abstract: The scanning electron microscope (SEM)has gone through a tremendous evolution to become indispensable for many and diverse scientific and industrial applications. The improvements have significantly enriched and augmented the overall SEM performance ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915610

20. Optimizing Hybrid Metrology through a Consistent Multi-Tool Parameter Set and Uncertainty Model
Published: 4/14/2014
Authors: Richard M Silver, Bryan M Barnes, Nien F Zhang, Hui Zhou, Andras Vladar, John S Villarrubia, Regis J Kline, Daniel Franklin Sunday, Alok Vaid
Abstract: There has been significant interest in hybrid metrology as a novel method for reducing overall measurement uncertainty and optimizing measurement throughput (speed) through rigorous combinations of two or more different measurement techniques into a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=915846



Search NIST-wide:


(Search abstract and keywords)


Last Name:
First Name:







Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series