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You searched on: Author: richard silver

Displaying records 91 to 100 of 125 records.
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91. Dependence of Morphology on Miscut Angle for Si(111) Etched in NH(4)F
Published: 5/1/2003
Authors: S Gonda, Joseph Fu, John A Kramar, Richard M Silver, Hui Zhou
Abstract: Using scanning probe microscopy, we have examined the surfaces produced by etching several different vicinal Si(111) samples in NH(4)F aqueous solution. In agreement with others, we found that deoxygenation of the etchant generally reduces the number ...

92. New Method to Enhance Overlay Tool Performance
Published: 5/1/2003
Authors: Ravikiran Attota, Richard M Silver, Michael T. Stocker, Egon Marx, Jay Shi Jun, M P Davidson, Robert D. Larrabee
Abstract: New methods to enhance and improve algorithm performance and data analysis are being developed at NIST for overlay measurement applications. Both experimental data and improved theoretical optical scattering models have been used for the study. We ha ...

93. Overlay Metrology Simulations: Analytical and Experimental Validations
Published: 5/1/2003
Authors: Joel L Seligson, B Golovanevsky, J M Poplawski, M E Adel, Richard M Silver
Abstract: We have previously reported on an overlay metrology simulation platform, used for modeling both the effects of overlay metrology tool behavior and the impact of target design on the ultimate metrology performance. Since our last report, the simulatio ...

94. A New Design and Uncertainty Budget for a Metrology UHV-STM Used in Direct Measurements of Atom Spacings
Published: 7/1/2002
Authors: S Gonda, Hui Zhou, Joseph Fu, Richard M Silver
Abstract: A basic scheme of direct, highly accurate dimensional measurements of nanostructures is presented. We have constructed a scanning tunneling microscope (STM) unit combined with a diode laser-based Michelson interferometer module. The compact size of t ...

95. Comparison of Measured Optical Image Profiles of Silicon Lines with Two Different Theoretical Models
Published: 7/1/2002
Authors: Richard M Silver, Ravikiran Attota, Michael T. Stocker, Jay Shi Jun, Egon Marx, Robert D. Larrabee, B Russo, M P Davidson
Abstract: In this paper we describe a new method for the separation of too-induced measurement errors and sample-induced measurement errors. We apply the method to standard overlay target configurations. This method is used to separate the effects of the tool ...

96. A Macro-Micro Motion System for a STM
Published: 6/13/2002
Authors: Bradley N Damazo, James D Gilsinn, Richard M Silver, Hui Zhou
Abstract: As nano-lithography improves, more companies and research groups have the capability to create nano-scale structures. Scanning Tunneling Microscopes (STMs) are commonly used to create these structures and evaluate them afterward. One difficulty is ...

97. Effects of Etching Time and Wafer Miscut on the Morphology of Etched Si(111) Surfaces
Published: 1/1/2002
Authors: Hui Zhou, Joseph Fu, S Gonda, Richard M Silver
Abstract: In order to meet leading edge and future measurement and calibration needs, NIST has been pursuing the development of atom-based dimensional standards and measurement methods. There are a few new, key concepts underlying this effort, which are intend ...

98. Nanomanufacturing of Atom-Based Dimensional Standards - A Final Project Report of the NAMT
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6850
Published: 1/1/2002
Authors: Robert Allen, J J. Pellegrino, D Monk, E Clayton Teague, Dennis A Swyt, Joseph Fu, Richard M Silver, Theodore Vincent Vorburger, Bradley N Damazo, Robert Russell, Thomas E Wheatley, Keith A Stouffer, Manfred Osti, David Wilmering, Richard L. Rhorer, Ram D Sriram
Abstract: This report describes the accomplishments of the Nanomanufacturing of Atom-based Dimensional Standards Project, which operated as part of the National Advanced Manufacturing Testbed (NAMT) a program formally operating from fiscal year (FY) 1996 to FY ...

99. Comparison of Edge Detection Methods Using a Prototype Overlay Calibration Artifact
Published: 8/1/2001
Authors: Richard M Silver, Jay Shi Jun, Edward A Kornegay, R Morton
Abstract: Accurate overlay measurements rely on robust, repeatable, and accurate feature position determination. In our effort to develop traceable we have examined a number of and the parameters which affect those measurements. The samples used in this study ...

100. Overlay Metrology: Recent Advances and Future Solutions
Published: 1/1/2001
Authors: Richard M Silver, Jay Shi Jun, S Fox, Edward A Kornegay
Abstract: As devices shrink and clock speeds continue to increase, process control and measurement of I critical dimension linewidths and the essential overlay of features from different photolithographic levels become increasingly important. Improved manufact ...

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  • SP 250-XX: Calibration Services
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