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You searched on: Author: richard silver

Displaying records 21 to 30 of 121 records.
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21. Multiple-order Imaging for Optical Critical Dimension Metrology using Microscope Characterization
Published: 10/11/2012
Authors: Jing Qin, Hui Zhou, Bryan M Barnes, Francois R. Goasmat, Ronald G Dixson, Richard M Silver
Abstract: There has been much recent work in developing advanced optical metrology applications that use imaging optics for optical critical dimension (OCD) measurements, defect detection, and for potential use with in-die metrology applications. We have previ ...

22. Improving Optical Measurement Uncertainty with Combined Multitool Metrology Using a Bayesian Approach
Published: 8/30/2012
Authors: Nien F Zhang, Richard M Silver, Hui Zhou, Bryan M Barnes
Abstract: Recently, there has been significant research investigating new optical technologies for dimensional metrology of features 22 nm in critical dimension and smaller. When modeling optical measurements, a library of curves is assembled through the simul ...

23. Topography Measurements and Performance Comparisons between NIST SRM 2460 Standard Bullet Masters and BKA Bullet Replicas
Published: 7/31/2012
Authors: Jun-Feng Song, Theodore Vincent Vorburger, Robert Meryln Thompson, Susan M Ballou, Xiaoyu A Zheng, Thomas B Renegar, Richard M Silver
Abstract: Two Standard Reference Material (SRM) 2460 Bullets produced by the National Institute of Standards and Technology (NIST) were used as masters for the fabrication of replica bullets at the Bundeskriminalamt (BKA). The surface topography of the SRM ma ...

24. On CD-AFM bias related to probe bending
Published: 4/9/2012
Authors: Vladimir A Ukraintsev, Ndubuisi George Orji, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Richard M Silver
Abstract: Critical Dimension AFM (CD-AFM) is a widely used reference metrology. To characterize modern semiconductor devices, very small and flexible probes, often 15 nm to 20 nm in diameter, are now frequently used. Several recent publications have reported ...

25. Phase sensitive parametric optical metrology: Exploring the limits of 3-dimensional optical metrology
Published: 4/4/2012
Authors: Richard M Silver, Jing Qin, Bryan M Barnes, Hui Zhou, Ronald G Dixson, Francois R. Goasmat
Abstract: There has been much recent work in developing advanced optical metrology applications that use imaging optics for critical dimension measurements, defect detection and for potential use with in-die metrology applications. Sensitivity to nanometer sca ...

26. Scatterfield Microscopy of 22 nm Node Patterned Defects using Visible and DUV Light
Published: 4/4/2012
Authors: Bryan M Barnes, Martin Y Sohn, Francois R. Goasmat, Hui Zhou, Richard M Silver, Abraham Arceo
Abstract: Smaller patterning dimensions and novel architectures are fostering research into improved methods of defect detection in semiconductor device manufacturing. This initial experimental study, augmented with simulation, evaluates scatterfield microscop ...

27. Development of Ballistics Identification ‹ From Image Comparison to Topography Measurement in Surface Metrology-
Published: 3/22/2012
Authors: Jun-Feng Song, Theodore Vincent Vorburger, Robert Meryln Thompson, Thomas B Renegar, Xiaoyu A Zheng, James H Yen, Richard M Silver, Wei Chu
Abstract: Fired bullets and ejected cartridge cases have unique ballistics signatures left by the firearm. By analyzing the ballistics signatures, forensic examiners can trace these bullets and cartridge cases to the firearm used in a crime scene. Current au ...

28. The National Ballistics Imaging Comparison (NBIC) Project
Published: 3/10/2012
Authors: Jun-Feng Song, Theodore Vincent Vorburger, Susan M Ballou, Robert Meryln Thompson, James H Yen, Thomas B Renegar, Xiaoyu A Zheng, Richard M Silver, Martin Ols
Abstract: In response to the guidelines issued by the ASCLD/LAB-International (American Society of Crime Laboratory Directors/Laboratory Accreditation Board) to establish traceability and quality assurance in U.S. crime laboratories, a NIST/ATF joint project e ...

29. Nanometrology Using Through-Focus Scanning Optical Microscopy Method
Published: 12/21/2011
Authors: Ravikiran Attota, Richard M Silver
Abstract: We present an initial review of a novel through-focus scanning optical microscopy (TSOM) imaging method that produces nanometer dimensional measurement sensitivity using a conventional bright-field optical microscope. In the TSOM method a target is ...

30. Fundamental Limits of Optical Patterned Defect Metrology
Published: 11/14/2011
Authors: Richard M Silver, Bryan M Barnes, Martin Y Sohn, Hui Zhou, Jing Qin
Abstract: The semiconductor manufacturing industry is now facing serious challenges in achieving defect detection rates with acceptable throughput and accuracy. With conventional bright-field and dark-field inspection methods now at their limits, it has becom ...

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