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You searched on: Author: richard silver

Displaying records 31 to 40 of 119 records.
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31. Selecting Valid Correlation Areas for Automated Bullet Identification Systems Based on Striation Detection
Published: 5/1/2011
Authors: Wei Chu, Jun-Feng Song, Theodore Vincent Vorburger, Robert Meryln Thompson, Richard M Silver
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905104

32. Optical illumination optimization for patterned defect inspection
Published: 4/20/2011
Authors: Bryan M Barnes, Richard Quintanilha, Martin Y Sohn, Hui Zhou, Richard M Silver
Abstract: Rapidly decreasing critical dimensions (CD) for semiconductor devices drive the study of improved methods for the detection of defects within patterned areas. As reduced CDs are being achieved through directional patterning, additional constraints a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908276

33. Nested Uncertainties and Hybrid Metrology to Improve Measurement Accuracy
Published: 4/18/2011
Authors: Richard M Silver, Nien F Zhang, Bryan M Barnes, Hui Zhou, Jing Qin, Ronald G Dixson
Abstract: In this paper we present a method to combine measurement techniques that reduce uncertainties and improve measurement throughput. The approach has immediate utility when performing model-based optical critical dimension measurements. When modeling ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908290

34. Light Scattering Methods
Published: 4/9/2011
Authors: Theodore Vincent Vorburger, Richard M Silver, Rainer Brodmann, Boris Brodmann, Jorg Seewig
Abstract: Light scattering belongs to a class of techniques known as area-integrating methods for measuring surface texture. Rather than being based on coordinate measurement, these methods probe an area of the surface altogether and yield parameters that are ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906985

35. Characterizing a Scatterfield Optical Platform for Semiconductor Metrology
Published: 12/21/2010
Authors: Bryan M Barnes, Ravikiran Attota, Richard Quintanilha, Martin Y Sohn, Richard M Silver
Abstract: Scatterfield microscopy is the union of a high-magnification imaging platform and the angular and/or wavelength control of scatterometry at the sample surface. Scatterfield microscopy uses Köhler illumination, where each point on the source translat ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905931

36. Topography measurements for correlations of standard cartridge cases
Published: 7/1/2010
Authors: Theodore Vincent Vorburger, Jun-Feng Song, Wei Chu, Thomas B Renegar, Xiaoyu A Zheng, James H Yen, Robert Meryln Thompson, Richard M Silver, Benjamin Bachrach, Martin Ols
Abstract: NIST Standard Reference Materials (SRM) 2460 Standard Bullets and 2461 Standard Cartridge Cases are intended for use as check standards for crime laboratories to help verify that their computerized optical imaging equipment for ballistics image acqui ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905846

37. Nanoparticle size and shape evaluation using the TSOM optical microscopy method
Published: 6/6/2010
Authors: Ravikiran Attota, Richard J Kasica, Lei NMN Chen, Premsagar Purushotham Kavuri, Richard M Silver, Andras Vladar
Abstract: We present a novel optical TSOM (through-focus scanning optical microscopy - pronounced as 'tee-som') method that produces nanoscale dimensional measurement sensitivity using a conventional optical microscope. The TSOM method uses optical information ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905490

38. Optimal Compression and Binarization of Signature Profiles for Automated Bullet Identification Systems
Published: 5/1/2010
Authors: Wei Chu, Jun-Feng Song, Theodore Vincent Vorburger, Robert Meryln Thompson, Thomas B Renegar, Richard M Silver
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905570

39. Sub-50 nm measurements using a 193 nm angle-resolved scatterfield microscope
Published: 4/1/2010
Authors: Richard Quintanilha, Martin Y Sohn, Bryan M Barnes, Richard M Silver
Abstract: Resist-on-silicon sub-50 nm targets have been investigated using a 193 nm angle-resolved scatter field microscope(ARSM). The illumination path of this microscope allows customization of the Conjugate Back Focal Plane (CBFP) while separate collection ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905308

40. The Limits and Extensibility of Optical Patterned Defect Inspection
Published: 4/1/2010
Authors: Richard M Silver, Bryan M Barnes, Martin Y Sohn, Richard Quintanilha, Hui Zhou, Chris Deeb, Mark Johnson, Milton Goodwin, Dilip Patel
Abstract: New techniques recently developed at the National Institute of Standards and Technology using bright field optical tools are applied to signal-based defect analysis of features with dimensions well below the measurement wavelength. A key to this app ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905318



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  • SP 250-XX: Calibration Services
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  • SP 400-XX: Semiconductor Measurement Technology
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