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1. 2nd Annual Tri-National Workshop on Standards for Nanotechnology - (NIST presentations)
Published: 12/10/2008
Authors: Ronald G Dixson, Jon Robert Pratt, Vincent A Hackley, James Edward Potzick, Richard A Allen, Ndubuisi George Orji, Michael T Postek, Herbert S Bennett, Theodore Vincent Vorburger, Jeffrey A Fagan, Robert L. Watters
Abstract: A new era of cooperation between North American National Measurement Institutes (NMIs) was ushered by the National Research Council of Canada Institute for National Measurement Standards (NRC-INMS) on February 7, 2007 when the first Tri-National wo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824641

2. A Benefit/Cost Model for Metrology in Manufacturing
Published: 10/24/2005
Author: James Edward Potzick
Abstract: Every measurement of a feature's size or placement on a wafer or photomask is made for a reason. Usually a measurement leads to a decision, often involving a process adjustment or business transaction, and there are costs and benefits attached to the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822366

3. A Method to Characterize Overlay Tool Misalignments and Distortions
Published: 7/1/1997
Authors: Richard M Silver, James Edward Potzick, Fredric Scire, Christopher J. Evans, Michael L McGlauflin, Edward A Kornegay, Robert D. Larrabee
Abstract: A new optical alignment artifact under development at NIST is described. This structure, referred to as a stepped microcone, is designed to assist users and manufacturers of overlay metrology tools in the reduction of tool-induced measurement errors. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820873

4. Accuracy Differences Among Photomask Metrology Tools and Why They Matter
Published: 12/1/1998
Author: James Edward Potzick
Abstract: A variety of different kinds of photomask critical dimensions (CD) metrology tools are available today to help meet current and future metrology challenges. These tools are based on different operating principles, and have different cost, throughput, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820908

5. Accuracy Differences Among Photomask Metrology Tools--and Why They Matter
Published: 9/1/1998
Author: James Edward Potzick
Abstract: A variety of different kinds of photomask critical dimension (CD) metrology tools are available today to help meet current and future metrology challenges. These tools are based on different operating principles, and have differing cost, throughput, ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823105

6. Accuracy and Traceability in Dimensional Measurements
Published: 6/1/1998
Author: James Edward Potzick
Abstract: Dimensional measurements of importance to microlithography include feature sizes and feature placement on photomasks and wafers, overlay eccentricities, defect and particle sizes on masks and wafers, and many others. A common element is that the obje ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820907

7. Accuracy in Integrated Circuit Dimensional Measurements
Published: 12/1/1994
Author: James Edward Potzick
Abstract: The measurement of critical dimensions of features on integrated circuits and photomasks is modeled as the comparison of the images of the test object and of a standard object in a measuring device. A length measuring instrument is then a comparator. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820706

8. Accuracy in Optical Image Modeling
Published: 2/26/2007
Authors: James Edward Potzick, Egon Marx, M P Davidson
Abstract: Wafer exposure process simulation and optical photomask feature metrology both rely on optical image modeling for accurate results. The best way to gauge the accuracy of an imaging model is to compare the model results with an actual image. Modeling ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822704

9. Antireflecting-Chromium Linewidth Standard, SRM 473, for Calibration of Optical Microscope Linewidth Measuring System
Series: Technical Note (NIST TN)
Report Number: 260
Published: 1/1/1997
Author: James Edward Potzick
Abstract: This document describes the physical characteristics of Standard Reference Material SRM 473, provides instructions for its use in calibrating optical photomask linewidth measuring systems, and gives information and precautions concerning its care and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820868

10. Automated Calibration of Optical Photomask Linewidth Standards at the National Institute of Standards and Technology
Published: 12/31/1989
Author: James Edward Potzick
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=6047



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