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Author: vivek prabhu

Displaying records 61 to 70 of 78 records.
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61. Surface Effects in Chemically Amplified Photoresists: Environmental Stability and Segregation
Published: 2/1/2004
Authors: E Jablonski, Vivek M Prabhu, S Sambasivan, Daniel A Fischer, Eric K Lin, D L Goldfarb, M Angelopoulos, H Ito
Abstract: It is well known that chemically amplified photoresists are sensitive to certain airborne molecular contaminants, notably amines, during post exposure delay, although the actual cause and specific failure mechanism are unknown. To assess the effect o ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852321

62. Water Absorption in Thin Photoresist Films
Published: 2/1/2004
Authors: B D. Vogt, Christopher Soles, Ronald Leland Jones, Vivek M Prabhu, Wen-Li Wu, Eric K Lin
Abstract: In this work, we quantify deviations in the moisture absorption into model photoresist films upon changing thickness. Both the thermodynamics and kinetics of the absorption process are examined. Water in the resist films has been shown to have a sign ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852354

63. Counterion Associative Behavior with Flexible Polyelectrolytes
Published: 1/1/2004
Authors: Vivek M Prabhu, Eric J. Amis, D P Bossev, N S Rosov
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853951

64. Proton NMR Determination of Miscibility in a Bulk Model Photoresist System: Poly(4-hydroxystyrene) and the Photoacid Generator, Di-(t-butylphenyl) Iodonium Perfluorooctanesulfonate
Published: 1/1/2004
Authors: David Lloyd VanderHart, Vivek M Prabhu, Eric K Lin
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853953

65. Near-Edge X-Ray Absorption Fine Structure Measurements of Surface Segregation in 157 nm Photoresist Blends
Published: 12/1/2003
Authors: E Jablonski, Vivek M Prabhu, S Sambasivan, Eric K Lin, Daniel A Fischer, D L Goldfarb, M Angelopoulos, H Ito
Abstract: The surface and bulk chemistry of photoresist blends for use at the 157 nm node were analyzed using near edge x-ray absorption fine structure (NEXAFS) spectroscopy to quantify component segregation and identify surface phenomena that may impact patte ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852205

66. Interdiffision in Polystyrene and End-Functional Polystyrene Thin Films Near a Solid Surface
Published: 9/10/2003
Authors: Chengqing C. Wang, Vivek M Prabhu, Christopher Soles, B D. Vogt, Wen-Li Wu, Eric K Lin, Sushil K. Satija
Abstract: Polymer interdiffusion near the polymer/solid interface is studied using neutron reflectometry. Bilayers of hydrogenated polystyrene (hPS) and deuterated polystyrene (dPS) or hydrogenated dicarboxy terminated polystyrene (hPS(COOH)2) and dPS are prep ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852188

67. Form of Deprotection in Chemically Amplified Resists
Published: 9/1/2003
Authors: Ronald Leland Jones, T J Hu, Vivek M Prabhu, Christopher Soles, Eric K Lin, Wen-Li Wu, D L Goldfarb, M Angelopoulos
Abstract: The push to mass production of patterns with sub-100 nm dimensions will require nanometer level control of feature size, including line edge roughness (LER). Control of LER and sidewall roughness within the length scale of individual molecules requi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852161

68. Interdiffusion in Polystyrene and End-Functional Polystyrene Thin Films Near a Solid Surface
Published: 9/1/2003
Authors: C M Wang, Vivek M Prabhu, Christopher Soles, B D. Vogt, Wen-Li Wu, Eric K Lin, Sushil K. Satija
Abstract: Polymer interdiffusion near the polymer/solid interface is studied using neutron reflectometry. Bilayers of hydrogenated polystyrene (hPS) and deuterated polystyrene (dPS) or hydrogenated dicarboxy terminated polystyrene (hPS(COOH)2) and dPS are prep ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852237

69. Polyelectrolyte Effects in Model Photoresist Developer Solutions
Published: 8/1/2003
Authors: Vivek M Prabhu, Ronald Leland Jones, Eric K Lin, Wen-Li Wu
Abstract: We demonstrate that the industrially relevant deprotected photoresist poly(4-hydroxy styrene) is a polyelectrolyte when dissolved in aqueous base solutions. These findings demonstrate the well-known monomer-monomer correlations indicative of polyel ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852091

70. Deprotection Volume Characteristics and Line Edge Morphology in Chemically Amplified Resists
Published: 6/1/2003
Authors: Ronald Leland Jones, C G Willson, T J Hu, Vivek M Prabhu, Christopher Soles, Eric K Lin, Wen-Li Wu, D L Goldfarb, M Angelopoulos, B C Trinque
Abstract: The focus of this paper is the form of spatial heterogeneity of deprotection at the eventual pattern edge. The form results from the packing of fuzzy blobs consisting of volumes of deprotection created by individual photogenerated acids. The for ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852190



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