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You searched on: Author: richard silver

Displaying records 71 to 80 of 118 records.
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71. Evaluation of New In-Chip and Arrayed Line Overlay Target Designs
Published: 5/24/2004
Authors: M P Davidson, M R Bishop, Robert D. Larrabee, Michael T. Stocker, Jay Shi Jun, Egon Marx, Richard M Silver, Ravikiran Attota
Abstract: Two types of overlay targets have been designed and evaluated for the study of optical overlay metrology. They are in-chip and arrayed overlay targets. In-chip targets are three-bar two-level targets designed to be placed in or near the active device ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822156

72. Evaluation of New In-Chip and Arrayed Line Overlay
Published: 5/1/2004
Authors: Ravikiran Attota, Richard M Silver, M R Bishop, Egon Marx, Jay Shi Jun, Michael T. Stocker, M P Davidson, Robert D. Larrabee
Abstract: Two types of overlay targets have been designed and evaluated for the study of optical overlay metrology. They are in-chip and arrayed overlay targets. In-chip targets are three-bar two-level targets designed to be placed in or near the active device ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822386

73. High-Resolution Optical Overlay Metrology
Published: 5/1/2004
Authors: Richard M Silver, Ravikiran Attota, M R Bishop, Jay Shi Jun, Egon Marx, M P Davidson, Robert D. Larrabee
Abstract: Optical methods are often thought to lose their effectiveness as a metrology tool beyond the Rayleigh criterion. However, using advanced modeling methods, the conventional resolution limitations encountered in well-defined edge-to-edge measurements u ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822155

74. Improving the Uncertainty of Photomask Linewidth Measurements
Published: 5/1/2004
Authors: J Pedulla, James Edward Potzick, Richard M Silver
Abstract: The National Institute of Standards and Technology (NIST) is currently developing a photomask linewidth standard (SRM 2059) with a lower expected uncertainty of calibration than the previous NIST standards (SRMs 473, 475, 476). In calibrating these s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822175

75. Nano-Lithography in Ultra-High Vacuum (UHV) for Real World Applications
Published: 3/11/2004
Authors: James D Gilsinn, Hui Zhou, Bradley N Damazo, Joseph Fu, Richard M Silver
Abstract: As nano-lithography technology improves, more companies and research groups have the capability to create nano-scale structures. Scanning tunneling microscopes (STMs) are commonly used to create these structures and evaluate them afterward. One diffi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822480

76. Enhanced Model for Scanning Tunneling Microscope Tip Geometry Measured with Field Ion Microscopy
Published: 3/10/2004
Authors: P V Rao, Carsten P. Jensen, Richard M Silver
Abstract: Estimating the shape and size of a scanning tunneling microscope (STM) tip before scanning is often necessary for the correct interpretation of the STM data. This is particularly essential when using the STM as a metrology tool. It is common among re ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821613

77. Metrology Development for the Nanoelectronics Industry at the National Institute of Standards and Technology
Published: 3/7/2004
Authors: Joaquin (Jack) Martinez, John A Dagata, Curt A Richter, Richard M Silver
Abstract: The National Institute of Standards and Technology has provided and continues to provide critical metrology development for the semiconductor manufacturing industry as it moves from the microelectronic era into the nanoelectronic era. This presentaio ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31539

78. Nano-Lithography in Ultra-High Vacuum (UHV) for Real World Applications
Published: 3/1/2004
Authors: James D Gilsinn, Hui Zhou, Bradley N Damazo, Joseph Fu, Richard M Silver
Abstract: As nano-lithography technology improves, more companies and research groups have the capability to create nano-scale structures. Scanning tunneling microscopes (STMs) are commonly used to create these structures and evaluate them afterward. One diffi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822172

79. Atomic-Resolution Measurements With a New Tunable Diode Laser-Based Interferometer
Published: 1/1/2004
Authors: Richard M Silver, H Zou, S Gonda, Bradley N Damazo, Jay Shi Jun, Carsten P. Jensen, Lowell P. Howard
Abstract: We have developed a new implementation of a Michelson interferometer which has demonstrated better than 20 picometer resolution measurement capability. This new method uses a tunable diode laser as the light source with the laser wavelength continuou ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822419

80. Development of Photomask Artifacts and Metrology for the 65 nm Device Generation with Extensibility Beyond
Published: 1/1/2004
Authors: Andras Vladar, Richard M Silver, James Edward Potzick, John S Villarrubia
Abstract: The purpose of this project was to explore the currently used mask metrology methods and tools, to further develop mask metrology, and to design, fabricate and measure a new, relevant, 193 nm phase shifting mask metrology mask. These tasks were succe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822365



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