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You searched on: Author: richard silver

Displaying records 91 to 100 of 117 records.
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91. Comparison of Edge Detection Methods Using a Prototype Overlay Calibration Artifact
Published: 8/1/2001
Authors: Richard M Silver, Jay Shi Jun, Edward A Kornegay, R Morton
Abstract: Accurate overlay measurements rely on robust, repeatable, and accurate feature position determination. In our effort to develop traceable we have examined a number of and the parameters which affect those measurements. The samples used in this study ...

92. Overlay Metrology: Recent Advances and Future Solutions
Published: 1/1/2001
Authors: Richard M Silver, Jay Shi Jun, S Fox, Edward A Kornegay
Abstract: As devices shrink and clock speeds continue to increase, process control and measurement of I critical dimension linewidths and the essential overlay of features from different photolithographic levels become increasingly important. Improved manufact ...

93. 1998-99 NIST/International SEMATECH Collaboration to Develop Atom-Based Linewidth Standards
Published: 1/1/2000
Author: Richard M Silver
Abstract: This is the final report for the SEMATECH funded SEMATECH/NIST contract for the development of atom-based standard artifacts. This report is intended to summarize the progress completed on the technical elements and is intended as a general release d ...

94. Focus and Edge Detection Algorithms and Their Relevance to the Development of an Optical Overlay Calibration Standard
Published: 6/1/1999
Authors: S Fox, M Dagenais, Edward A Kornegay, Richard M Silver
Abstract: We present results of investigations into optical focus and edge detection algorithms relevant to overlay metrology. We compare gradient energy, standard deviation, contrast and summed intensity of acquired images as focus metrics for bright-field, s ...

95. Optical Linewidth Models: Then and Now
Published: 6/1/1999
Authors: Robert D. Larrabee, Richard M Silver, M P Davidson
Abstract: In the late 1970's, Dr. Diana Nyyssonen demonstrated that NIST could optically calibrate photomask linewidth standards that were narrower than the classical resolution limit of a conventional bright-field microscope. She equated the known position of ...

96. Two-Dimensional Calibration Artifact and Measurement Methodology
Published: 6/1/1999
Authors: Richard M Silver, Theodore D Doiron, William B. Penzes, S Fox, Edward A Kornegay, S Rathjen, M Takac, D Owen
Abstract: In this paper, we describe our design and the manufacturing of a two-dimensional grid artifact of chrome on quartz on a 6 inch by 6 inch by .250 glass blank. The design has been agreed upon by a number of SEMI participants working on a two-dimensiona ...

97. Optical Linewidth Models - Then and Now
Published: 3/1/1999
Authors: Robert D. Larrabee, Richard M Silver, M P Davidson
Abstract: In the late 1970's Dr. Diana Nyyssonen demonstrated that the National Institute of Standards and Technology (NIST) could optically calibrate photomask linewidth standards that were narrower than the classical resolution limit of a conventional bright ...

98. Developing a Method to Determine Linewidth Based on Counting the Atom-Spacings Across a Line
Published: 6/1/1998
Authors: Richard M Silver, Carsten P. Jensen, V W. Tsai, Joseph Fu, John S Villarrubia, E Clayton Teague
Abstract: We are developing the instrumentation and prototype samples at NIST to enable the counting of atom-spacings across linewidth features etched in silicon. This is an effort to allow the accurate counting of atom-spacings across a feature in a controlle ...

99. Technical Directions of the NIST Precision Engineering Division: 1997-2001
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6218
Published: 1/1/1998
Authors: Dennis A Swyt, Howard H. Harary, Michael T Postek, Richard M Silver, Theodore Vincent Vorburger
Abstract: This report, based on U.S. industry roadmaps and related National Institute of Standards and Technology studies, is a product of the process of strategic planning for the NIST Precision Engineering Division (PED) and presents the major technological ...

100. The Study of Silicon Stepped Surfaces as Atomic Force Microscope Calibration Standards With a Calibrated AFM at NIST
Published: 1/1/1998
Authors: V W. Tsai, Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, R Koning, Richard M Silver, E. C. Williams
Abstract: Due to the limitations of modern manufacturing technology, there is no commercial height artifact at the sub-nanometer scale currently available. The single-atom steps on a cleaned silicon (111) surface with a height of 0.314 nm, derived from the lat ...

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