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You searched on: Author: richard silver

Displaying records 71 to 80 of 116 records.
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71. High-Resolution Optical Overlay Metrology
Published: 5/1/2004
Authors: Richard M Silver, Ravikiran Attota, M R Bishop, Jay Shi Jun, Egon Marx, M P Davidson, Robert D. Larrabee
Abstract: Optical methods are often thought to lose their effectiveness as a metrology tool beyond the Rayleigh criterion. However, using advanced modeling methods, the conventional resolution limitations encountered in well-defined edge-to-edge measurements u ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822155

72. Improving the Uncertainty of Photomask Linewidth Measurements
Published: 5/1/2004
Authors: J Pedulla, James Edward Potzick, Richard M Silver
Abstract: The National Institute of Standards and Technology (NIST) is currently developing a photomask linewidth standard (SRM 2059) with a lower expected uncertainty of calibration than the previous NIST standards (SRMs 473, 475, 476). In calibrating these s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822175

73. Nano-Lithography in Ultra-High Vacuum (UHV) for Real World Applications
Published: 3/11/2004
Authors: James D Gilsinn, Hui H. Zhou, Bradley N Damazo, Joseph Fu, Richard M Silver
Abstract: As nano-lithography technology improves, more companies and research groups have the capability to create nano-scale structures. Scanning tunneling microscopes (STMs) are commonly used to create these structures and evaluate them afterward. One diffi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822480

74. Enhanced Model for Scanning Tunneling Microscope Tip Geometry Measured with Field Ion Microscopy
Published: 3/10/2004
Authors: P V Rao, Carsten P. Jensen, Richard M Silver
Abstract: Estimating the shape and size of a scanning tunneling microscope (STM) tip before scanning is often necessary for the correct interpretation of the STM data. This is particularly essential when using the STM as a metrology tool. It is common among re ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821613

75. Metrology Development for the Nanoelectronics Industry at the National Institute of Standards and Technology
Published: 3/7/2004
Authors: Joaquin (Jack) Martinez, John A Dagata, Curt A Richter, Richard M Silver
Abstract: The National Institute of Standards and Technology has provided and continues to provide critical metrology development for the semiconductor manufacturing industry as it moves from the microelectronic era into the nanoelectronic era. This presentaio ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31539

76. Nano-Lithography in Ultra-High Vacuum (UHV) for Real World Applications
Published: 3/1/2004
Authors: James D Gilsinn, Hui H. Zhou, Bradley N Damazo, Joseph Fu, Richard M Silver
Abstract: As nano-lithography technology improves, more companies and research groups have the capability to create nano-scale structures. Scanning tunneling microscopes (STMs) are commonly used to create these structures and evaluate them afterward. One diffi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822172

77. Atomic-Resolution Measurements With a New Tunable Diode Laser-Based Interferometer
Published: 1/1/2004
Authors: Richard M Silver, H Zou, S Gonda, Bradley N Damazo, Jay Shi Jun, Carsten P. Jensen, Lowell P. Howard
Abstract: We have developed a new implementation of a Michelson interferometer which has demonstrated better than 20 picometer resolution measurement capability. This new method uses a tunable diode laser as the light source with the laser wavelength continuou ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822419

78. Development of Photomask Artifacts and Metrology for the 65 nm Device Generation with Extensibility Beyond
Published: 1/1/2004
Authors: Andras Vladar, Richard M Silver, James Edward Potzick, John S Villarrubia
Abstract: The purpose of this project was to explore the currently used mask metrology methods and tools, to further develop mask metrology, and to design, fabricate and measure a new, relevant, 193 nm phase shifting mask metrology mask. These tasks were succe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822365

79. Developing Atomic-Resolution Measurements Using a Tunable Diode Laser-Based Interferometer
Published: 10/1/2003
Authors: Hui H. Zhou, Bradley N Damazo, S Gonda, Richard M Silver
Abstract: A new implementation of a Michelson interferometer capable of resolution on the order of 20 pm has been developed.  This new method uses a tunable diode laser as the light source with the diode laser wavelength continuously tuned to fix the numb ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822230

80. Dependency of Morphology on Miscut Angle for Si(111) Etched in NH^d4^F
Published: 5/1/2003
Authors: Joseph Fu, Hui H. Zhou, John A Kramar, Richard M Silver, S Gonda
Abstract: Using scanning probe microscopy, we have examined the surfaces produced by etching several different vicinal Si(111) samples in NH^d4^F aqueous solution. In agreement with others, we found that deoxygenation of the etchant generally reduces the numbe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823151



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