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Author: michael postek

Displaying records 31 to 40 of 217 records.
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31. Simulated SEM Images for Resolution Measurement
Published: 7/30/2008
Authors: Petr Cizmar, Andras Vladar, Bin Ming, Michael T Postek
Abstract: Resolution is a key performance metric, which often defines the quality of a scanning electron microscope (SEM). Traditionally, there is the subjective measurement of the distance between two points on special ''resolution'' samples and there are sev ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823050

32. The Potentials of Helium Ion Microscopy for Semiconductor Process Metrology
Published: 2/6/2008
Authors: Michael T Postek, Andras Vladar
Abstract: Semiconductor manufacturing is always looking for more effective ways to monitor and control the manufacturing process. Helium Ion Microscopy (HIM) presents a new approach to process monitoring which has several potential advantages over the traditio ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824597

33. Instrumentation, Metrology, and Standards for Nanomanufacturing
Published: 9/10/2007
Authors: Michael T Postek, Andras Vladar, John A Kramar, L A Stern, John Notte, Sean McVey
Abstract: Helium Ion Microscopy (HIM) is a new, potentially disruptive technology for nanotechnology and nanomanufacturing. This methodology presents a potentially revolutionary approach to imaging and measurements which has several potential advantages over t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824601

34. Instrumentation, Metrology, and Standards: Key Elements for the Future of Nanomanufacturing
Published: 9/1/2007
Authors: Michael T Postek, Kevin W Lyons
Abstract: Nanomanufacturing is the essential bridge between the discoveries of nanoscience and real world nanotech products and is the vehicle by which the Nation and the World will realize the promise of major technological innovation across a spectrum of pro ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823237

35. The Helium Ion Microscope: A New Tool for Nanotechnology and  Nanomanufacturing
Published: 9/1/2007
Authors: Michael T Postek, Andras Vladar, John A Kramar, L A Stern, John Notte, Sean McVey
Abstract: Helium Ion Microscopy (HIM) is a new, potentially disruptive technology for nanotechnology and nanomanufacturing. This methodology presents a potentially revolutionary approach to imaging and measurements which has several potential advantages over t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823238

36. Helium Ion Microscopy: A New Technique for Semiconductor Metrology and Nanotechnology
Published: 1/1/2007
Authors: Michael T Postek, Andras Vladar, John A Kramar, L A Stern, John Notte, Sean McVey
Abstract: The Helium Ion Microscope (HIM) offers a new, potentially disruptive technique for nano-metrology. This methodology presents an approach to measurements for nanotechnology and nano-manufacturing which has several potential advantages over the traditi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823231

37. The NIST Advance Measurement Laboratory: At the Leading Edge of Measurement Science and Technology
Published: 9/20/2006
Authors: C Londono, John Russell Lawall, Michael T Postek, Jack A Stone Jr, John Richard Stoup
Abstract: The National Institute of Standards and Technology as the U.S. National Metrology Institute has the fundamental responsibility to continuously push the limits of measurement science (metrology) to promote U.S. innovation and industrial competitivenes ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=200115

38. Accomplishments in Nanotechnology
Series: Special Publication (NIST SP)
Report Number: 1052
Published: 8/1/2006
Authors: Michael T Postek, Joseph J Kopanski, David A Wollman
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32512

39. National Nanotechnology Initiative Interagency Workshop on Instrumentation and Metrology for Nanotechnology Grand Challenge Report
Published: 8/1/2006
Authors: Michael T Postek, Richard R Cavanagh, C M Allocca, Douglas T Smith, Robert D Shull, David A Wollman, David G Seiler, Stephen Knight, A Diebold, Richard M Silver, Charles W Clark, Kevin W Lyons, James R Whetstone, Ronald F Boisvert
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822247

40. The NIST Advanced Measurement Laboratory: at the Leading Edge of Measurement Science and Technology
Published: 8/1/2006
Authors: C Londono, John Russell Lawall, Michael T Postek, Jack A Stone Jr, John Richard Stoup
Abstract: The National Institute of Standards and Technology as the U.S. National Metrology Institute has the fundamental responsibility to continuously push the limits of measurement science (metrology) to promote U.S. innovation and industrial competitivenes ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824616