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Author: vivek prabhu

Displaying records 41 to 50 of 77 records.
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41. Fundamentals of the Reaction-Diffusion Process in Model EUV Photoresists
Published: 3/1/2006
Authors: Kristopher Lavery, George Thompson, Hai Deng, D S Fryer, Kwang-Woo Choi, B D. Vogt, Vivek M Prabhu, Eric K Lin, Wen-Li Wu, Sushil K Satija, Michael Leeson, Heidi B Cao
Abstract: More demanding requirements are being made of photoresist materials for fabrication of nanostructures as the feature critical dimensions (CD) decrease. For EUV resists, control of line width roughness (LWR) and high resist sensitivity are key requir ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852624

42. The Deprotection Reaction Front Profile for Model 193 nm Methacrylate-Based Chemically Amplified Photoresists
Published: 3/1/2006
Authors: B D. Vogt, Shuhui Kang, Vivek M Prabhu, Ashwin Rao, Eric K Lin, Sushil K Satija, Karen Turnquest, Wen-Li Wu
Abstract: An understanding of acid diffusion-reaction in chemically amplified photoresists during the post-exposure bake (PEB) is critical for both critical dimension (CD) and line edge roughness (LER) control. Despite its importance, there remains a lack of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852589

43. Copolymer Fraction Effect on Acid Catalyzed Deprotection Reaction Kinetics in Model 193 nm Photoresists
Published: 2/19/2006
Authors: Shuhui Kang, Vivek M Prabhu, B D. Vogt, Eric K Lin, Wen-Li Wu, Karen Turnquest
Abstract: A correlation between polymer molecular structure and acid catalyzed kinetics is demonstrated by a binary copolymer photoresists system which includes an acid-liable and an acid-inert species. It was found that the acid catalyzed deprotection kinetic ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852598

44. Dissolution Fundamentals of 193-nm Methacrylate Based Photoresists
Published: 2/19/2006
Authors: Ashwin Rao, Shuhui Kang, B D. Vogt, Vivek M Prabhu, Eric K Lin, Wen-Li Wu, Karen Turnquest, W D Hinsberg
Abstract: The dissolution of partially deprotected chemically amplified photoresists is the final step in printing lithographic features. Since this process step can be tuned independently from the design of the photoresist chemistry, fundamental measurements ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852551

45. Direct Measurement of the Counterion Distribution Within Swollen Polyelectrolyte Films
Published: 7/19/2005
Authors: Vivek M Prabhu, B D. Vogt, Wen-Li Wu, Eric K Lin, Jack F Douglas, Sushil K Satija, D L Goldfarb, H Ito
Abstract: The depth profile of the counterion concentration within thin polyelectrolyte films was measured in situ using contrast variant specular neutron reflectivity to characterize the initial swelling stage of the film dissolution.Wefind substantial counte ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852397

46. Dielectric Properties of Nylon 6/Clay Nanocomposites From On-Line Process Monitoring and Off-Line Measurements
Published: 7/1/2005
Authors: N Noda, Y E Lee, Anthony J. Bur, Vivek M Prabhu, Chad R Snyder, S C Roth, M M McBrearty
Abstract: Nylon 6/ clay nanocomposites were studied by dielectric relaxation spectroscopy (DRS) to correlate morphology and microstructure with relaxation behavior of the polymer matrix at the molecular level. Two types of microstructure, agglomerated and exf ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852234

47. Counterion Structure and Dynamics in Polyelectrolyte Solutions
Published: 6/23/2005
Author: Vivek M Prabhu
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854018

48. Direct Measurement of the Counterion Distribution Within Swollen Polyelectrolyte Films
Published: 5/20/2005
Authors: Vivek M Prabhu, B D. Vogt, Wen-Li Wu, Jack F Douglas, Eric K Lin, Sushil K Satija, D M Goldfarb, H Ito
Abstract: A depth profile of the counterion concentration within thin polyelectrolyte films was measured in-situ using contrast variant specular neutron reflectivity to characterize the initial swelling stage of the film dissolution. We find a substantial coun ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=854005

49. Control of Moisture at Buried Polymer / Alumina Interfaces Through Subtrate Surface Modification
Published: 3/15/2005
Authors: B D. Vogt, Vivek M Prabhu, Christopher L Soles, Sushil K Satija, Eric K Lin, Wen-Li Wu
Abstract: Moisture absorption in poly(4-tert-butoxycarbonyl-oxystyrene) (PBOCSt) films supported on Al2O3 sputter coated silicon wafers is measured using neutron and x-ray reflectivity. Accumulation of water at the interface during moisture exposure results in ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852447

50. Interfacial Structure of Photoresist Thin Films in Developer Solutions
Published: 3/1/2005
Authors: Vivek M Prabhu, B D. Vogt, Wen-Li Wu, Jack F Douglas, Sushil K Satija, D M Goldfarb, H Ito
Abstract: The development step is critical to the fabrication of nanostructures in chemically amplified photoresist technology. With critical dimensions (CD) shrinking to sub-100 nm and the concurrent reduction in exposure radiation wavelength, line-edge roug ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=852460