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Author: richard silver

Displaying records 31 to 40 of 112 records.
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31. Optimal Compression and Binarization of Signature Profiles for Automated Bullet Identification Systems
Published: 5/1/2010
Authors: Wei Chu, Jun-Feng Song, Theodore Vincent Vorburger, Robert Meryln Thompson, Thomas B Renegar, Richard M Silver
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905570

32. Sub-50 nm measurements using a 193 nm angle-resolved scatterfield microscope
Published: 4/1/2010
Authors: Richard Quintanilha, Martin Y Sohn, Bryan M Barnes, Richard M Silver
Abstract: Resist-on-silicon sub-50 nm targets have been investigated using a 193 nm angle-resolved scatter field microscope(ARSM). The illumination path of this microscope allows customization of the Conjugate Back Focal Plane (CBFP) while separate collection ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905308

33. The Limits and Extensibility of Optical Patterned Defect Inspection
Published: 4/1/2010
Authors: Richard M Silver, Bryan M Barnes, Martin Y Sohn, Richard Quintanilha, Hui Zhou, Chris Deeb, Mark Johnson, Milton Goodwin, Dilip Patel
Abstract: New techniques recently developed at the National Institute of Standards and Technology using bright field optical tools are applied to signal-based defect analysis of features with dimensions well below the measurement wavelength. A key to this app ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905318

34. NIST SRM (Standard Reference Material) 2460/2461 Standard Bullets and Casings Project
Published: 10/13/2009
Authors: Jun-Feng Song, Thomas B Renegar, Xiaoyu A Zheng, Robert Meryln Thompson, Richard M Silver, Martin M Ols, Ted T Vorburger
Abstract: The National Institute of Standards and Technology (NIST) in collaboration with the Bureau of Alcohol, Tobacco, Firearms, and Explosives (ATF) has developed the Standard Reference Material (SRM) 2460 Bullets and 2461 Cartridge Cases. NIST has also d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903625

35. Photomask metrology using a 193 nm scatterfield microscope
Published: 9/30/2009
Authors: Richard Quintanilha, Bryan M Barnes, Martin Y Sohn, Lowell P. Howard, Richard M Silver, James Edward Potzick, Michael T. Stocker
Abstract: The current photomask linewidth Standard Reference Material (SRM) supplied by the National Institute of Standards and Technology (NIST), SRM 2059, is the fifth generation of such standards for mask metrology. The calibration of this mask has been ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903929

36. 193 nm Angle-Resolved Scatterfield Microscope for Semiconductor Metrology
Published: 8/24/2009
Authors: Martin Y Sohn, Richard Quintanilha, Bryan M Barnes, Richard M Silver
Abstract: An angle-resolved scatterfield microscope (ARSM( feating 193 nm excimer laser light wa developed for measuring critical dimension (CD) and overlay of nanoscale targets as used in semiconductor metrology. The microscope is designed to have a wide and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903754

37. Angle-resolved Optical Metrology using Multi-Technique Nested Uncertainties
Published: 8/15/2009
Authors: Richard M Silver, Bryan M Barnes, Hui Zhou, Nien F Zhang, Ronald G Dixson
Abstract: This paper introduces recent advances in scatterfield microscopy using improved normalization and fitting procedures. Reduced measurement uncertainties are obtained through the use of more accurate normalization procedures in combination with better ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902735

38. Developing an Uncertainty Analysis for Optical Scatterometry
Published: 8/3/2009
Authors: Thomas Avery Germer, Heather J Patrick, Richard M Silver, Benjamin Bunday
Abstract: This article describes how an uncertainty analysis may be performed on a scatterometry measurement. A method is outlined for propagating uncertainties through a least-squares regression. The method includes the propagation of the measurement noise as ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901617

39. Nanoscale Measurements with a Through-Focus Scanning-Optical-Microscope
Published: 7/15/2009
Authors: Ravikiran Attota, Richard M Silver, Thomas Avery Germer
Abstract: We present a novel optical technique that produces nanometer dimensional measurement sensitivity using a conventional optical microscope, by analyzing through-focus scanning-optical-microscope (TSOM) images obtained at different focus positions. In ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902707

40. Scatterfield Optical Imaging for sub-10 nm Dimensional Metrology
Published: 1/1/2009
Author: Richard M Silver
Abstract: Recent developments in optical microscopy promise to advance optical metrology and imaging to unprecedented levels through theoretical and experimental development of a new measurement technique called "scatterfield optical imaging". ". Current met ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901009



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