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Author: michael stocker
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Displaying records 1 to 10 of 19 records.
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1. Results of an international photomask linewidth comparison of NIST and PTB
Published: 10/9/2009
Authors: Bernd Bodermann, D Bergmann, Egbert Buhr, W Haebler-Grohne, Harald Bosse, James Edward Potzick, Ronald G Dixson, Richard Quintanilha, Michael T. Stocker, Andras Vladar, Ndubuisi George Orji
Abstract: In preparation of the international Nano1 linewidth comparison on photomasks between 9 national metrology institutes, NIST and PTB have started a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to tes ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903776

2. Photomask metrology using a 193 nm scatterfield microscope
Published: 9/30/2009
Authors: Richard Quintanilha, Bryan M Barnes, Martin Y Sohn, Lowell P. Howard, Richard M Silver, James Edward Potzick, Michael T. Stocker
Abstract: The current photomask linewidth Standard Reference Material (SRM) supplied by the National Institute of Standards and Technology (NIST), SRM 2059, is the fifth generation of such standards for mask metrology. The calibration of this mask has been ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903929

3. International photomask linewidth comparison by NIST and PTB
Published: 10/17/2008
Authors: James Edward Potzick, Ronald G Dixson, Richard Quintanilha, Michael T. Stocker, Andras Vladar, Egbert Buhr, Bernd Bodermann, Wolfgang Hassler-Grohne, Harald Bosse, C.G. Frase
Abstract: In preparation of the international Nano1 linewidth comparison on photomasks between 8 national metrology institutes, NIST and PTB have started a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to tes ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824713

4. Through-focus Scanning and Scatterfield Optical Methods for Advanced Overlay Target Analysis
Published: 9/1/2008
Authors: Ravikiran (Ravikiran) Attota, Michael T. Stocker, Richard M Silver, Nathanael A Heckert, Hui H. Zhou, Richard J Kasica, Lei Chen, Ronald G Dixson, Ndubuisi George Orji, Bryan M Barnes, Peter Lipscomb
Abstract: In this paper we present overlay measurement techniques that use small overlay targets for advanced semiconductor applications. We employ two different optical methods to measure overlay using modified conventional optical microscope platforms. They ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902294

5. Optical Critical Dimension Measurement of Silicon Grating Targets Using Back Focal Plane Scatterfield Microscopy
Published: 1/2/2008
Authors: Heather J Patrick, Ravikiran (Ravikiran) Attota, Bryan M Barnes, Thomas Avery Germer, Michael T. Stocker, Richard M Silver, Michael R Bishop
Abstract: We demonstrate optical critical dimension measurement of lines in silicon grating targets using back focal plane scatterfield microscopy. In this technique, angle-resolved diffraction signatures are obtained from grating targets by imaging the back ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841060

6. Extending the Limits of Image-Based Optical Metrology
Published: 6/20/2007
Authors: Richard M Silver, Bryan M Barnes, Ravikiran (Ravikiran) Attota, Jay Shi Jun, Michael T. Stocker, Egon Marx, Heather J Patrick
Abstract: We have developed a set of techniques, referred to as scatterfield microscopy, in which the illumination is engineered in combination with appropriately designed metrology targets. Previously we reported results from samples with sub-50 nm sized fea ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823218

7. Calibrated Overlay Wafer Standard
Series: Special Publication (NIST SP)
Report Number: 260-165
Published: 1/1/2007
Authors: Michael T. Stocker, Richard M Silver, Ravikiran (Ravikiran) Attota, Jay Shi Jun
Abstract: This document describes the physical characteristics of Standard Reference Material SRM 5000, provides guidance for its use in calibrating overlay (OL) tools, and gives information and precautions concerning its care and handling.Standard Reference M ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823210

8. Koehler Illumination for High-Resolution Optical Metrology
Published: 3/1/2006
Authors: Martin Y Sohn, Bryan M Barnes, Lowell P. Howard, Richard M Silver, Ravikiran (Ravikiran) Attota, Michael T. Stocker
Abstract: Accurate preparation of illumination is critical for high-resolution optical metrology applications such as line width and overlay measurements. To improve the detailed evaluation and alignment of the illumination optics, we have separated Koehler il ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823207

9. The Limits of Image-Based Optical Metrology
Published: 3/1/2006
Authors: Richard M Silver, Bryan M Barnes, Ravikiran (Ravikiran) Attota, Jay Shi Jun, James J Filliben, Juan Soto, Michael T. Stocker, P Lipscomb, Egon Marx, Heather J Patrick, Ronald G Dixson, Robert D. Larrabee
Abstract: An overview of the challenges encountered in imaging device-sized features using optical techniques recently developed in our laboratories is presented in this paper.  We have developed a set of techniques we refer to as scatterfield microscopy ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823206

10. High-resolution Optical Metrology
Published: 5/1/2005
Authors: Richard M Silver, Ravikiran (Ravikiran) Attota, Michael T. Stocker, M R Bishop, Lowell P. Howard, Thomas Avery Germer, Egon Marx, M P Davidson, Robert D. Larrabee
Abstract: Recent advances in optical imaging techniques have unveiled new possibilities for optical metrology and optical-based process control measurements of features in the 65 nm node and beyond. In this paper we discuss methods and applications that combin ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822387



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