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Author: andras vladar

Displaying records 11 to 20 of 150 records.
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11. Nanomanufacturing concerns about Measurements made in the SEM I: Imaging and its Measurement
Published: 11/1/2013
Authors: Michael T Postek, Andras Vladar
Abstract: The high resolution of the SEM is especially useful for qualitative and quantitative applications for both nanotechnology and nanomanufacturing. But, should users be concerned about the imaging and measurements made with this instrument? Perhaps one ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914029

12. Three-dimensional deep sub-wavelength defect detection using (lambda) = 193 nm optical microscopy
Published: 10/25/2013
Authors: Bryan M Barnes, Martin Y Sohn, Francois R. Goasmat, Hui H. Zhou, Andras Vladar, Richard M Silver, Abraham Arceo
Abstract: Identifying defects in photolithographic patterning is a persistent challenge in semiconductor manufacturing. Well-established optical methods in current use are jeopardized by upcoming sub-20 nm device dimensions. Volumetric processing of focus-reso ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914244

13. Dimensional Metrology and Imaging of Cellulose Nanocrystals
Published: 6/14/2013
Authors: Michael T Postek, Andras Vladar
Abstract: Cellulose nanocrystals are one group of nanoparticles that have high potential economic value but, also present many basic research and manufacturing challenges. These challenges are not only in development of the fundamental processes needed for the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914004

14. Does Your SEM Really Tell the Truth?
Published: 8/1/2012
Authors: Michael T Postek, Andras Vladar
Abstract: The scanning electron microscope (SEM) has gone through a tremendous evolution to become a critical tool for many, diverse scientific and industrial applications. The high resolution of the SEM is especially useful for qualitative and quantitative ap ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910663

15. Nanoparticle Size and Shape Evaluation Using the TSOM Method
Published: 6/1/2012
Authors: Bradley N Damazo, Ravikiran Attota, Premsagar Purushotham Kavuri, Andras Vladar
Abstract: A novel through-focus scanning optical microscopy (TSOM) method that yields nanoscale information from optical images obtained at multiple focal planes will be used here for nanoparticle dimensional analysis. The TSOM method can distinguish not only ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911138

16. Can We Get 3D CD Metrology Right?
Published: 4/19/2012
Authors: Andras Vladar, John S Villarrubia, Michael T Postek, Petr Cizmar
Abstract: Our world is three-dimensional, so are the integrated circuits (ICs), they have always been. In the past, for a long time, we‰ve been very fortunate, because it was enough to measure the critical dimension (CD), the width of the resist line to keep I ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911117

17. Contour Metrology using Critical Dimension Atomic Force Microscopy
Published: 4/9/2012
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Bin Ming, Michael T Postek
Abstract: The critical dimension atomic force microscope (CD-AFM), which is used as a reference instrument in lithography metrology, has been proposed as a supplemental instrument for contour measurement and verification. However, although data from CD-AFM is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910915

18. Fractional Diffusion, Low Exponent Levy Stable Laws, and Slow Motion Denoising of Helium Ion Microscope Nanoscale Imagery
Series: Journal of Research (NIST JRES)
Report Number: 117.006
Published: 2/22/2012
Authors: Andras Vladar, Alfred S Carasso
Abstract: Helium ion microscopes (HIM) are capable of acquiring images with better than 1nm resolution, and HIM images are particularly rich in morphological surface details. However, such images are generally quite noisy. A major challenge is to denoise the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906607

19. Strategies for Nanoscale Contour Metrology using Critical Dimension Atomic Force Microscopy
Published: 9/30/2011
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Michael T Postek
Abstract: Contour metrology is one of the techniques used to verify optical proximity correction (OPC) in lithography models. The use of these methods, which are known as resolution enhancement techniques (RET), are necessitated by the continued decrease in f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909559

20. Real-Time Image Composition with Correction of Drift Distortion
Published: 9/20/2011
Authors: Petr Cizmar, Andras Vladar, Michael T Postek
Abstract: In this article, a new scanning electron microscopy (SEM) image composition technique is de- scribed, which can significantly reduce drift-distortion related image corruptions. Drift-distortion commonly causes blur and distortions in the SEM ima ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903741



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