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Displaying records 1 to 10 of 103 records.
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1. 40 Years of Metrology With Synchrotron Radiation at SURF
Published: 9/1/2003
Authors: Uwe Arp, Steven E Grantham, Simon Grant Kaplan, Ping-Shine Shaw, Charles S Tarrio, Robert Edward Vest
Abstract: the advantages of a compact synchrotron radiation source like the Synchrotron Ultraviolet Radiation Facility for metrology in the ultraviolet and extreme ultraviolet are shown. The capabilities of the different experimental stations are explained an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840164

2. A Novel Wafer-plane Dosimeter for EUV Lithography
Published: 11/1/2009
Authors: Steven E Grantham, Charles S Tarrio
Abstract: Extreme Ultraviolet Lithography (EUVL) incorporates 13.5 nm light for patterning wafers and requires in-situ wafer-plane dosimetry that can be tailored to the requirements of an EUVL stepper‰s environment. There are several types of detectors that a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902737

3. A Simple Transfer-Optics System for an Extreme-Ultraviolet Synchrotron Beamline
Published: 4/1/2005
Authors: Charles S Tarrio, Steven E Grantham, Robert Edward Vest, K Liu
Abstract: Beamlines at synchrotron radiation facilities often have interchangeable endstations to allow several different experiments to use the output of a single monochromator. However, for endstations that are sufficiently large, this is not possible. We ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840198

4. A simple transfer-optics system for an extreme-ultraviolet synchrotron beamline,
Published: 1/1/2005
Authors: Charles S Tarrio, Steven E Grantham, Robert Edward Vest, K Liu
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101759

5. A synchrotron beamline for extreme-ultraviolet multilayer mirror testing,
Published: 1/1/2005
Authors: Charles S Tarrio, Steven E Grantham
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101760

6. A synchrotron beamline for extreme-ultraviolet photoresist testing
Published: 9/30/2011
Authors: Charles S Tarrio, Steven E Grantham, Shannon Bradley Hill, Nadir S. Faradzhev, Lee J Richter, Chester Knurek, Thomas B Lucatorto
Abstract: Before being used in an extreme-ultraviolet (EUV) scanner, photoresists must first be evaluated for sensitivity and tested to ensure that they will not contaminate the scanner optics. The new NIST facility described here provides data on the contami ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908231

7. Absolute EUV Metrology,
Published: 1/1/2001
Authors: Charles S Tarrio, Robert Edward Vest, S Grantham
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=100203

8. Absolute Extreme Ultraviolet Metrology
Published: 8/1/2001
Authors: Charles S Tarrio, Robert Edward Vest, S Grantham
Abstract: NIST has a long-standing program for the calibration of extreme ultraviolet optical components. Begun with the advent of the Synchrotron Ultraviolet Radiation Facility (SURF) almost 40 years ago, early activities centered on the development and char ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840110

9. Accurate Reflectometry for Extreme-Ultraviolet Lithography at the National Institute of Standards and Technology
Published: 12/1/2002
Authors: S Grantham, Charles S Tarrio, Thomas B Lucatorto
Abstract: The most demanding application of extreme ultraviolet (EUV) multilayer optics is in lithography. The optics in current alpha-class tools are large, and the multilayer coatings must have both optimized reflectance and extremely high uniformity. At N ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840143

10. Accurate reflectometry for Extreme Ultraviolet Lithography at the National Institute of Standards and Technology
Published: 1/1/2002
Authors: Steven E Grantham, Charles S Tarrio, Thomas B Lucatorto
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101547



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