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Author: lee richter

Displaying records 11 to 20 of 93 records.
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11. The NIST EUV facility for advanced photoresist qualification using the witness-sample test
Published: 8/29/2011
Authors: Steven E Grantham, Charles S Tarrio, Shannon Bradley Hill, Lee J Richter, Thomas B Lucatorto, J. van Dijk, C. Kaya, N. Harned, R. Hoefnagels, M. Silova, J. Steinhoff
Abstract: Before being used in an extreme-ultraviolet (EUV) scanner, photoresists must first be qualified to ensure that they will not excessively contaminate the scanner optics or other parts of the vacuum environment of the scanner. At the National Institute ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908029

12. Flexible Memristors Fabricated through Sol-Gel Hydrolysis
Published: 5/4/2011
Authors: Joseph Leo Tedesco, Nadine Gergel-Hackett, Laurie Stephey, Madelaine Herminia Hernandez, Andrew A Herzing, Lee J Richter, Christina Ann Hacker, Joseph J Kopanski, Jan Obrzut, Curt A Richter
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908437

13. Optics contamination studies in support of high-throughput EUV lithography tools
Published: 3/25/2011
Authors: Shannon Bradley Hill, Fardina Asikin, Lee J Richter, Steven E Grantham, Charles S Tarrio, Thomas B Lucatorto, Sergiy Yulin, Mark Schurmann, Viatcheslav Nesterenko, Torsten Feigl
Abstract: We report on optics contamination rates induced by exposure to broad-bandwidth, high-intensity EUV radiation peaked near 8 nm in a new beamline at the NIST synchrotron. The peak intensity of 50 mW/mm2 allows extension of previous investigations of c ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908291

14. Conduction and Loss Mechanisms in Flexible Oxide-Based Memristors
Published: 3/21/2011
Authors: Joseph Leo Tedesco, Nadine Gergel-Hackett, Laurie Stephey, Andrew A Herzing, Madelaine Herminia Hernandez, Christina Ann Hacker, Jan Obrzut, Lee J Richter, Curt A Richter
Abstract: In order to study the conduction and loss mechanisms behind their operation, flexible sol-gel based memristors were fabricated with differing oxide film thicknesses and device sizes. XPS, TEM, EELS, and VASE measurements indicated the oxide was amor ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=908435

15. Controlling the Microstructure of Solution-Processible Small Molecules in Thin-Film Transistors through Substrate Chemistry
Published: 2/4/2011
Authors: Regis J Kline, Steven D Hudson, Xinran Zhang, David J Gundlach, Andrew Moad, Lee J Richter, Oana Jurchescu, Thomas Jackson, Sanker Subramanian, John E Anthony, Michael F. Toney
Abstract: Solution-processible small molecules have tremendous potential for providing both high charge carrier mobility and low cost processing. This study outlines a detailed microstructural study of the effect of substrate chemistry on fluorinated 5,11-bis ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=906810

16. 3D Nanoscale Characterization of Thin-Film Organic Photovoltaic Device Structures via Spectroscopic Contrast in the TEM
Published: 10/21/2010
Authors: Andrew A Herzing, Lee J Richter, Ian M. Anderson
Abstract: The three-dimensional characterization of third generation photovoltaic device structures at the nanometer scale is essential to the development of efficient, reliable, and inexpensive solar cell technologies. Electron tomography is a powerful metho ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905254

17. Origin of Nanoscale Variations in Photoresponse of an Organic Solar Cell
Published: 4/22/2010
Authors: Behrang H Hamadani, Suyong S. Jung, Paul M Haney, Lee J Richter, Nikolai B Zhitenev
Abstract: Photo generated charge transport in bulk heterojunction (BHJ) solar cells is strongly dependent on the active layer nanomorphology resulting from phase segregation and connectivity of the donor and acceptor regions. Scanning probe-based techniques an ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903445

18. High performance airbrushed organic thin film transistors
Published: 3/30/2010
Authors: Calvin Chan, Lee J Richter, Brad Anthony Dinardo, Cherno Jaye, Brad Conrad, Hyun W. Ro, David Germack, Daniel A Fischer, Dean M DeLongchamp, David J Gundlach
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904576

19. Electrical and structural characterization of high performance airbrushed organic thin film transistors
Published: 3/18/2010
Authors: Calvin Chan, Lee J Richter, Cherno Jaye, Brad Conrad, Hyun W. Ro, David Germack, Daniel A Fischer, Dean M DeLongchamp, David J Gundlach
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905344

20. Characterization of SiGe Films for use as a National Institute of Standards and Technology (NIST) Microanalysis Reference material (RM 8905)
Report Number: 8905
Published: 2/1/2010
Authors: Ryna B. Marinenko, Shirley Turner, David S Simons, Savelas A Rabb, Rolf Louis Zeisler, Lee Lijian Yu, Dale E Newbury, Rick L Paul, Nicholas W m Ritchie, Stefan D Leigh, Michael R Winchester, Lee J Richter, Douglas C Meier, Keana C K Scott, D Klinedinst, John A Small
Abstract: Bulk SiGe wafers cut from single-crystal boules and two SiGe thick films (4 m and 5 m thick) on Si wafers were evaluated with the electron probe microanalyzer for the extent of heterogeneity and composition for use as reference materi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=900913



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