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Author: andras vladar

Displaying records 101 to 110 of 150 records.
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101. Trial Shape-Sensitive Linewidth Measurement System
Published: 11/1/2001
Authors: John S Villarrubia, Andras Vladar, Michael T Postek
Abstract: This is a report for a project to develop a scanning electron microscope (SEM) based shape-sensitive linewidth measurement system by improving the method by improving the method by which SEM data are analyzed. We report significant developments in al ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822433

102. Application of the Low-Loss Scanning Electron Microscope Image to Integrated Circuit Technology Part 1-Applications to Accurate Dimension Measurements
Published: 9/1/2001
Authors: Michael T Postek, Andras Vladar, O C Wells, J R. Lowney
Abstract: Scanning electron microscopes are the most extensively used tools for dimensional metrology and defect inspection for integrated circuit technologies with 180 nm and smaller features. Currently almost all SEMs are designed to collect as many electron ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821584

103. Active Monitoring and Control of Electron-Beam-Induced Contaminaition
Published: 8/1/2001
Authors: Andras Vladar, Michael T Postek, R Vane
Abstract: The vacuum system of all scanning electron microscopes (SEMs), even in the so-called clean instruments, have certain hydrocarbon residues that the vacuum pumps do not effectively remove. The cleanliness of the vacuum and the amount and nature of the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823135

104. Active Monitoring and Control of Electron-Beam-Induced Contamination
Published: 8/1/2001
Authors: Andras Vladar, Michael T Postek, R Vane
Abstract: The vacuum systems of all scanning electron microscopes (SEMs), even in the so-called clean instruments, have certain hydrocarbon residues that the vacuum pumps do not effectively remove. The cleanliness of the vacuum and the amount and nature of the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821580

105. Edge Determination for Polycrystalline Silicon Lines on Gate Oxide
Published: 8/1/2001
Authors: John S Villarrubia, Andras Vladar, J R. Lowney, Michael T Postek
Abstract: In a scanning electron microscope (SEM) top-down secondary electron image, areas within a few tens of nanometers of the line edges arc characteristically brighter than the rest of the image. In general, the shape of the secondary electron signal with ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821577

106. Reference Material 8091: New Scanning Electron Microscope Sharpness Standard
Published: 8/1/2001
Authors: Andras Vladar, Michael T Postek, Nien F Zhang, Robert D. Larrabee, Samuel N Jones, Russell E Hajdaj
Abstract: All scanning electron microscope-based inspection instruments, whether they are in a laboratory or on the production line, slowly lose their performance and then the instrument is no longer capable of providing as good quality, sharp images as before ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821578

107. Reference Material 8091: New Scanning Electron Microscope Sharpness Standard
Published: 8/1/2001
Authors: Andras Vladar, Michael T Postek, Nien F Zhang, Robert D. Larrabee, Samuel N Jones, Russell E Hajdaj
Abstract: Reference Material (RM 8091) is intended primarily for use in checking the sharpness performance of scanning electron microscopes. It is supplied as a small, approximately 2 mm x 2 mm diced semiconductor chip. This sample is capable of being mounted ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823136

108. SEM Sentinel-SEM Performance Measurement System
Published: 8/1/2001
Authors: Bradley N Damazo, Andras Vladar, Alice V. Ling, M. Alkan Donmez, Michael T Postek, Crossley E Jayewardene
Abstract: This paper describes the design and implementation of a system for monitoring the performance of a critical dimension measurement scanning electron microscope (CD-SEM). Experiments were performed for tests involving diagnosis of the vacuum system and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821586

109. Critical Dimension Metrology in the Scanning Electron Microscope
Published: 6/29/2001
Authors: Michael T Postek, Andras Vladar
Abstract: Metrology is a principal enabler for the development and manufacture of current and future generations of semiconductor devices. With the potential of 130, 100 nanometer and even smaller linewidths and high aspect ratio structures, the scanning elect ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820972

110. Report of Investigation: Reference Material 8091 - Scanning Electron Microscope Sharpness Standard
Published: 5/10/2001
Authors: Michael T Postek, Andras Vladar, Robert D. Larrabee
Abstract: Reference Material (RM 8091) is intended primarily for use in checking the sharpness performance of scanning electron microscopes. It is supplied as a small (2 rnrn x 2 rnm) diced semiconductor chip. This sample is capable of being mounted directly ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821789



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