NIST logo

Publications Portal

You searched on:
Author: james potzick

Displaying records 21 to 30 of 61 records.
Resort by: Date / Title


21. Updated NIST Photomask Linewidth Standard
Published: 5/1/2003
Authors: J Pedulla, James Edward Potzick, Michael T. Stocker
Abstract: NIST is preparing to issue the next generation in its line of binary photomask linewidth standards. Called SRM 2059, it was developed for calibrating microscopes used to measure linewidths on photomasks, and consists of antireflecting chrome line and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822399

22. Updated NIST Photomask Linewidth Standard
Published: 1/1/2003
Authors: James Edward Potzick, J Pedulla, Michael T. Stocker
Abstract: NIST is preparing to issue the next generation in its line of binary photomask linewidth standards. Called SRM 2059, it was developed for calibrating microscopes used to measure linewidths on photomasks, and consists of antireflecting chrome line and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821970

23. New NIST Photomask Linewidth Standard
Published: 12/1/2002
Authors: James Edward Potzick, J Pedulla, Michael T. Stocker
Abstract: NIST is preparing to issue the next generation in its line of binary photomask linewidth standards. Called SRM 2059, it was developed for calibrating microscopes used to measure linewidths on photomasks, and consists of antireflecting chrome line and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821959

24. Problem With Submicrometer-Linewidth Standards and a Proposed Solution
Published: 8/1/2001
Author: James Edward Potzick
Abstract: Traceable linewidth measurements of tiny features on photomasks and wafers present interesting challenges. Usually technical solutions exist for the problems encountered, but traceability can be costly in time and labor. A measurement is useful only ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822442

25. Problem with Submicrometer-linewidth Standards and A Possible Solution
Published: 8/1/2001
Author: James Edward Potzick
Abstract: Traceable linewidth measurements of tiny features on photomasks and wafers present interesting challenges. Usually technical solutions exist for the problems encountered, but traceability can be costly in time and labor. A measurement is useful only ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821576

26. Final Report of the e-SRM Committee on the Optimal Delivery of Services to Customers for Standard Reference Materials
Series: NIST Interagency/Internal Report (NISTIR)
Report Number: 6759
Published: 6/1/2001
Authors: John Carlton Travis, Sally Skidmore Bruce, D J Clarke, James R. Ehrstein, Michael S. Epstein, Daniel G Friend, T E. Gills, Kenneth G Inn, Larry Lee Lucas, James Edward Potzick, M H Saunders, N M Trahey, G M Ugiansky, R Michael Verkouteren, D P Vigliotti, Robert L. Watters
Abstract: The e-SRM committee was formed at the request of Technology Services (TS) to recommend ways to employ appropriate technologies to optimize the consistency, efficiency, and effectiveness with which NIST provides technical support to customers for Stan ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=200008

27. Neolithography Consortium: A Progress Report
Published: 1/1/2001
Author: James Edward Potzick
Abstract: The role of process simulation is becoming an increasingly important part of microlithography process control and photomask metrology as wafer feature sizes become smaller than the exposure wavelength, because the pattern transfer from photomask to w ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821001

28. The Neolithography Consortium
Published: 6/1/2000
Author: James Edward Potzick
Abstract: The role of process simulation in microlithography is becoming an increasingly important part of process control as wafer feature sizes become smaller than the exposure wavelength, because the pattern transfer from photomask to wafer is nonlinear. An ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820976

29. Measurement Uncertainity and Noise in Nanometrology
Published: 6/1/1999
Author: James Edward Potzick
Abstract: The measurement of feature sizes on integrated circuit photomasks and wafers is an economically important and technically challenging application of nanometrology. The displacement measuring laser heterodyne interferometer is a popular tool in such ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823119

30. Noise Averaging and Measurement Resolution (or A Little Noise is a Good Thing)
Published: 4/1/1999
Author: James Edward Potzick
Abstract: When a continuous quantity is measured with a digital instrument or digitized for further processing, a measurement uncertainty component is incurred from quantization of the continuous variable. This uncertainty can be reduced by oversampling and a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823107



Search NIST-wide:


(Search abstract and keywords)


Last Name:
First Name:







Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series