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Author: curt richter
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1. Influence of Metal¿MoS2 Interface on MoS2 Transistor Performance: Comparison of Ag and Ti Contacts
Hui (Hui) Yuan, Guangjun Cheng, Lin You, Haitao Li, Hao Zhu, Wei (Wei NMN) Li, Joseph J Kopanski, Yaw S Obeng, Angela R Hight Walker, David J Gundlach, Curt A Richter, D. E Ioannou, Qiliang Li
In this work, we present a study of enhancing MoS2 transistor performance by using proper metal contact. We found that the on-state current of MoS2 field-effect transistors with 30 nm Au/ 30 nm Ag contacts is enhanced more than 60 times and the subth ...
2. Attachment of a Reduction-Oxidative Active Diruthenium Compound to Au and Si Surfaces by ,ClickŠ
Sujitra Jeanie Pookpanratana, Joseph William Robertson, Curt A Richter, Christina Ann Hacker, Lee J Richter, Julia Savchenko, Steven Cummings, Tong Ren
We report the formation of molecular monolayers containing redox-active diruthenium(II,III) compound
to gold and silicon surfaces via ,clickŠ chemistry. The use of Cu-catalyzed azide-alkyne
cycloaddition enables modular design of molecular surfa ...
3. Interface Engineering to Control Magnetic Field Effects of Organic-Based Devices by Using a Molecular Self-Assembled Monolayer
Hyuk-Jae Jang, Sujitra Jeanie Pookpanratana, Alyssa N. Brigeman, Regis J Kline, James Ian Basham, David J Gundlach, Christina Ann Hacker, Oleg A Kirillov, Oana Jurchescu, Curt A Richter
Organic semiconductors hold immense promise for the development of a wide range of innovative devices with their excellent electronic and manufacturing characteristics. Of particular interest are non-magnetic organic semiconductors that show unusual ...
4. Highly reproducible and reliable metal/graphene contact by UV-Ozone treatment
Wei (Wei NMN) Li, Christina Ann Hacker, Guangjun Cheng, Angela R Hight Walker, Curt A Richter, David J Gundlach, Yiran Liang, boyuan Tian, Xuelei Liang, Lianmao Peng
Resist residue from the device fabrication process is a significant source of contamination at the
metal/graphene contact interface. Ultraviolet Ozone (UVO) treatment is proven here, by X-ray
photoelectron spectroscopy (XPS) and Raman measurement ...
5. UV/Ozone treatment to reduce metal-graphene contact resistance
Wei (Wei NMN) Li, Kurt Pernstich, Angela R Hight Walker, Tian T. Shen, Guangjun Cheng, Christina Ann Hacker, Curt A Richter, Qiliang Li, David J Gundlach, Xuelei Liang, Lianmao Peng, Yiran Liang
6. Topological Insulator Bi2Se3 Nanowire High Performance Field-Effect Transistors
Hao Zhu, Curt A Richter, Erhai Zhao, John E Bonevich, William Andrew Kimes, Hyuk-Jae Jang, Hui Yuan, Abbas Arab, Oleg A Kirillov, James E Maslar, D. E Ioannou, Qiliang Li
Topological insulators are unique electronic materials with insulating interiors but robust metallic surfaces. Device applications exploiting their remarkable properties, such as surface conduction of helical Dirac electrons, have so far been hampere ...
7. Graphene as Transparent Electrode for Direct Observation of Hole Photoemission from Silicon to Oxide
Rusen Yan, Qin Q. Zhang, Oleg A Kirillov, Wei (Wei NMN) Li, James Ian Basham, Alexander George Boosalis, Xuelei X. Liang, Debdeep Jena, Curt A Richter, Alan C. Seabaugh, David J Gundlach, Huili G. Xing, Nhan V Nguyen
The outstanding electrical and optical properties of graphene make it an excellent alternative as a transparent electrode. Here we demonstrate the application of graphene as collector material in internal photoemission (IPE) spectroscopy; enabling th ...
8. Metrology For Organic Monolayers On Cobalt Surfaces
Sujitra Jeanie Pookpanratana, Leigh Kent Lydecker, Hyuk-Jae Jang, Curt A Richter, Christina Ann Hacker
9. Charge-Based Capacitance Measurements Circuits for Interface With Atomic Force Microscope Probes
Joseph J Kopanski, Muhammad Yaqub Afridi, Chong Jiang, Michael Lorek, Timothy Kohler, Curt A Richter
The charge based capacitance measurement (CBCM) technique is highly sensitive to small capacitances and capable integration of onto an AFM tip, thereby reducing stray and wire capacitance to the bare minimum. The CBCM technique has previous been appl ...
10. ELECTRICAL AND PHYSICAL CHARACTERIZATION OF BILAYER CARBOXYLIC ACID FUNCTIONALIZED MOLECULAR LAYERS
Sujitra Jeanie Pookpanratana, Joseph William Robertson, Cherno Jaye, Daniel A Fischer, Curt A Richter, Christina Ann Hacker
We have used Flip Chip Lamination (FCL) to form monolayer and bilayer molecular junctions of carboxylic acid-containing molecules with Cu atom incorporation. Carboxylic acid-terminated monolayers are self-assembled onto ultrasmooth Au using thiol che ...