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You searched on: Author: hyun wook ro

Displaying records 11 to 20 of 27 records.
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11. Quantifying Residual Stress in Nanoscale Thin Polymer Films via Surface Wrinkling
Published: 3/19/2009
Authors: Jun Y. Chung, Thomas Q. Chastek, Michael J Fasolka, Hyun Wook Ro, Christopher M Stafford
Abstract: Residual stress, a pervasive consequence of solid materials processing, is stress that remains in a material after external forces have been removed. In polymeric materials, residual stress results from processes, such as film formation, that force ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902640

12. In situ measurement of annealing-induced line shape decay in nanoimprinted polymers using scatterometry
Published: 3/2/2009
Authors: Heather J Patrick, Thomas Avery Germer, Yifu Ding, Hyun Wook Ro, Lee J Richter, Christopher L Soles
Abstract: Thermal embossing nanoimprint lithography (NIL) is an area of continuing interest because it allows direct patterning of nanoscale structures into a wide variety of functional polymer materials. Measuring the shape evolution of nanoimprinted lines d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901568

13. Scatterometry for in situ measurement of pattern reflow in nanoimprinted polymers
Published: 12/9/2008
Authors: Heather J Patrick, Thomas Avery Germer, Yifu Ding, Hyun Wook Ro, Lee J Richter, Christopher L Soles
Abstract: We use optical scatterometry to extract the time evolution of the profile of nanoimprinted lines in low and high molecular mass polymer gratings during reflow at the glass transition temperature. The data are obtained continuously during the anneal ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900878

14. Nanoimprint Lithography and the Role of Viscoelasticity in the Generation of Residual Stress in Model Polystyrene Patterns
Published: 6/10/2008
Authors: Yifu Ding, Hyun Wook Ro, Jing N. Zhou, Brian C. Okerberg, Jack F Douglas, Alamgir Karim, Christopher L Soles
Abstract: Understanding polymer deformation during the nanoimprinting process is key to achieve robust polymer nanostructures. Information regarding the process can be extracted from monitoring the decay of the imprinted polymer patterns during thermal anneal ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854115

15. Self-Sealing Nanoporous Low-k Dielectric Patterns Created by Nanoimprint Lithography
Published: 4/15/2008
Authors: Hyun Wook Ro, H Peng, Ken-ich Nihara, Hae-Jeong Lee, Eric K Lin, Alamgir Karim, D Gidley, Hiropshi Jinai, Do Y. Yoon, Christopher L Soles
Abstract: In this letter we describe how highly porous nanostructures can be directly printed into a poly(methylsilsequioxane) (PMSQ)-based organosilicate film, with high pattern fidelity, and develop the measurement infrastructure to quantitatively evaluate ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852758

16. Monitoring Alignment of Osteoblast Cells Directed by Gradient Nanopatterns
Published: 4/6/2008
Authors: Jirun Sun, Yifu Ding, Nancy J Lin, Hyun Wook Ro, Christopher L Soles, Sheng Lin-Gibson
Abstract: We investigated the behavior of pre-osteoblasts cultured on polystyrene and photopolymerized ethoxylated bisphenol-A dimethacrylate gradient patterns. Gradient patterns varying in height from several hundred to 0 nm were prepared using nanoimprinting ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854044

17. Characterizing Pattern Structures Using X-Ray Reflectivity
Published: 3/28/2008
Authors: Hae-Jeong Lee, Christopher L Soles, Hyun Wook Ro, Shuhui Kang, Eric K Lin, Alamgir Karim, Wen-Li Wu
Abstract: Specular X-ray reflectivity (SXR) can be used, in the limit of the effective medium approximation (EMA), as a high-resolution shape metrology for periodic patterns on a planar substrate. The EMA means that the density of the solid pattern and the sp ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852735

18. Nanoimprint Lithography for the Direct Patterning of Nanoporous Interlayer Dielectric Insulator Materials
Published: 3/28/2008
Authors: Hyun Wook Ro, Hae-Jeong Lee, Eric K Lin, Alamgir Karim, Daniel R. Hines, Do Y. Yoon, Christopher L Soles
Abstract: Directly patterning dielectric insulator materials for semiconductor devices via nanoimprint lithography has the potential to simplify fabrication processes and reduce manufacturing costs. However, the prospect of mechanically forming these material ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852733

19. The Direct Patterning of Nanoporous Interlayer Dielectric Insulator Films by Nanoimprint Lithography
Published: 10/2/2007
Authors: Hyun Wook Ro, Ronald Leland Jones, H Peng, Daniel R. Hines, Hae-Jeong Lee, Eric K Lin, Alamgir Karim, Do Y. Yoon, D Gidley, Christopher L Soles
Abstract: Directly patterning dielectric insulator materials via nanoimprint lithography has the potential to simplify fabrication processes and significantly reduce the manufacturing costs for semiconductor devices. However, the prospect of mechanically form ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852642

20. Relaxation Behavior of Polymer Structures Fabricated by Nanoimprint Lithography
Published: 8/14/2007
Authors: Yifu Ding, Hyun Wook Ro, Thomas Avery Germer, Jack F Douglas, Brian C. Okerberg, Alamgir Karim, Christopher L Soles
Abstract: We study the decay of the imprinted polystyrene (PS) patterns under thermal annealing using light diffraction. The first order diffraction intensity from the imprinted gratings was measured as a function of annealing time. Local intensity maximum i ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852744



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