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Author: benjamin tsai

Displaying records 31 to 40 of 98 records.
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31. Temperature and Flux Scales for Heat-Flux Sensor Calibration
Published: 9/1/2003
Authors: A V Murthy, D P DeWitt, Benjamin K Tsai, Gerald T Fraser, Robert D. Saunders
Abstract: Methodologies for calibrating heat-flux sensors designed for direct measurement of heat-transfer at a surface are presented. These sensors, extensively used in fire-test methods and aerospace applications, vary in range from a few kW/m^u2^ to in exc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841678

32. Laboratory Apparatus for the Measurement of Optical Extinction Coefficients of Postflame Soot in the Infrared
Published: 2/1/2003
Authors: J F. Widmann, Jiann C Yang, Matthew F Bundy, Benjamin K Tsai, George William Mulholland
Abstract: An experimental apparatus for the measurement of optical extinction coefficients of postflame soot aerosol in the infrared region of the electromagnetic spectrum is presented. Reproducible soot aerosol is generated using a laminar diffusion burner, a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910128

33. Calibration of a Heat Flux Sensor up to 200 kW/m^u2^ in a Spherical Blackbody, Symp. ed. by L.A. Gritzo and N. Alvares
Published: 1/1/2003
Authors: A V Murthy, Benjamin K Tsai, Robert D. Saunders
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104649

34. Effects of Lightpipe Proximity on Si Wafer Temperature in Rapid Thermal Processing Tools
Published: 1/1/2003
Authors: K G Kreider, D H Chen, W A. Kimes, D P DeWitt, Benjamin K Tsai
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104579

35. Lightpipe Proximity Effects on Si Wafer Temperature in Rapid Thermal Processing Tools
Published: 1/1/2003
Authors: K G Kreider, D H Chen, D P DeWitt, W A. Kimes, Benjamin K Tsai
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104580

36. Traceable Temperature Calibrations of Radiation Thermometers for Rapid Thermal Processing
Published: 1/1/2003
Author: Benjamin K Tsai
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104788

37. Effects of Wafer Emissivity on Rapid Thermal Processing Temperature Measurement
Published: 9/1/2002
Authors: D H Chen, D P DeWitt, Benjamin K Tsai, Kenneth Gruber Kreider, William Andrew Kimes
Abstract: Lightpipe radiation thermometers (LPRTs) are widely used to measure wafer temperatures in rapid thermal processing (RTP) tools. Using blackbody-calibrated LPRTs to infer the wafer temperature, it is necessary to build a model to predict the effectiv ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841674

38. Wafer Emissivity Effects on Light Pipe Radiometry in RTP Tools
Published: 5/1/2002
Authors: Kenneth Gruber Kreider, David W Allen, D H Chen, D P DeWitt, Christopher W Meyer, Benjamin K Tsai
Abstract: We investigated the effect of different wafer emissivities and the effect of low emissivity films on RTP wafer temperature measurements using light pipe radiation thermometers (LPRTs). These tests were performed in the NIST RTP test bed. We used a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=830778

39. Calibration of a Heat Flux Sensor Up to 200 kW/m^u2^ in a Spherical Blackbody Cavity
Published: 1/1/2002
Authors: A V Murthy, Benjamin K Tsai, Robert D. Saunders
Abstract: This paper presents the results of a comparative study of narrow view-angle and wide view-angle calibrations of a water-cooled Schmidt-Boelter heat-flux sensor. The narrow view-angle calibration, up to a heat flux level of 50 kW/m2, was conducted us ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841595

40. Effects of Wafer Emissivity on Rapid Thermal Processing Temperature Measurement
Published: 1/1/2002
Authors: D H Chen, D P DeWitt, K G Kreider, Benjamin K Tsai, W A. Kimes
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=104361



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