Publications Portal

You searched on:
Author: vivek prabhu

Displaying records 51 to 60 of 77 records.
Resort by: Date / Title

51. Water Distribution Within Immersed Polymer Films
Published: 2/1/2005
Authors: B D. Vogt, Christopher L Soles, Vivek M Prabhu, Sushil K. Satija, Eric K Lin, Wen-Li Wu
Abstract: The emergence of immersion lithography as a potential alternative for the extension of current lithography tools will require a fundamental understanding of the interactions between the photoresist and the immersion liquid such as water. The water c ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852459

52. Water Immersion of Model Photoresists: Interfacial Influences on Water Concentration and Surface Morphology
Published: 2/1/2005
Authors: B D. Vogt, D L Goldfarb, M Angelopoulos, Christopher L Soles, C M Wang, Vivek M Prabhu, P M McGuiggan, Jack F Douglas, Eric K Lin, Wen-Li Wu, Sushil K. Satija
Abstract: Immersion lithography has emerged as an alternative to the 157 nm node and as such understanding of the interactions between the photoresist and immersion fluid (water) has become a pressing issue. The water concentration within the model photoresis ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852338

53. Control of Moisture at Buried Polymer/Alumina Interfaces through Substrate Surface Modification
Published: 1/1/2005
Authors: B D. Vogt, Vivek M Prabhu, Christopher L Soles, Sushil K. Satija, Eric K Lin, Wen-Li Wu
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853977

54. X-Ray and Neutron Reflectivity Measurements of Moisture Transport Through Model Multilayered Barrier Films for Oled Applications
Published: 1/1/2005
Authors: B D. Vogt, V. J. Lee, Vivek M Prabhu, Dean M DeLongchamp, Eric K Lin, Wen-Li Wu
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=853976

55. Counterion associative behavior with flexible polyelectrolytes
Published: 9/1/2004
Authors: Vivek M Prabhu, Eric J. Amis, N S Rosov
Abstract: At low ionic strength, organic counterions dress a flexible charged polymer as measured directly by small-angle neutron scattering (SANS) and neutron spin-echo (NSE) spectroscopy. This dressed state, quantified by the concentration dependence of th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852243

56. Surface and Bulk Chemistry of Chemically Amplified Photoresists: Segregation in Thin Films and Environmental Stability Issues
Published: 9/1/2004
Authors: E Jablonski, Vivek M Prabhu, S Sambasivan, Daniel A Fischer, Eric K Lin, D L Goldfarb, M Angelopolous, H Ito
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852294

57. Proton NMR Determination of Miscibility in a Bulk Model Photoresist System Poly (4-Hydroxystyene) and the Photoacid Generator, Di(t-butylphenyl) Iodonium Perfluorooctane Sulfonate
Published: 7/13/2004
Authors: David Lloyd VanderHart, Vivek M Prabhu, Eric K Lin
Abstract: The intimacy of component mixing in 2 blends of poly(4-hydroxystyrene) (PHS) and a photoacid generator (PAG), di(t-butylphenyl) iodonium perfluorooctane sulfonate (PFOS) were studied by solid state proton NMR. Mass ratios were 91/9 and 85/15 PHS/PFO ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852101

58. Correlation of the Reaction Front With Roughness in Chemically Amplified Photoresists
Published: 7/1/2004
Authors: Ronald Leland Jones, Vivek M Prabhu, D M Goldfarb, Eric K Lin, Christopher L Soles, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Wen-Li Wu, M Angelopoulos
Abstract: A model bilayer geometry is used to examine fundamental contributions of in-situ reaction front profile width on resulting line edge roughness after development in standard 0.26 N tetramethyl ammonium hydroxide aqueous base developer. The bilayer ge ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852147

59. Fundamentals of Developer-Resist Interactions for Line-Edge Roughness and Critical Dimension Control in Model 248 nm and 157 nm Photoresists
Published: 5/1/2004
Authors: Vivek M Prabhu, M Wang, E Jablonski, B D. Vogt, Eric K Lin, Wen-Li Wu, D L Goldfarb, M Angelopoulos, H Ito
Abstract: Organic polar solvent (1-butanol) versus aqueous base (tetramethylammonium hydroxide, (TMAH)) development quality are distinguished by neutral versus charged polymer (polyelectrolyte) dissolution behavior of photoresist bilayers on silicon substrates ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852336

60. Surface Effects in Chemically Amplified Photoresists: Environmental Stability and Segregation
Published: 2/1/2004
Authors: E Jablonski, Vivek M Prabhu, S Sambasivan, Daniel A Fischer, Eric K Lin, D L Goldfarb, M Angelopoulos, H Ito
Abstract: It is well known that chemically amplified photoresists are sensitive to certain airborne molecular contaminants, notably amines, during post exposure delay, although the actual cause and specific failure mechanism are unknown. To assess the effect o ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852321