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Author: andras vladar

Displaying records 111 to 120 of 146 records.
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111. NIST/SEMATECH Collaboration: Application of Nano-Tips to Production CD-SEMs
Published: 11/15/2000
Authors: Andras Vladar, Michael T Postek
Abstract: This work documents the first part of a two-part study about the application of nano-tips to critical dimension (CD) scanning electron microscopes used in integrated circuit production.  Nano-tips, by comparison to all conventional cold, thermal ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823133

112. Linewidth Intercomparison on a Polysilicon Sample
Published: 11/1/2000
Authors: John S Villarrubia, Andras Vladar, Michael T Postek, Ronald G Dixson
Abstract: Not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821574

113. Benchmarking of Advanced CD-SEMs Against the New Unified Specification for Sub-0.18 Micrometer Lithography
Published: 8/18/2000
Authors: A Deleporte, J Allgair, C Archie, G Banke, Michael T Postek, J Schlesinger, Andras Vladar, A Yanof
Abstract: The Advanced Metrology Advisory Group (AMAG) comprised of representatives from International SEMATECH consortium member companies and the National Institute of Standards and Technology have joined to develop a new unified specification for an advance ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824620

114. Benchmarking of Advanced CD-SEMs Against the New Unified Specification for Sub-0.18 Micrometer Lithography
Published: 6/2/2000
Authors: A Deleporte, J Allgair, C Archie, G Banke, Michael T Postek, J Schlesinger, Andras Vladar, A Yanof
Abstract: The Advanced Metrology Advisory Group (AMAG) comprised of representatives from International SEMATECH consortium member companies and the National Institute of Standards and Technology have joined to develop a new unified specification for an advance ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821785

115. Is a Production Level Scanning Electron Microscope Linewidth Standard Possible?
Published: 6/1/2000
Authors: Michael T Postek, Andras Vladar, John S Villarrubia
Abstract: Metrology will remain a pricipal enabler for the development and manufacture of future generations of semiconductor devices. With the potential of 130 nm and 100 nm linewidths and high aspect ratio structures, the scanning electron microscope (SEM) r ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823127

116. Is a Production-Level Scanning Electron Microscope Linewidth Standard Possible?
Published: 6/1/2000
Authors: Michael T Postek, Andras Vladar, John S Villarrubia
Abstract: Metrology will remain a principal enabler for the development and manufacture of future generations of semiconductor devices. With the potential of 130 and l00-nanometer linewidths and high aspect ratio structures, the scanning electron microscope (S ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820974

117. Linewidth Measurement Intercomparison on a BESOI Sample
Published: 6/1/2000
Authors: John S Villarrubia, Andras Vladar, J R. Lowney, Michael T Postek, Richard A Allen, Michael W Cresswell, Rathindra Ghoshtagore
Abstract: The effect of the instrument on the measurement must be known in order to generate an accurate linewidth measurement. Although instrument models exist for a variety of techniques, how does one assess the accuracy of these models? Intercomparisons bet ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820989

118. Potentials of On-Line Scanning Electron Microscope Performance Analysis Using NIST Reference Material 8091
Published: 6/1/2000
Authors: Michael T Postek, Andras Vladar, Nien F Zhang, Robert D. Larrabee
Abstract: Fully automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an important aspect ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820975

119. Applications of SEM Monte Carlo Modeling to Geometry Determination in Single-Crystal Silicon Test Patterns
Published: 5/1/2000
Authors: John S Villarrubia, Andras Vladar, J R. Lowney, Samuel N Jones, Michael T Postek
Abstract: Width measurements pose a particularly problematic calibration problem. The measurement entails determining the distance between inherently dissimilar edges. Even in the simplest imaginable case, an ideal line of rectangular cross section, the left a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820987

120. SEM Sentinel - SEM Performance Measurement System, Part 1
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6498
Published: 4/1/2000
Authors: Alice V. Ling, Andras Vladar, Bradley N Damazo, M Alkan Donmez, Michael T Postek
Abstract: This report describes the current design of a system for monitoring the performance of several major subsystems of a scanning electron microscope (SEM). The following subsystems and the associated functional parameters will be monitored. 1) Vacuum sy ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821786



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