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Author: james potzick

Displaying records 51 to 60 of 61 records.
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51. National Institute of Standards and Technology (NIST) J93 Project Interim Report
Published: 12/22/1994
Authors: Michael T Postek, James Edward Potzick, J Schneir, T Mcwaid, Robert D. Larrabee
Abstract: Unavailable.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820705

52. Accuracy in Integrated Circuit Dimensional Measurements
Published: 12/1/1994
Author: James Edward Potzick
Abstract: The measurement of critical dimensions of features on integrated circuits and photomasks is modeled as the comparison of the images of the test object and of a standard object in a measuring device. A length measuring instrument is then a comparator. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820706

53. Improving Photomask Linewidth Measurement Accuracy via Emulated Stepper Aerial Image Measurement
Published: 12/1/1994
Author: James Edward Potzick
Abstract: Photomask linewidth measurements are needed for vendor/buyer communication, for developing specifications and ensuring that products meet specifications, and sometimes for legal compliance. Linewidths are also measured for process monitoring for eith ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820707

54. National Institute of Standards and Technology (NIST) J93 Project Proposal Report
Published: 6/15/1994
Authors: Michael T Postek, Robert D. Larrabee, L Linholm, James Edward Potzick, J Schneir, T Mcwaid, Michael W Cresswell, Richard A Allen, E Clayton Teague
Abstract: Unavailable.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820703

55. Photomask Linewidth Measurement Uncertainty: An Alternative Approach via Stepper Emulation
Published: 1/1/1994
Author: James Edward Potzick
Abstract: The most significant contribution to uncertainty in the measurement of photomask linewidths is the rough shape of the edge of the etched chrome lines. This uncertainty can be greatly reduced if the emulated stepper aerial image of the feature is meas ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820708

56. Comparisons of Measured Linewidths of Sub-Micrometer Lines Using Optical, Electrical, and SEM Metrologies
Published: 9/1/1993
Authors: Richard A Allen, P. Troccolo, James C. OwenI, James Edward Potzick, Michael T Postek, Loren W. Linholm
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=29951

57. Standard Reference Materials: Antireflecting-Chromium Linewidth Standard, SRM 475, for Calibration of Optical Microscope Linewidth Measuring Systems
Series: Special Publication (NIST SP)
Published: 1/1/1992
Authors: C. F. Vezzetti, R. N. Varner, James Edward Potzick
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=3436

58. Standard Reference Materials: Bright-Chromium Linewidth Standard, SRM 476, for Calibration of Optical Microscope Linewidth Measuring Systems
Series: Special Publication (NIST SP)
Published: 1/1/1991
Authors: C. F. Vezzetti, R. N. Varner, James Edward Potzick
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=4862

59. Practical Photomask Linewidth Measurement
Published: 12/31/1990
Author: James Edward Potzick
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=16646

60. Automated Calibration of Optical Photomask Linewidth Standards at the National Institute of Standards and Technology
Published: 12/31/1989
Author: James Edward Potzick
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=6047



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