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Author: richard silver
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1. Dependency of Morphology on Miscut Angle for Si(111) Etched in NH^d4^F
Published: 5/1/2003
Authors: Joseph Fu, Hui Zhou, John A Kramar, Richard M Silver, S Gonda
Abstract: Using scanning probe microscopy, we have examined the surfaces produced by etching several different vicinal Si(111) samples in NH^d4^F aqueous solution. In agreement with others, we found that deoxygenation of the etchant generally reduces the numbe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823151

2. Nano-Lithography in Ultra-High Vacuum (UHV) for Real World Applications
Published: 3/11/2004
Authors: James D Gilsinn, Hui Zhou, Bradley N Damazo, Joseph Fu, Richard M Silver
Abstract: As nano-lithography technology improves, more companies and research groups have the capability to create nano-scale structures. Scanning tunneling microscopes (STMs) are commonly used to create these structures and evaluate them afterward. One diffi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822480

3. 193 nm Angle-Resolved Scatterfield Microscope for Semiconductor Metrology
Published: 8/24/2009
Authors: Martin Y Sohn, Richard Quintanilha, Bryan M Barnes, Richard M Silver
Abstract: An angle-resolved scatterfield microscope (ARSM( feating 193 nm excimer laser light wa developed for measuring critical dimension (CD) and overlay of nanoscale targets as used in semiconductor metrology. The microscope is designed to have a wide and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903754

4. 1998-99 NIST/International SEMATECH Collaboration to Develop Atom-Based Linewidth Standards
Published: 1/1/2000
Author: Richard M Silver
Abstract: This is the final report for the SEMATECH funded SEMATECH/NIST contract for the development of atom-based standard artifacts. This report is intended to summarize the progress completed on the technical elements and is intended as a general release d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820978

5. 3-D Optical Metrology of Finite sub-20 nm Dense Arrays using Fourier Domain Normalization
Published: 3/25/2013
Authors: Jing Qin, Hui Zhou, Bryan M Barnes, Ronald G Dixson, Richard M Silver
Abstract: Reduced target dimensions requiring improved resolution and sensitivity have driven the need to use and analyze the phase and scattered frequency information available when using image-based scatterometry systems. One such system is scatterfield micr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=912961

6. 3-D Optical Metrology of Finite sub-20nm Dense Arrays With sub-nanometer Parametric Uncertainties
Published: 6/23/2013
Authors: Jing Qin, Hui Zhou, Bryan M Barnes, Ronald G Dixson, Richard M Silver
Abstract: A new approach that involves parametric fitting of 3-D scattered field with electromagnetic simulation, Fourier domain normalization, and uncertainties analysis is presented to rigorously analyze 3-D through-focus optical images of targets that scatt ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=913511

7. A Bayesian Statistical Model for Hybrid Metrology to Improve Measurement Accuracy
Published: 7/31/2011
Authors: Richard M Silver, Nien F Zhang, Bryan M Barnes, Jing Qin, Hui Zhou, Ronald G Dixson
Abstract: We present a method to combine measurements from different techniques that reduces uncertainties and can improve measurement throughput. The approach directly integrates the measurement analysis of multiple techniques that can include different conf ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908377

8. A Macro-Micro Motion System for a STM
Published: 6/13/2002
Authors: Bradley N Damazo, James D Gilsinn, Richard M Silver, Hui Zhou
Abstract: As nano-lithography improves, more companies and research groups have the capability to create nano-scale structures. Scanning Tunneling Microscopes (STMs) are commonly used to create these structures and evaluate them afterward. One difficulty is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821683

9. A Method to Characterize Overlay Tool Misalignments and Distortions
Published: 7/1/1997
Authors: Richard M Silver, James Edward Potzick, Fredric Scire, Christopher J. Evans, Michael L McGlauflin, Edward A Kornegay, Robert D. Larrabee
Abstract: A new optical alignment artifact under development at NIST is described. This structure, referred to as a stepped microcone, is designed to assist users and manufacturers of overlay metrology tools in the reduction of tool-induced measurement errors. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820873

10. A New Design and Uncertainty Budget for a Metrology UHV-STM Used in Direct Measurements of Atom Spacings
Published: 7/1/2002
Authors: S Gonda, Hui Zhou, Joseph Fu, Richard M Silver
Abstract: A basic scheme of direct, highly accurate dimensional measurements of nanostructures is presented. We have constructed a scanning tunneling microscope (STM) unit combined with a diode laser-based Michelson interferometer module. The compact size of t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821757



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