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You searched on: Author: andras vladar

Displaying records 101 to 110 of 163 records.
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101. Photomask Dimensional Metrology in the SEM Part I: Has Anything Really Changed?
Published: 1/1/2003
Authors: Michael T Postek, Andras Vladar, Marylyn H. Bennett
Abstract: Photomask dimensional metrology in the scanning electron microscope (SEM) has not evolved as rapidly as the metrology of resists and integrated circuit features on wafers. This has been due partly to the 4x (or 5x) reduction in the optical steppers a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822020

102. Photomask Dimensional Metrology in the SEM: Has Anything Really Changed?
Published: 12/1/2002
Authors: Michael T Postek, Andras Vladar, Marylyn H. Bennett
Abstract: Photomask dimensional metrology in the scanning electron microscope (SEM) has not evolved as rapidly as the metrology of resists and integrated circuit features on wafers. This has been due partly to the 4x (or 5x) reduction in the optical steppers a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821958

103. APEX Method and Real-Time Blind Deconvolution of Scanning Electron Microscope Imagery
Published: 10/1/2002
Authors: Alfred S Carasso, David S. Bright, Andras Vladar
Abstract: Loss of resolution due to image blurring is a major concern in electron microscopy. The point spread function describing that blur is generally unknown. Wer discuss the use of a recently developed fast Fourier transform (FFT)-based direct (nonitera ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831241

104. Scanning Electron Microscope Analog of Scatterometry
Published: 7/1/2002
Authors: John S Villarrubia, Andras Vladar, J R. Lowney, Michael T Postek
Abstract: Optical scatterometry has attracted a great deal of interest for linewidth measurement due to its high repeatability and capability of measuring sidewall shape. We have developed an analogous and complementary technique for the scanning electron micr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821756

105. Two-Dimensional Simulation and Modeling in Scanning Electron Microscope Imaging and Metrology Research
Published: 7/1/2002
Authors: Michael T Postek, Andras Vladar, J R. Lowney, William J. Keery
Abstract: Traditional Monte Carlo modeling of the electron beam specimen interactions in a scanning electron microscope (SEM) produces information about electron beam penetration and output signal generation at either a single beam landing location, or multipl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822435

106. Two-dimensional Simulation Modeling in Imaging and Metrology Research
Published: 7/1/2002
Authors: Michael T Postek, Andras Vladar, J R. Lowney, William J. Keery
Abstract: Traditional Monte Carlo modeling of the electron beam-specimen interactions in a scanning electron microscope (SEM) produces information about electron beam penetration and output signal generation at either a single beam-landing location, or multipl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821738

107. Silicon Nanostructures Fabricated by Scanning Probe Oxidation and Tetramethyl Ammonium Hydroxide Etching
Published: 6/15/2002
Authors: F S Chien, W F Hsieh, S Gwo, Andras Vladar, John A Dagata
Abstract: Fabrication of silicon nanostructures is a key technique for the development of monolithically integrated optoelectronic circuits. We demonstrate that the process of scanning probe lithography (SPL) and anisotropic TMAH etching is a low-cost and reli ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821774

108. Design and Development of a Measurement and Control System for Measuring SEM Magnification Calibration Samples
Published: 6/1/2002
Authors: Crossley E Jayewardene, William J. Keery, Michael T Postek, Andras Vladar, Bradley N Damazo
Abstract: The National Institute of Standards and Technology (NIST) has provided industry with a scanning electron microscope (SEM) magnification calibration sample Reference Material (RM) 8090. The certified, Standard Reference Material (SRM) version, SRM 209 ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821755

109. Studies of Samples Having Shallow Surface Topography by the Low-Loss Electron (LLE) Method in the Scanning Electron Microscope (SEM)
Published: 3/1/2002
Authors: O C Wells, M Mcglashen-powell, Michael T Postek, Andras Vladar
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821793

110. Silicon Nanostructures Fabricated by Scanning Probe Lithography and TMAH Etching
Published: 1/1/2002
Authors: F S Chien, W F Hsieh, S Gwo, Andras Vladar, John A Dagata
Abstract: Fabrication of silicon nanostructures is a key technique for the development of monolithically integrated optoelectronic circuits. We demonstrate that the process of scanning probe lithography (SPL) and anisotropic TMAH etching is a low-cost and rel ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823149



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