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Author: andras vladar

Displaying records 111 to 120 of 148 records.
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111. SEM Sentinel - SEM Performance Measurement System
Published: 1/1/2001
Authors: Bradley N Damazo, Andras Vladar, Alice V. Ling, M Alkan Donmez, Michael T Postek, Crossley E Jayewardene
Abstract: This paper describes the design and implementation of a system for monitoring the performance of a critical dimension measurement scanning electron microscope (CD-SEM). Experiments were performed for tests involving diagnosis of the vacuum system an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823137

112. Linewidth Measurement Intercomparison on a BESOI Sample
Published: 12/31/2000
Authors: A. E. Villarrubia, Andras Vladar, J R. Lowney, Michael T Postek, Richard A Allen, Michael W Cresswell, Rathindra Ghoshtagore
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=2684

113. NIST/SEMATECH Collaboration: Application of Nano-Tips to Production CD-SEMs
Published: 11/15/2000
Authors: Andras Vladar, Michael T Postek
Abstract: This work documents the first part of a two-part study about the application of nano-tips to critical dimension (CD) scanning electron microscopes used in integrated circuit production.  Nano-tips, by comparison to all conventional cold, thermal ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823133

114. Linewidth Intercomparison on a Polysilicon Sample
Published: 11/1/2000
Authors: John S Villarrubia, Andras Vladar, Michael T Postek, Ronald G Dixson
Abstract: Not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821574

115. Benchmarking of Advanced CD-SEMs Against the New Unified Specification for Sub-0.18 Micrometer Lithography
Published: 8/18/2000
Authors: A Deleporte, J Allgair, C Archie, G Banke, Michael T Postek, J Schlesinger, Andras Vladar, A Yanof
Abstract: The Advanced Metrology Advisory Group (AMAG) comprised of representatives from International SEMATECH consortium member companies and the National Institute of Standards and Technology have joined to develop a new unified specification for an advance ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824620

116. Benchmarking of Advanced CD-SEMs Against the New Unified Specification for Sub-0.18 Micrometer Lithography
Published: 6/2/2000
Authors: A Deleporte, J Allgair, C Archie, G Banke, Michael T Postek, J Schlesinger, Andras Vladar, A Yanof
Abstract: The Advanced Metrology Advisory Group (AMAG) comprised of representatives from International SEMATECH consortium member companies and the National Institute of Standards and Technology have joined to develop a new unified specification for an advance ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821785

117. Is a Production Level Scanning Electron Microscope Linewidth Standard Possible?
Published: 6/1/2000
Authors: Michael T Postek, Andras Vladar, John S Villarrubia
Abstract: Metrology will remain a pricipal enabler for the development and manufacture of future generations of semiconductor devices. With the potential of 130 nm and 100 nm linewidths and high aspect ratio structures, the scanning electron microscope (SEM) r ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823127

118. Is a Production-Level Scanning Electron Microscope Linewidth Standard Possible?
Published: 6/1/2000
Authors: Michael T Postek, Andras Vladar, John S Villarrubia
Abstract: Metrology will remain a principal enabler for the development and manufacture of future generations of semiconductor devices. With the potential of 130 and l00-nanometer linewidths and high aspect ratio structures, the scanning electron microscope (S ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820974

119. Linewidth Measurement Intercomparison on a BESOI Sample
Published: 6/1/2000
Authors: John S Villarrubia, Andras Vladar, J R. Lowney, Michael T Postek, Richard A Allen, Michael W Cresswell, Rathindra Ghoshtagore
Abstract: The effect of the instrument on the measurement must be known in order to generate an accurate linewidth measurement. Although instrument models exist for a variety of techniques, how does one assess the accuracy of these models? Intercomparisons bet ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820989

120. Potentials of On-Line Scanning Electron Microscope Performance Analysis Using NIST Reference Material 8091
Published: 6/1/2000
Authors: Michael T Postek, Andras Vladar, Nien F Zhang, Robert D. Larrabee
Abstract: Fully automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an important aspect ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820975



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