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Author: john small
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1. A Proposal for a Standard Nomenclature and Interactive Database of Parameters and Correction Algorithms Used in Quantitative Electron Probe Microanalysis.
Published: 2/1/2003
Authors: J T. Armstrong, J H J Scott, John A Small, Eric B Steel
Abstract: One page abstract.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831293

2. A Well Dressed Microscope: Practical Experience With Microcalorimeter and Silicon Drift Detector Systems
Published: 12/1/2002
Authors: John A Small, Dale E Newbury, J H J Scott, L R King, Sae Woo Nam, Kent D Irwin, Steven Deiker, S Barkan, E Iwaniczko
Abstract: NIST, Gaithersburg has recently installed a first generation silicon drift dectector (SDD) from Photon Imaging and the NIST Boulder microcalorimeter energy dispersive x-ray spectrometer ( cal-EDS) on a JEOL 840 SEM1 , as shown in Fig.1. [1,2] The ins ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831281

3. A Well Dressed Microscope: Practical Experience with Microcalorimeter and Silicon Drift Detector Systems
Published: 12/31/2002
Authors: John A Small, Dale E Newbury, John Henry J. Scott, L. King, Sae Woo Nam, Kent D Irwin, Steven Deiker, Shaul Barkan, Jan Iwanczyk
Abstract: NIST, Gaithersburg has recently installed a first generation silicon drift detector (SDD) from Photon Imaging and the NIST Boulder microcalorimeter energy dispersive x-ray spectrometer ({mu}cal-EDS) on a JEOL 840 SEM, as shown in Fig. 1. [1,2] The in ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31341

4. Activities of the International Organization for Standardization Technical Committee 202 Microbeam Analysis
Published: 10/1/2000
Author: John A Small
Abstract: In January of 1992 the ISO Council announced the acceptance of resolution 50/1991 establishing TC202 Microbeam Analysis. The China State Bureau of Technology Supervision (CSBTS) was appointed by the ISO council as secretariat of TC 202 and remains i ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831167

5. Chapter 12: Analysis of Individual Collected Particles
Published: 1/1/2001
Authors: Robert A Fletcher, John A Small, J H J Scott
Abstract: This chapter describes microscopes and microprobes used for analysis of collected, individual particles. The instruments discussed are the light microscope, electron microscopes (scanning, environmental and transmission), electron microprobes, laser ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831472

6. Characterization of SiGe Films for use as a National Institute of Standards and Technology (NIST) Microanalysis Reference material (RM 8905)
Report Number: 8905
Published: 2/1/2010
Authors: Ryna B. Marinenko, Shirley Turner, David S Simons, Savelas A Rabb, Rolf Louis Zeisler, Lee Lijian Yu, Dale E Newbury, Rick L Paul, Nicholas W m Ritchie, Stefan D Leigh, Michael R Winchester, Lee J Richter, Douglas C Meier, Keana C K Scott, D Klinedinst, John A Small
Abstract: Bulk SiGe wafers cut from single-crystal boules and two SiGe thick films (4 m and 5 m thick) on Si wafers were evaluated with the electron probe microanalyzer for the extent of heterogeneity and composition for use as reference materi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900913

7. Comparison of High- and Low-Voltage X-Ray Mapping of an Electronic Device
Published: 2/1/2001
Authors: John A Small, David S. Bright
Abstract: In recent years, field-emission gun scanning electron microscopes, FEG-SEMs, with high-brightness electron guns and excellent performance at low electron beam energies (E^d0^ less then or equal to 5 keV) have become readily available. Concurrently th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831195

8. Depth Profiling Using C^d60^+ SIMS Deposition and Topography Development During Bombardment of Silicon
Published: Date unknown
Authors: John G Gillen, J Batteas, Chris A Michaels, P Chi, John A Small, Eric S Windsor, Albert J. Fahey, Jennifer R Verkouteren, W Kim
Abstract: A C60+ primary ion source has been coupled to an ion microscope SIMS instrument to examine sputtering of silicon with an emphasis on possible application of C60+ depth profiling for high depth resolution SIMS analysis of silicon semiconductor materi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831392

9. Electron Backscatter Diffraction (EBSD) of Single Particles
Published: 2/1/2002
Author: John A Small
Abstract: Over the years several different methods have been developed for the quantitative x-ray microanalysis of individual particles Small (1981), Armstrong (1991). Despite the large number of quantitative methods available, the accuracy for the x-ray micro ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831248

10. Electron Microprobe Characterization of Si-Ge Alloys and Films for Use as Microanalysis Reference Materials
Published: Date unknown
Authors: Ryna B. Marinenko, Shirley Turner, Dale E Newbury, Robert L. Myklebust, Lee Lijian Yu, Rolf Louis Zeisler, David S Simons, John A Small
Abstract: Bulk SiGe wafers cut from single-crystal boules and SiGe thick films on Si wafers were evaluated with the electron probe microanalyzer for the extent of heterogeneity and composition for use as reference standards needed by the microelectronics ind ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=831405



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