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You searched on: Author: charles tarrio

Displaying records 31 to 40 of 106 records.
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31. Improved Radiometry For Extreme-Ultraviolet Lithography
Published: 11/1/2004
Authors: Charles S Tarrio, Robert Edward Vest, Steven E Grantham, K Liu, Thomas B Lucatorto, Ping-Shine Shaw
Abstract: The absolute cryogenic radiometer (ACR), an electrical-substitution-based detector, is the most accurate method for measurement of radiant power in the extreme ultraviolet. At the National Institute of Standards and Technology, ACR-based measurements ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840173

32. Extreme-Ultraviolet Efficiency Measurements of Freestanding Transmission Gratings
Published: 7/1/2004
Authors: D R McMullin, D L Judge, Charles S Tarrio, Robert Edward Vest, F Hanser
Abstract: We report the results of transmission and diffraction measurements at EUV wavelengths (4-30 nm) for two gratings, one with a line density of 5000 mm^u-1^ and the other 2500 mm^u-1^. Measurements were made to provide absolute transmission efficiency ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840108

33. Extreme-ultraviolet radiation transmission and diffraction measurements of freestanding transmission gratings,
Published: 1/1/2004
Authors: D R McMullin, D L Judge, Charles S Tarrio, Robert Edward Vest, F Hanser
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101634

34. Facility for Pulsed Extreme Ultraviolet Detector Calibration
Published: 10/8/2003
Authors: Steven E Grantham, Robert Edward Vest, Charles S Tarrio, Thomas B Lucatorto
Abstract: All of the Extreme Ultraviolet light sources currently under consideration for Extreme Ultraviolet lithography are based on plasmas that emit radiation with a wavelength of approximately 13.4 nm. These sources whether they are produced by a discharg ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841761

35. Design and Performance of Capping Layers for Extreme-Ulatraviolet Multilayer Mirrors
Published: 10/1/2003
Authors: Sasa Bajt, H N Chapman, Nhan Nguyen, J Alameda, J C Robinson, M Malinowski, E Gullikson, Andrew Aquila, Charles S Tarrio, Steven E Grantham
Abstract: Multilayer lifetime has emerged as one of the major issues for the commercialization of extreme-ultraviolet lithography (EUVL). We describe the performance of an oxidation-resistant capping layer of Ru atop multilayers that results in a reflectivity ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840180

36. 40 Years of Metrology With Synchrotron Radiation at SURF
Published: 9/1/2003
Authors: Uwe Arp, Steven E Grantham, Simon Grant Kaplan, Ping-Shine Shaw, Charles S Tarrio, Robert Edward Vest
Abstract: the advantages of a compact synchrotron radiation source like the Synchrotron Ultraviolet Radiation Facility for metrology in the ultraviolet and extreme ultraviolet are shown. The capabilities of the different experimental stations are explained an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840164

37. Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography
Series: Journal of Research (NIST JRES)
Published: 7/1/2003
Authors: Charles S Tarrio, S Grantham, M B. Squires, Robert Edward Vest, Thomas B Lucatorto
Abstract: Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each of the Mo/Si multilayer EUV stepper mirrors require the highest attainable reflectivity a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841623

38. Design and Performance of Capping Layers for EUV Multilayer Mirrors
Published: 6/1/2003
Authors: Sasa Bajt, H N Chapman, Nhan Nguyen, J Alameda, J C Robinson, M Malinowski, E Gullikson, Andrew Aquila, Charles S Tarrio, Steven E Grantham
Abstract: The reflectance stability of multilayer coatings for extreme ultraviolet lithography (EUVL) in a commercial tool environment is of utmost importance to ensure continuous exposures with minimum maintenance cost. We have made substantial progress in d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840159

39. Facility for Extreme Ultraviolet Reflectometry of Lithography Optics
Published: 2/1/2003
Authors: Charles S Tarrio, S Grantham, Thomas B Lucatorto
Abstract: Currently the most demanding application of extreme-ultraviolet (EUV) optics is in lithography. A commercial extreme-ultraviolet stepper will likely have six or more normal-incidence reflective optics, and the largest of these will be tens of cm in d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=840130

40. Design and performance of capping layers for extreme-ultraviolet multilayer mirrors
Published: 1/1/2003
Authors: Sasa Bajt, H N Chapman, Nhan Nguyen, J Alameda, J C Robinson, M E Malinowski, Eric M Gullikson, Andrew Aquila, Charles S Tarrio, Steven E Grantham
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=101435



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