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Author: richard silver

Displaying records 71 to 80 of 113 records.
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71. Enhanced Model for Scanning Tunneling Microscope Tip Geometry Measured with Field Ion Microscopy
Published: 3/10/2004
Authors: P V Rao, Carsten P. Jensen, Richard M Silver
Abstract: Estimating the shape and size of a scanning tunneling microscope (STM) tip before scanning is often necessary for the correct interpretation of the STM data. This is particularly essential when using the STM as a metrology tool. It is common among re ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821613

72. Metrology Development for the Nanoelectronics Industry at the National Institute of Standards and Technology
Published: 3/7/2004
Authors: Joaquin (Jack) Martinez, John A. Dagata, Curt A Richter, Richard M Silver
Abstract: The National Institute of Standards and Technology has provided and continues to provide critical metrology development for the semiconductor manufacturing industry as it moves from the microelectronic era into the nanoelectronic era. This presentaio ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=31539

73. Nano-Lithography in Ultra-High Vacuum (UHV) for Real World Applications
Published: 3/1/2004
Authors: James D Gilsinn, Hui Zhou, Bradley N Damazo, Joseph Fu, Richard M Silver
Abstract: As nano-lithography technology improves, more companies and research groups have the capability to create nano-scale structures. Scanning tunneling microscopes (STMs) are commonly used to create these structures and evaluate them afterward. One diffi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822172

74. Atomic-Resolution Measurements With a New Tunable Diode Laser-Based Interferometer
Published: 1/1/2004
Authors: Richard M Silver, H Zou, S Gonda, Bradley N Damazo, Jay Shi Jun, Carsten P. Jensen, Lowell P. Howard
Abstract: We have developed a new implementation of a Michelson interferometer which has demonstrated better than 20 picometer resolution measurement capability. This new method uses a tunable diode laser as the light source with the laser wavelength continuou ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822419

75. Development of Photomask Artifacts and Metrology for the 65 nm Device Generation with Extensibility Beyond
Published: 1/1/2004
Authors: Andras Vladar, Richard M Silver, James Edward Potzick, John S Villarrubia
Abstract: The purpose of this project was to explore the currently used mask metrology methods and tools, to further develop mask metrology, and to design, fabricate and measure a new, relevant, 193 nm phase shifting mask metrology mask. These tasks were succe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822365

76. Developing Atomic-Resolution Measurements Using a Tunable Diode Laser-Based Interferometer
Published: 10/1/2003
Authors: Hui Zhou, Bradley N Damazo, S Gonda, Richard M Silver
Abstract: A new implementation of a Michelson interferometer capable of resolution on the order of 20 pm has been developed.  This new method uses a tunable diode laser as the light source with the diode laser wavelength continuously tuned to fix the numb ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822230

77. Dependency of Morphology on Miscut Angle for Si(111) Etched in NH^d4^F
Published: 5/1/2003
Authors: Joseph Fu, Hui Zhou, John A Kramar, Richard M Silver, S Gonda
Abstract: Using scanning probe microscopy, we have examined the surfaces produced by etching several different vicinal Si(111) samples in NH^d4^F aqueous solution. In agreement with others, we found that deoxygenation of the etchant generally reduces the numbe ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823151

78. Calibration Strategies for Overlay and Registration Metrology
Published: 5/1/2003
Authors: Richard M Silver, Michael T. Stocker, Ravikiran (Ravikiran) Attota, M R Bishop, Jay Shi Jun, Egon Marx, M P Davidson, Robert D. Larrabee
Abstract: Critical dimensions in current and next generation devices are driving the need for tighter overlay registration tolerances and improved overlay metrology tool accuracy and repeatability. Tool matching, performance evaluation, model-based metrology, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821977

79. Dependence of Morphology on Miscut Angle for Si(111) Etched in NH(4)F
Published: 5/1/2003
Authors: S Gonda, Joseph Fu, John A Kramar, Richard M Silver, Hui Zhou
Abstract: Using scanning probe microscopy, we have examined the surfaces produced by etching several different vicinal Si(111) samples in NH(4)F aqueous solution. In agreement with others, we found that deoxygenation of the etchant generally reduces the number ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822425

80. New Method to Enhance Overlay Tool Performance
Published: 5/1/2003
Authors: Ravikiran (Ravikiran) Attota, Richard M Silver, Michael T. Stocker, Egon Marx, Jay Shi Jun, M P Davidson, Robert D. Larrabee
Abstract: New methods to enhance and improve algorithm performance and data analysis are being developed at NIST for overlay measurement applications. Both experimental data and improved theoretical optical scattering models have been used for the study. We ha ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822023



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