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You searched on: Author: michael postek

Displaying records 31 to 40 of 232 records.
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31. Reference Material (RM) 8820: A Versatile New NIST Standard for Nanometrology
Published: 7/19/2010
Authors: Michael T Postek, Andras Vladar, William J. Keery, Michael R Bishop, Benjamin Bunday, John Allgair
Abstract: A new multipurpose instrument calibration standard has been released by NIST. This standard was developed to be used primarily for X and Y scale (or magnifi cation) calibrations of scanning electron microscopes from less than 10 times magnification t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=905034

32. Precision Engineering Division 2009 Program Technical Accomplishments
Series: OTHER
Published: 2/19/2010
Author: Michael T Postek
Abstract: The Precision Engineering Division (PED) is one of five divisions of the Manufacturing Engineering Laboratory (MEL)at the National Institute of Standards and Technology (NIST). PED provides the United States with the foundation for dimensional measur ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904811

33. Sample Preparation Protocols for Realization of Reproducible Characterization of Single-walled Carbon Nanotubes
Published: 12/1/2009
Authors: Angela R Hight Walker, Jeffrey A Fagan, Stephanie A Hooker, Michael T Postek, Stephen A Wise, Andras Vladar, Rolf Louis Zeisler
Abstract: Harmonized sample pre-treatment is an integral first step in ensuring metrological quality of measurements as regards repeatability, inter-laboratory reproducibility and commutability. The development of standard preparation methods for SWCNT sample ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901229

34. Nanometrology Solutions Using an Ultra-High Resolution In-lens SEM
Published: 9/1/2009
Authors: Michael T Postek, Andras Vladar, John S Villarrubia
Abstract: The imaging and measurement of nanostructures such as particles, carbon nanotubes, and quantum dots have placed new demands on the high resolution imaging capabilities of scanning electron microscopes. A barrier to accurate dimensional metrology is t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902308

35. Recent Progress in Understanding the Imaging and Metrology using the Helium Ion Microscope
Published: 9/1/2009
Authors: Michael T Postek, Andras Vladar, Bin Ming
Abstract: Nanotechnology is pushing imaging and measurement instrument technology to high levels of required performance. As this continues, new barriers confronting innovation in this field are encountered. Particle beam instrument resolution remains one of t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902762

36. A Decade of Commitment from the NIST Manufacturing Engineering Laboratory to Nanomanufacturing and Nanometrology
Published: 8/27/2009
Authors: Kevin W Lyons, Michael T Postek
Abstract: Advanced research in nanomanufacturing technologies and processes has continued at an accelerating rate over the past decade. Profitable niche applications such as the use of carbon nanotubes for improving battery performance and nanoparticle-enhance ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902648

37. Optimization of Accurate SEM Imaging by Use of Artificial Images
Published: 5/22/2009
Authors: Petr Cizmar, Andras Vladar, Michael T Postek
Abstract: Today the vast majority of the scanning electron microscopes (SEMs) are incapable of taking repeatable and accurate images at high magnifications. Geometric distortions are common, so are drift, vibration, and problems related to disturbing electro-m ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902635

38. Instrumentation, Metrology, and Standards, Three Keys to the Nanotech Kingdom
Published: 5/1/2009
Authors: Michael T Postek, Kevin W Lyons
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824732

39. On the Sub-Nanometer Resolution of Scanning Electron and Helium Ion Microscopes
Published: 3/1/2009
Authors: Andras Vladar, Michael T Postek, Bin Ming
Abstract: All forms of microscopy are being pushed to the limit by nanotechnology. Hence, there is a relentless quest to achieve better and better resolution with various electron and ion microscopes and to monitor and maintain these instruments to achieve the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901833

40. On the Sub-Nanometer Resolution of Scanning Electron and Scanning Helium Ion Microscopes
Published: 3/1/2009
Authors: Michael T Postek, Andras Vladar, Bin Ming
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901569



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