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Author: james potzick

Displaying records 41 to 50 of 61 records.
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41. New Certified Length Scale for Microfabrication Metrology
Published: 9/1/1996
Author: James Edward Potzick
Abstract: The National Institute of Standards and Technology is developing a dimensional pitch standard covering the range 1 micrometers to 10 mm, intended for the calibration of microscope magnification and of dimensional metrology instrument scales. Called S ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820811

42. High Accuracy Overlay Measurements
Published: 5/1/1996
Authors: Richard M Silver, James Edward Potzick, Fredric Scire, Robert D. Larrabee
Abstract: The reduced critical dimensions of semiconductor devices place more stringent requirements on the precision and accuracy of overlay metrology tools used to monitor stepper feature placement. The use of mix and match stepper techniques and step and sc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820817

43. International Comparison of Photomask Linewidth Standards: U.S. (NIST) and U.K. (NPL)
Published: 5/1/1996
Authors: James Edward Potzick, J Nunn
Abstract: Photomask linewidth standards serve as primary standards for the calibration of photomask metrology tools and are available from the national standards organizations of several countries. These standards are often in the form of chrome-on-quartz phot ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820814

44. New NIST-Certified Length Microscale
Published: 1/1/1996
Author: James Edward Potzick
Abstract: The National Institute of Standards and Technology is developing a simple one-dimension certified pitch standard (or scale) covering the range 1 um to 10 mm, intended for the calibration of microscope magnification and dimensional metrology instrumen ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820812

45. Optical Overlay Metrology at NIST
Published: 1/1/1996
Authors: Richard M Silver, Amy Singer, L Carroll, S Berg-cross, James Edward Potzick
Abstract: Many of the significant challenges in making accurate overlay registration measurements are discussed. An understanding of the causes of the errors affecting these measurements is a prerequisite to improving accuracy and also for the design of standa ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820818

46. Strut Structure and Rigid Joint Therefor
Published: 1/1/1996
Author: James Edward Potzick
Abstract: A highly rigid structure is provided using six struts connected at three upper and three lower nodes to upper and lower support structures. The joint assemblies are formed by half- spherical balls attached to the ends of each of the struts, and retai ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820813

47. Improved Photomask Metrology Through Exposure Emulation
Published: 7/1/1995
Author: James Edward Potzick
Abstract: The ultimate purpose of the photomask in IC manufacture is to define the image to be printed on a silicon wafer. Of the many factors which affect this aerial image in the wafer stepper, some are properties of the stepper projection system and some ar ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820757

48. Metrology with the Ultraviolet Scanning Transmission Microscope
Published: 5/1/1995
Authors: Richard M Silver, James Edward Potzick, Y Hu
Abstract: A novel design for an ultraviolet critical dimension measurement transmission microscope utilizing the Stewart platform as the rigid main structure has been implemented. This new design shows improved vibration characteristics and is able to accommod ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820765

49. Overlay Measurements and Standards
Published: 5/1/1995
Authors: Richard M Silver, James Edward Potzick, Robert D. Larrabee
Abstract: The relative misalignment of features produced by different mask levels (i.e., overlay error) is projected to become an increasingly important problem to the semiconductor industry as the size of the critical features continues to decrease. In respon ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820766

50. Re-Evaluation of the Accuracy of NIST Photomask Linewidth Standards
Published: 5/1/1995
Author: James Edward Potzick
Abstract: Every artifact measurement standard has some uncertainty associated with its calibration, and the NIST Photomask Linewidth Standards are no exception. This uncertainty is caused by a combination of those factors which influence the calibration measur ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820758



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