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You searched on: Author: vivek prabhu

Displaying records 51 to 60 of 77 records.
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51. Interfacial Structure of Photoresist Thin Films in Developer Solutions
Published: 3/1/2005
Authors: Vivek M Prabhu, B D. Vogt, Wen-Li Wu, Jack F Douglas, Sushil K. Satija, D M Goldfarb, H Ito
Abstract: The development step is critical to the fabrication of nanostructures in chemically amplified photoresist technology. With critical dimensions (CD) shrinking to sub-100 nm and the concurrent reduction in exposure radiation wavelength, line-edge roug ...

52. Water Distribution Within Immersed Polymer Films
Published: 2/1/2005
Authors: B D. Vogt, Christopher L Soles, Vivek M Prabhu, Sushil K. Satija, Eric K Lin, Wen-Li Wu
Abstract: The emergence of immersion lithography as a potential alternative for the extension of current lithography tools will require a fundamental understanding of the interactions between the photoresist and the immersion liquid such as water. The water c ...

53. Water Immersion of Model Photoresists: Interfacial Influences on Water Concentration and Surface Morphology
Published: 2/1/2005
Authors: B D. Vogt, D L Goldfarb, M Angelopoulos, Christopher L Soles, C M Wang, Vivek M Prabhu, P M McGuiggan, Jack F Douglas, Eric K Lin, Wen-Li Wu, Sushil K. Satija
Abstract: Immersion lithography has emerged as an alternative to the 157 nm node and as such understanding of the interactions between the photoresist and immersion fluid (water) has become a pressing issue. The water concentration within the model photoresis ...

54. Control of Moisture at Buried Polymer/Alumina Interfaces through Substrate Surface Modification
Published: 1/1/2005
Authors: B D. Vogt, Vivek M Prabhu, Christopher L Soles, Sushil K. Satija, Eric K Lin, Wen-Li Wu

55. X-Ray and Neutron Reflectivity Measurements of Moisture Transport Through Model Multilayered Barrier Films for Oled Applications
Published: 1/1/2005
Authors: B D. Vogt, V. J. Lee, Vivek M Prabhu, Dean M DeLongchamp, Eric K Lin, Wen-Li Wu

56. Counterion associative behavior with flexible polyelectrolytes
Published: 9/1/2004
Authors: Vivek M Prabhu, Eric J. Amis, N S Rosov
Abstract: At low ionic strength, organic counterions dress a flexible charged polymer as measured directly by small-angle neutron scattering (SANS) and neutron spin-echo (NSE) spectroscopy. This dressed state, quantified by the concentration dependence of th ...

57. Surface and Bulk Chemistry of Chemically Amplified Photoresists: Segregation in Thin Films and Environmental Stability Issues
Published: 9/1/2004
Authors: E Jablonski, Vivek M Prabhu, S Sambasivan, Daniel A Fischer, Eric K Lin, D L Goldfarb, M Angelopolous, H Ito

58. Proton NMR Determination of Miscibility in a Bulk Model Photoresist System Poly (4-Hydroxystyene) and the Photoacid Generator, Di(t-butylphenyl) Iodonium Perfluorooctane Sulfonate
Published: 7/13/2004
Authors: David Lloyd VanderHart, Vivek M Prabhu, Eric K Lin
Abstract: The intimacy of component mixing in 2 blends of poly(4-hydroxystyrene) (PHS) and a photoacid generator (PAG), di(t-butylphenyl) iodonium perfluorooctane sulfonate (PFOS) were studied by solid state proton NMR. Mass ratios were 91/9 and 85/15 PHS/PFO ...

59. Correlation of the Reaction Front With Roughness in Chemically Amplified Photoresists
Published: 7/1/2004
Authors: Ronald Leland Jones, Vivek M Prabhu, D M Goldfarb, Eric K Lin, Christopher L Soles, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Wen-Li Wu, M Angelopoulos
Abstract: A model bilayer geometry is used to examine fundamental contributions of in-situ reaction front profile width on resulting line edge roughness after development in standard 0.26 N tetramethyl ammonium hydroxide aqueous base developer. The bilayer ge ...

60. Fundamentals of Developer-Resist Interactions for Line-Edge Roughness and Critical Dimension Control in Model 248 nm and 157 nm Photoresists
Published: 5/1/2004
Authors: Vivek M Prabhu, M Wang, E Jablonski, B D. Vogt, Eric K Lin, Wen-Li Wu, D L Goldfarb, M Angelopoulos, H Ito
Abstract: Organic polar solvent (1-butanol) versus aqueous base (tetramethylammonium hydroxide, (TMAH)) development quality are distinguished by neutral versus charged polymer (polyelectrolyte) dissolution behavior of photoresist bilayers on silicon substrates ...

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