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You searched on: Author: john suehle

Displaying records 161 to 170 of 180 records.
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161. The Interaction of Stoichiometry, Mechanical Stress and Interface Trap Density in LPCVD Si-Rich SiNx-Si Structures
Published: 12/31/1994
Authors: S C Witczak, Michael Gaitan, John S Suehle, M. C. Peckerar, M T Ma

162. JEDEC
Published: 12/1/1994
Authors: Harry A. Schafft, John S Suehle, John Albers

163. Multijunction Thermal Converters by Commercial CMOS Fabrication
Published: 12/31/1993
Authors: Michael Gaitan, John S Suehle, Joseph R. Mr. (Joseph R.) Kinard Jr., D. X. Huang

164. Breakdown Mechanism in Buried Silicon Oxide Films
Published: 9/1/1993
Authors: Santos D Mayo, John S Suehle, Peter Roitman

165. Tin Oxide Gas Sensor Fabricated Using CMOS Micro-Hotplates and In-Situ Processing
Published: 1/20/1993
Authors: John S Suehle, Richard E Cavicchi, Michael Gaitan, Stephen Semancik

166. An Experimental Comparison of Measurement Techniques to Extract Si-SiO^d2^ Interface Trap Density
Published: 12/31/1992
Authors: S C Witczak, John S Suehle, Michael Gaitan

167. Application of CMOS-Compatible Micro-Hotplates for In-Situ Process Monitors
Published: 12/31/1992
Authors: John S Suehle, Michael Gaitan

168. Charge Trapping and Breakdown Mechanism in SIMOX
Published: 12/31/1992
Authors: Santos D Mayo, John S Suehle, Peter Roitman

169. Design Methodology for Micromechanical Systems at Commercial CMOS Foundries Through MOSIS
Published: 12/31/1992
Authors: Michael Gaitan, A. Parameswaran, Mona E. Zaghloul, Janet M Cassard, Donald B. Novotny, John S Suehle

170. Measurement for Controlling Electromigration in Metallization Interconnects: Today and Tomorrow
Published: 12/31/1992
Authors: Harry A. Schafft, John S Suehle, J. A. Lechner

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