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Author: john villarrubia

Displaying records 71 to 80 of 85 records.
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71. Characterization of Multi-phase and Multi-component Polymers using the Atomic Force Microscope
Published: 1/1/1997
Authors: Mark R VanLandingham, John S Villarrubia, G Meyers, M Dineen
Abstract: Abstract not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821592

72. Experimental Results of Blind Reconstruction of STM Tips
Published: 1/1/1997
Authors: Carsten P. Jensen, Richard M Silver, John S Villarrubia
Abstract: Abstract not available.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820896

73. Tip and Surface Reconstruction in Scanned Probe Microscopy
Published: 1/1/1997
Author: John S Villarrubia
Abstract: The non-vanishing size of tips in scanned probe microscopes (e.g., atomic force microscope or scanning tunneling microscope) results in imaging errors. Correction of these errors requires estimation of the tip shape (tip reconstruction) followed by e ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820881

74. Electrical Test Structures Replicated in Silicon-on-Insulator Material
Published: 12/31/1996
Authors: Michael W Cresswell, J. J. Sniegowski, Rathindra Ghoshtagore, Richard A Allen, Loren W. Linholm, John S Villarrubia
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=8218

75. Electrical Test Structures Replicated in Silicon-On-Insulator Material
Published: 5/1/1996
Authors: Michael W Cresswell, J Sniegowski, Rathindra Ghoshtagore, Robert Allen, L Linholm, John S Villarrubia
Abstract: Measurements of the linewidths of submicrometer features made by different metrology techniques have frequently been characterized by differences of up to 90 nm. The purpose of the work reported here is to address the special difficulties that this p ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820785

76. Scanned Probe Microscope Tip Characterization Without Calibrated Tip Characterizers
Published: 3/1/1996
Author: John S Villarrubia
Abstract: In scanned probe microscopy the image is a combination of information from the sample and the tip. In order to reconstruct the true surface geometry, it is necessary to know the actual tip shape. It has been proposed that this shape may be reconstruc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820829

77. Progress Towards Accurate Metrology Using Atomic Force Microscopy
Published: 1/1/1996
Authors: T Mcwaid, J Schneir, John S Villarrubia, Ronald G Dixson, V W. Tsai
Abstract: Accurate metrology using atomic force microscopy (AFM) requires accurate control of the tip position, an estimate of the tip geometry, and an understanding of the tip-surface interaction forces. We describe recent progress at NIST towards accurate AF ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820798

78. Blind Estimation of Tip Geometry from Noisy Images
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 5752
Published: 11/2/1995
Author: John S Villarrubia
Abstract: Broadening of image features due to non-vanishing tip size is a well-known imaging artifact in scanned probe microscopy (SPM) topographs. This need not be a serious limitation for some types of metrology (e.g. pitch or height), but it is significant ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820828

79. Progress on Accurate Metrology of Pitch, Height, Roughness, and Width Artifacts Using an Atomic Force Microscope
Published: 5/1/1995
Authors: J Schneir, T Mcwaid, Ronald G Dixson, V W. Tsai, John S Villarrubia, Edwin Ross Williams, E Fu
Abstract: NIST personnel visited 23 IC manufacturing companies and equipment suppliers during 1994 to determine semiconductor industry needs for scanned probe metrology. NIST has initiated projects addressing some of the needs identified. When complete, these ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820763

80. Increasing the Value of Atomic Force Microscopy Process Metrology Using a High-Accuracy Scanner, Tip Characterization, and Morphological Image Analysis
Published: 1/1/1995
Authors: J Schneir, John S Villarrubia, T Mcwaid, V W. Tsai, Ronald G Dixson
Abstract: Atomic force microscopes are being used increasingly for process metrology. As a case study, the measurement by atomic force microscope of a soda lime glass optical disk patterned using optical lithography and reactive plasma etching is examined. The ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820816



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