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Author: michael postek

Displaying records 31 to 40 of 225 records.
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31. Instrumentation, Metrology, and Standards, Three Keys to the Nanotech Kingdom
Published: 5/1/2009
Authors: Michael T Postek, Kevin W Lyons
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824732

32. On the Sub-Nanometer Resolution of Scanning Electron and Helium Ion Microscopes
Published: 3/1/2009
Authors: Andras Vladar, Michael T Postek, Bin Ming
Abstract: All forms of microscopy are being pushed to the limit by nanotechnology. Hence, there is a relentless quest to achieve better and better resolution with various electron and ion microscopes and to monitor and maintain these instruments to achieve the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901833

33. On the Sub-Nanometer Resolution of Scanning Electron and Scanning Helium Ion Microscopes
Published: 3/1/2009
Authors: Michael T Postek, Andras Vladar, Bin Ming
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901569

34. Understanding Imaging and Metrology with the Helium Ion Microscope
Published: 3/1/2009
Authors: Michael T Postek, Andras Vladar, Bin Ming
Abstract: The development of accurate metrology for the characterization of nanomaterials is one barrier to innovation confronting all phases of nanotechnology. Ultra-high resolution microscopy is a key technology needed to achieve this goal. But, current micr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902394

35. 2nd Annual Tri-National Workshop on Standards for Nanotechnology - (NIST presentations)
Published: 12/10/2008
Authors: Ronald G Dixson, Jon Robert Pratt, Vincent A Hackley, James Edward Potzick, Richard A Allen, Ndubuisi George Orji, Michael T Postek, Herbert S Bennett, Theodore Vincent Vorburger, Jeffrey A Fagan, Robert L. Watters
Abstract: A new era of cooperation between North American National Measurement Institutes (NMIs) was ushered by the National Research Council of Canada Institute for National Measurement Standards (NRC-INMS) on February 7, 2007 when the first Tri-National wo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824641

36. Helium Ion Microscopy and its Application to Nanotechnology and Nanometrology
Published: 11/4/2008
Authors: Michael T Postek, Andras Vladar
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824682

37. Cellulose Nanocrystals the Next Big Nano-thing?
Published: 8/6/2008
Authors: Michael T Postek, Andras Vladar, John A. Dagata, Natalia Farkas, Bin Ming, Ronald Sabo, Theodore H Wegner
Abstract: Biomass surrounds us from the smallest alga to the largest redwood tree. Even the largest trees owe their strength to a newly-appreciated class of nanomaterials known as cellulose nanocrystals (CNC). Cellulose, the world s most abundant natural, rene ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824683

38. Metrology at the Nanoscale: What are the Grand Challenges?
Published: 8/6/2008
Authors: Kevin W Lyons, Michael T Postek
Abstract: Nanometrology provides the means to measure and characterize nanometer scale process and product performance and covers an expanse of topics including instrumentation, measurement methods (off-line and in-process applications), and standards. To meet ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824701

39. Simulated SEM Images for Resolution Measurement
Published: 7/30/2008
Authors: Petr Cizmar, Andras Vladar, Bin Ming, Michael T Postek
Abstract: Resolution is a key performance metric, which often defines the quality of a scanning electron microscope (SEM). Traditionally, there is the subjective measurement of the distance between two points on special ''resolution'' samples and there are sev ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823050

40. The Potentials of Helium Ion Microscopy for Semiconductor Process Metrology
Published: 2/6/2008
Authors: Michael T Postek, Andras Vladar
Abstract: Semiconductor manufacturing is always looking for more effective ways to monitor and control the manufacturing process. Helium Ion Microscopy (HIM) presents a new approach to process monitoring which has several potential advantages over the traditio ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824597



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