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You searched on: Author: benjamin tsai

Displaying records 61 to 70 of 100 records.
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61. Characterization of Lightpipe Radiation Thermometers for the NIST Test Bed
Published: 9/1/2000
Authors: Benjamin K Tsai, Christopher W Meyer, Francis John Lovas
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905181

62. Radiative Calibration of Heat Flux Sensors at NIST: Facilities and Techniques
Series: Journal of Research (NIST JRES)
Published: 3/1/2000
Authors: A V Murthy, Benjamin K Tsai, Robert D. Saunders
Abstract: An overview of the National Institute of Standards and Technology (NIST) high temperature blackbodies, both in operation and in development, suitable for heat flux sensor calibration is presented. Typical results of calibrations using the transfer te ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841420

63. Bidirectional Reflectance Distribution Function of Rough Silicon Wafers
Published: 1/1/2000
Authors: Y J Shen, Z M Zhang, Benjamin K Tsai, D P DeWitt
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104745

64. Characterization of Lightpipe Radiation Thermometers for The NIST Test Bed
Published: 1/1/2000
Authors: Benjamin K Tsai, C W Meyer, Francis John Lovas
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104791

65. Impact of Directional Properties on the Radiometric Temperature Measurement in Rapid Thermal Processing
Published: 1/1/2000
Authors: Yong Zhou, Y J Shen, Z M Zhang, Benjamin K Tsai, D P DeWitt
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104822

66. Radiative Calibration of Heat Flux Sensors at NIST- Facilities and Techniques
Published: 1/1/2000
Authors: A V Murthy, Benjamin K Tsai, Robert D. Saunders
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104652

67. Comparative Calibration of Heat Flux Sensors in Two Blackbody Facilities
Series: Journal of Research (NIST JRES)
Published: 11/17/1999
Authors: A V Murthy, Benjamin K Tsai, Robert D. Saunders
Abstract: This paper presents the results of heat flux sensor calibrations in two blackbody facilities: the 25 mm variable temperature blackbody (VTBB) primary facility and a recently developed 51 mm aperture spherical blackbody (SPBB) facility. Three Schmidt- ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841341

68. ITS 90 Calibration of Radiometers Using Wire/Thin-Film Thermocuples in the NIST RTP Tool: Effective Emissivity Modeling
Published: 9/8/1999
Authors: Benjamin K Tsai, D P DeWitt
Abstract: Models were developed to estimate the wafer effective emissivity as a function of the optical properties and geometrical configuration of the wafer and chamber in the NIST Rapid Thermal Processing (RTP) tool. These estimates were used to determine w ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841982

69. ITS-90 Calibration of Radiometers Using Wire/Thin-film Thermocouples in the NIST RTP Tool: Effective Emissivity Modeling
Published: 9/1/1999
Authors: Benjamin K Tsai, D P DeWitt
Abstract: Models were developed to estimate the wafer effective emissivity as a function of the optical properties and geometrical configuration of the wafer and chamber in the NIST Rapid Thermal Processing (RTP) tool. These estimates were used to determine w ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830646

70. Chamber Radiation Effects on Calibration of Radiation Thermometers With a Thin-Film Thermocouple Test Wafer
Published: 6/1/1999
Authors: Benjamin K Tsai, D P DeWitt, Francis John Lovas, Kenneth Gruber Kreider, Christopher W Meyer, David W Allen
Abstract: In the semiconductor industry, Rapid Thermal Processing (RTP) utilizes a prescribed temperature-time recipe to silicon wafers undergoing processes such as annealing and oxide film formation. The National Technology Roadmap for Semiconductors (NTRS) ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841364



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