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You searched on: Author: andras vladar

Displaying records 131 to 140 of 154 records.
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131. Final Report, 1998-1999 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critical-Dimension Meetrology for Semiconductor Manufacturing
Published: 12/14/1999
Authors: Andras Vladar, Michael T Postek
Abstract: Beginning on or about January 15, 1999, researchers at the National Institute of Standards and Technology (NIST) received partial support from ISEMATECH to collaborate in a mutually defined program designated 1998-1999 NIST/ISEMATECH Collaboration fo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823124

132. Image Sharpness Measurement in Scanning Electron Microscope - Part III
Published: 7/1/1999
Authors: Samuel N Jones, Robert D. Larrabee, Michael T Postek, Andras Vladar, Nien F Zhang
Abstract: Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821795

133. Toward a Unified Advanced CD-SEM Specification for Sub 0.18 Micrometer Technology
Published: 6/1/1998
Authors: J Allgair, C Archie, W Banke, H Bogardus, J Griffith, H Marchman, Michael T Postek, L Saraf, J Schlesinger, B Singh, N. Sullivan, L Trimble, Andras Vladar, A Yanof
Abstract: The stringent critical dimension (CD) control requirements in cutting edge device facilities have placed significant demands on metrologists and upon the tools they use. We are developing a unified, advanced critical dimension scanning electron micro ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823089

134. Inverse Electron Beam Modeling and Metrology Research
Published: 4/1/1998
Authors: Michael T Postek, Andras Vladar, J R. Lowney, Robert D. Larrabee, William J. Keery
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821790

135. Final Report, 1997-1998 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critical-dimension Metrology for Semiconductor Manufacturing
Published: 3/30/1998
Authors: Andras Vladar, Michael T Postek
Abstract: Beginning on or about April 1, 1997, the National Institute of Standards and Technology (NIST) received partial support from SEMATECH to collaborate in a program designated 1997-1998 NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critic ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823100

136. Image Sharpness Measurement in Scanning Electron Microscopy - Part I
Published: 1/1/1998
Authors: Michael T Postek, Andras Vladar
Abstract: This study introduces the idea of the sharpness concept in relationship to the determination of scanning electron microscope (SEM) perfomance. Scanning electron microscopes are routinely used in many manufacturing environments. Fully automated or sem ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820906

137. Fourier Transform Feedback for Scanning Electron Microscopes Used in Semiconductor Metrology
Published: 7/1/1997
Authors: Michael T Postek, Andras Vladar, M P Davidson
Abstract: The utility of the sharpness concept for use on metrology scanning electron microscopes (SEM) as implemented through the Fourier transform technique has been clearly demonstrated and documented. The original methods for sharpness analysis were labor- ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820866

138. Inexpensive Digital Imaging?
Published: 6/1/1997
Authors: Michael T Postek, Andras Vladar
Abstract: The capture of digital images through the use of a frame grabber provides tremendous advantages to scanning electron microscopy. Accessory frame grabbers can range in price from very inexpensive to several thousand dollars. This work investigates the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820865

139. Performance Analysis Tool for Scanning Electron Microscopes Used in Semiconductor Metrology
Published: 4/1/1997
Authors: Michael T Postek, Andras Vladar, M P Davidson
Abstract: Scanning electron microscopes (SEM) are being utilized extensively in the production environment, and these instruments are approaching full automation. Once a human operator is no longer monitoring the instrument''s performance and multiple instrume ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820867

140. High-Accuracy Critical-Dimension Metrology Using a Scanning Electron Microscope
Published: 12/31/1996
Authors: J R. Lowney, Andras Vladar, Michael T Postek
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=24182



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