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Author: benjamin tsai

Displaying records 61 to 70 of 98 records.
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61. Bidirectional Reflectance Distribution Function of Rough Silicon Wafers
Published: 1/1/2000
Authors: Y J Shen, Z M Zhang, Benjamin K Tsai, D P DeWitt
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104745

62. Characterization of Lightpipe Radiation Thermometers for The NIST Test Bed
Published: 1/1/2000
Authors: Benjamin K Tsai, C W Meyer, Francis John Lovas
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104791

63. Impact of Directional Properties on the Radiometric Temperature Measurement in Rapid Thermal Processing
Published: 1/1/2000
Authors: Yong Zhou, Y J Shen, Z M Zhang, Benjamin K Tsai, D P DeWitt
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104822

64. Radiative Calibration of Heat Flux Sensors at NIST- Facilities and Techniques
Published: 1/1/2000
Authors: A V Murthy, Benjamin K Tsai, Robert D. Saunders
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104652

65. Comparative Calibration of Heat Flux Sensors in Two Blackbody Facilities
Series: Journal of Research (NIST JRES)
Published: 11/17/1999
Authors: A V Murthy, Benjamin K Tsai, Robert D. Saunders
Abstract: This paper presents the results of heat flux sensor calibrations in two blackbody facilities: the 25 mm variable temperature blackbody (VTBB) primary facility and a recently developed 51 mm aperture spherical blackbody (SPBB) facility. Three Schmidt- ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841341

66. ITS 90 Calibration of Radiometers Using Wire/Thin-Film Thermocuples in the NIST RTP Tool: Effective Emissivity Modeling
Published: 9/8/1999
Authors: Benjamin K Tsai, D P DeWitt
Abstract: Models were developed to estimate the wafer effective emissivity as a function of the optical properties and geometrical configuration of the wafer and chamber in the NIST Rapid Thermal Processing (RTP) tool. These estimates were used to determine w ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841982

67. ITS-90 Calibration of Radiometers Using Wire/Thin-film Thermocouples in the NIST RTP Tool: Effective Emissivity Modeling
Published: 9/1/1999
Authors: Benjamin K Tsai, D P DeWitt
Abstract: Models were developed to estimate the wafer effective emissivity as a function of the optical properties and geometrical configuration of the wafer and chamber in the NIST Rapid Thermal Processing (RTP) tool. These estimates were used to determine w ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830646

68. Chamber Radiation Effects on Calibration of Radiation Thermometers With a Thin-Film Thermocouple Test Wafer
Published: 6/1/1999
Authors: Benjamin K Tsai, D P DeWitt, Francis John Lovas, Kenneth Gruber Kreider, Christopher W Meyer, David W Allen
Abstract: In the semiconductor industry, Rapid Thermal Processing (RTP) utilizes a prescribed temperature-time recipe to silicon wafers undergoing processes such as annealing and oxide film formation. The National Technology Roadmap for Semiconductors (NTRS) ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841364

69. Modeling Chamber Radiation Effects on Pyrometric Temperature Measurement in Rapid Thermal Processing
Published: 5/2/1999
Authors: F Rosa, Yong Zhou, Z M Zhang, D P DeWitt, Benjamin K Tsai
Abstract: A detailed analysis of the radiation environment in the lower chamber of the RTP test bed at the National Institute of Standard and Technology (NIST) is performed to improve the accuracy of radiation thermometry. The models developed in this work co ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841367

70. Chamber Radiation Effects on Calibration of Radiation Thermometers with a Thin-Film Thermocouple Test Wafer, ed. by J.F. Dubbeldam and M.J. de Groot
Published: 1/1/1999
Authors: Benjamin K Tsai, D P DeWitt, Francis John Lovas, K G Kreider, C W Meyer, David W Allen
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104792



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