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Author: benjamin tsai
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1. A Summary of Lightpipe Radiation Thermometry Research at NIST
Series: Journal of Research (NIST JRES)
Report Number: 111
Published: 1/1/2006
Author: Benjamin K Tsai
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104784

2. A Summary of Lightpipe Radiation Thermometry Research at NIST
Series: Journal of Research (NIST JRES)
Published: 4/1/2006
Author: Benjamin K Tsai
Abstract: During the last ten years, research in lightpipe radiation thermometry has significantly reduced the uncertainties for temperature measurements in semiconductor processing. The National Institute of Standards and Technology (NIST) has improved the c ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840985

3. A collection and statistical analysis of skin reflectance signatures for inherent variability over the 250 nm to 2500 nm spectral range
Published: 6/4/2014
Authors: Catherine C Cooksey, Benjamin K Tsai, David W Allen
Abstract: The spectral reflectance signature of human skin provides opportunities to advance observations ranging from medical treatment to security applications. In this study 28 volunteers participated in a skin reflectance measurement of the inside of the r ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=916057

4. Aperture Proximity Effects in High Heat Flux Sensors Calibration
Series: Journal of Research (NIST JRES)
Published: 11/1/1998
Authors: A V Murthy, Benjamin K Tsai, Robert D. Saunders
Abstract: In transfer calibration of heat flux sensors, a correction for the irradiance distribution across the sensing area may be required when the sensing areas of reference and test sensors are different. A method to calculate this correction using well k ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841297

5. Bidirectional Reflectance Distribution Function of Rough Silicon Wafers
Published: 1/1/2000
Authors: Y J Shen, Z M Zhang, Benjamin K Tsai, D P DeWitt
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104745

6. Bidirectional Reflectance Distribution Function of Rough Silicon Wafers
Published: 7/1/2001
Authors: Y J Shen, Z M Zhang, Benjamin K Tsai, D P DeWitt
Abstract: The trend towards miniaturization of patterning features in integrated circuits (IC) has made traditional batch furnaces inadequate for many processes. Rapid thermal processing (RTP) for silicon wafers has become more popular in recent years for IC ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841468

7. Calibration Wafer for Temperature Measurement in RTP Tools
Published: 1/1/1998
Authors: K G Kreider, D P DeWitt, Benjamin K Tsai, Francis John Lovas, David W Allen
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104583

8. Calibration of High Heat Flux Sensors at NIST
Published: 1/1/1997
Authors: A V Murthy, Benjamin K Tsai
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104052

9. Calibration of High Heat Flux Sensors at NIST
Series: Journal of Research (NIST JRES)
Published: 7/1/1997
Authors: A V Murthy, Benjamin K Tsai, Charles E Gibson
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841258

10. Calibration of Radiation Thermometers in Rapid Thermal Processing Tools Using Si Wafers with Thin Film Thermocouples
Published: 10/1/2003
Authors: Kenneth Gruber Kreider, William Andrew Kimes, Christopher W Meyer, Dean C Ripple, Benjamin K Tsai, D H Chen, D P DeWitt
Abstract: Rapid thermal processing (RTP) tools are currently monitored and controlled with lightpipe radiation thermometers (LPRTs) which have been calibrated with thermocouple instrumented wafers. We have developed a thin-film thermocouple wafer that enables ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830794



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