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Author: michael stocker

Displaying records 11 to 19.
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11. Evaluation of New In-Chip and Arrayed Line Overlay Target Designs
Published: 5/24/2004
Authors: M P Davidson, M R Bishop, Robert D. Larrabee, Michael T. Stocker, Jay Shi Jun, Egon Marx, Richard M Silver, Ravikiran (Ravikiran) Attota
Abstract: Two types of overlay targets have been designed and evaluated for the study of optical overlay metrology. They are in-chip and arrayed overlay targets. In-chip targets are three-bar two-level targets designed to be placed in or near the active device ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822156

12. Evaluation of New In-Chip and Arrayed Line Overlay
Published: 5/1/2004
Authors: Ravikiran (Ravikiran) Attota, Richard M Silver, M R Bishop, Egon Marx, Jay Shi Jun, Michael T. Stocker, M P Davidson, Robert D. Larrabee
Abstract: Two types of overlay targets have been designed and evaluated for the study of optical overlay metrology. They are in-chip and arrayed overlay targets. In-chip targets are three-bar two-level targets designed to be placed in or near the active device ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822386

13. Calibration Strategies for Overlay and Registration Metrology
Published: 5/1/2003
Authors: Richard M Silver, Michael T. Stocker, Ravikiran (Ravikiran) Attota, M R Bishop, Jay Shi Jun, Egon Marx, M P Davidson, Robert D. Larrabee
Abstract: Critical dimensions in current and next generation devices are driving the need for tighter overlay registration tolerances and improved overlay metrology tool accuracy and repeatability. Tool matching, performance evaluation, model-based metrology, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821977

14. New Method to Enhance Overlay Tool Performance
Published: 5/1/2003
Authors: Ravikiran (Ravikiran) Attota, Richard M Silver, Michael T. Stocker, Egon Marx, Jay Shi Jun, M P Davidson, Robert D. Larrabee
Abstract: New methods to enhance and improve algorithm performance and data analysis are being developed at NIST for overlay measurement applications. Both experimental data and improved theoretical optical scattering models have been used for the study. We ha ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822023

15. Updated NIST Photomask Linewidth Standard
Published: 5/1/2003
Authors: J Pedulla, James Edward Potzick, Michael T. Stocker
Abstract: NIST is preparing to issue the next generation in its line of binary photomask linewidth standards. Called SRM 2059, it was developed for calibrating microscopes used to measure linewidths on photomasks, and consists of antireflecting chrome line and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822399

16. Updated NIST Photomask Linewidth Standard
Published: 1/1/2003
Authors: James Edward Potzick, J Pedulla, Michael T. Stocker
Abstract: NIST is preparing to issue the next generation in its line of binary photomask linewidth standards. Called SRM 2059, it was developed for calibrating microscopes used to measure linewidths on photomasks, and consists of antireflecting chrome line and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821970

17. New NIST Photomask Linewidth Standard
Published: 12/1/2002
Authors: James Edward Potzick, J Pedulla, Michael T. Stocker
Abstract: NIST is preparing to issue the next generation in its line of binary photomask linewidth standards. Called SRM 2059, it was developed for calibrating microscopes used to measure linewidths on photomasks, and consists of antireflecting chrome line and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821959

18. Comparison of Measured Optical Image Profiles of Silicon Lines with Two Different Theoretical Models
Published: 7/1/2002
Authors: Richard M Silver, Ravikiran (Ravikiran) Attota, Michael T. Stocker, Jay Shi Jun, Egon Marx, Robert D. Larrabee, B Russo, M P Davidson
Abstract: In this paper we describe a new method for the separation of too-induced measurement errors and sample-induced measurement errors. We apply the method to standard overlay target configurations. This method is used to separate the effects of the tool ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821754

19. Testing Displacement-Measuring Interferometer Systems
Published: 1/1/1998
Authors: Jack A Stone Jr, Martin Schroeck, Michael T. Stocker
Abstract: We have made a study of one method for testing displacement-measuring interferometer systems, a modified back-to-back comparison, that automatically compensates for changes in the optical path length between the two interferometers.  Although th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823081



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