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Author: richard silver

Displaying records 31 to 40 of 103 records.
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31. Scatterfield Optical Imaging for sub-10 nm Dimensional Metrology
Published: 1/1/2009
Author: Richard M Silver
Abstract: Recent developments in optical microscopy promise to advance optical metrology and imaging to unprecedented levels through theoretical and experimental development of a new measurement technique called "scatterfield optical imaging". ". Current met ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901009

32. Through-focus Scanning and Scatterfield Optical Methods for Advanced Overlay Target Analysis
Published: 9/1/2008
Authors: Ravikiran Attota, Michael T. Stocker, Richard M Silver, Nathanael A Heckert, Hui Zhou, Richard J Kasica, Lei Chen, Ronald G Dixson, Ndubuisi George Orji, Bryan M Barnes, Peter Lipscomb
Abstract: In this paper we present overlay measurement techniques that use small overlay targets for advanced semiconductor applications. We employ two different optical methods to measure overlay using modified conventional optical microscope platforms. They ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902294

33. Through-focus scanning optical microscope imaging method for nano-scale dimensional analysis
Published: 9/1/2008
Authors: Ravikiran Attota, Richard M Silver
Abstract: We present a novel optical technique that produces nanometer dimensional measurement sensitivity using a conventional bright-field optical microscope, by analyzing two-dimensional through-focus scanning optical microscope (TSOM) images constructed us ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824668

34. Optical Through-Focus Technique that Differentiates Small Changes in Line Width, Line Height and Sidewall Angle for CD, Overlay, and Defect Metrology Applications
Published: 4/16/2008
Authors: Ravikiran Attota, Richard M Silver, Bryan M Barnes
Abstract: We present a new optical technique for dimensional analysis of sub 100 nm sized targets by analyzing through-focus images obtained using a conventional bright-field optical microscope.  We present a method to create through-focus image maps (TFIM) us ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824634

35. Optical Critical Dimension Measurement of Silicon Grating Targets Using Back Focal Plane Scatterfield Microscopy
Published: 1/2/2008
Authors: Heather J Patrick, Ravikiran Attota, Bryan M Barnes, Thomas Avery Germer, Michael T. Stocker, Richard M Silver, Michael R Bishop
Abstract: We demonstrate optical critical dimension measurement of lines in silicon grating targets using back focal plane scatterfield microscopy. In this technique, angle-resolved diffraction signatures are obtained from grating targets by imaging the back ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=841060

36. Line Width Measurement Technique Using Through-Focus Optical Images
Published: 1/1/2008
Authors: Ravikiran Attota, Richard M Silver, Ronald G Dixson
Abstract: We present a detailed experimental study of a new through-focus technique to measure line width (CD) with nanometer sensitivity using a bright field optical microscope. This method relies on analyzing intensity gradients in optical images at differen ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823239

37. Extending the Limits of Image-Based Optical Metrology
Published: 6/20/2007
Authors: Richard M Silver, Bryan M Barnes, Ravikiran Attota, Jay Shi Jun, Michael T. Stocker, Egon Marx, Heather J Patrick
Abstract: We have developed a set of techniques, referred to as scatterfield microscopy, in which the illumination is engineered in combination with appropriately designed metrology targets. Previously we reported results from samples with sub-50 nm sized fea ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823218

38. Model-Based Analysis of the Limits of Optical Metrology With Experimental Comparisons
Published: 6/18/2007
Authors: Richard M Silver, Ravikiran Attota, Egon Marx
Abstract: This paper presents a summary and analysis of a study on optical modeling for critical dimension metrology. The paper is focused on two primary elements: 1) the comparison, stability, and validity of multiple electromagnetic scattering models and 2) ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823233

39. Zero-Order Imaging of Device-Sized Overlay Targets Using Scatterfield Microscopy
Published: 3/1/2007
Authors: Bryan M Barnes, Lowell P. Howard, P Lipscomb, Richard M Silver
Abstract: Patterns of lines and trenches with nominal linewidths of 50 nm have been proposed for use as an overlay target appropriate for placement inside the patterned wafer die.  The NIST Scatterfield Targets feature groupings of eight lines and/or tren ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823225

40. A Time-Resolved Kinetic Monte-Carlo Simulation Study On Si (111) Etching
Published: 1/1/2007
Authors: Hui Zhou, Joseph Fu, Richard M Silver
Abstract: In this paper we have extended the Kinetic Monte-Carlo simulation method to study the etching dynamics of Si (111) surfaces in NH4F in a time-resolved basis. We have examined the step-flow dynamics of Si(111) etching using various simulation window s ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823196