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Author: john suehle

Displaying records 161 to 170 of 179 records.
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161. JEDEC
Published: 12/1/1994
Authors: Harry A. Schafft, John S Suehle, John Albers
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=27128

162. Multijunction Thermal Converters by Commercial CMOS Fabrication
Published: 12/31/1993
Authors: Michael Gaitan, John S Suehle, Joseph R. Mr. (Joseph R.) Kinard Jr., D. X. Huang
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=27847

163. Breakdown Mechanism in Buried Silicon Oxide Films
Published: 9/1/1993
Authors: Santos D Mayo, John S Suehle, Peter Roitman
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=6440

164. Tin Oxide Gas Sensor Fabricated Using CMOS Micro-Hotplates and In-Situ Processing
Published: 1/20/1993
Authors: John S Suehle, Richard E Cavicchi, Michael Gaitan, Stephen Semancik
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=26461

165. An Experimental Comparison of Measurement Techniques to Extract Si-SiO^d2^ Interface Trap Density
Published: 12/31/1992
Authors: S C Witczak, John S Suehle, Michael Gaitan
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=16528

166. Application of CMOS-Compatible Micro-Hotplates for In-Situ Process Monitors
Published: 12/31/1992
Authors: John S Suehle, Michael Gaitan
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=14325

167. Charge Trapping and Breakdown Mechanism in SIMOX
Published: 12/31/1992
Authors: Santos D Mayo, John S Suehle, Peter Roitman
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=22553

168. Design Methodology for Micromechanical Systems at Commercial CMOS Foundries Through MOSIS
Published: 12/31/1992
Authors: Michael Gaitan, A. Parameswaran, Mona Elwakkad Zaghloul, Janet M Cassard, Donald B. Novotny, John S Suehle
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=2103

169. Measurement for Controlling Electromigration in Metallization Interconnects: Today and Tomorrow
Published: 12/31/1992
Authors: Harry A. Schafft, John S Suehle, J. A. Lechner
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=27092

170. Techniques and Characterization of Pulsed Electromigration at the Wafer Level
Published: 12/31/1992
Authors: John S Suehle, Harry A. Schafft
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=13274



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