NIST logo

Publications Portal

You searched on:
Author: michael postek

Displaying records 191 to 200 of 230 records.
Resort by: Date / Title


191. A Monte Carlo Model for SEM Linewidth Metrology
Published: 5/1/1994
Authors: J R. Lowney, Michael T Postek, Andras Vladar
Abstract: A scanning electron microscope (SEM) can be used to measure the dimensions of the microlithographic features of integrated circuits. However, without a good model of the electron-beam / specimen interaction, accurate edge location cannot be obtained. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820689

192. Critical Issues in Scanning Electron Microscope Metrology
Published: 1/1/1994
Author: Michael T Postek
Abstract: During the manufacturing of present-day integrated circuits, certain measurements must be made of the submicrometer structures composing the device with a high degree of repeatability. Optical microscopy, scanning electron microscopy, and the various ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820701

193. Electron Beam Interaction Modeling as Applied to X-Ray Lithography Mask SEM Linewidth Metrology
Published: 1/1/1994
Authors: Michael T Postek, J R. Lowney, Andras Vladar, William J. Keery, Egon Marx, Robert D. Larrabee
Abstract: This work provides an approach to improved x?ray mask linewidth metrology and a more precise edge location algorithm for measurement of feature sizes on x?ray masks in commercial instrumentation. The transmitted electron detection mode is also useful ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820704

194. Scanning Electron Microscope Metrology
Published: 1/1/1994
Author: Michael T Postek
Abstract: During the manufacturing of present-day integrated circuits, certain measurements must be made of the submicrometer structures composing the device with a high degree of precision. Optical microscopy, scanning electron microscopy and the various form ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820702

195. Traceable Standards for Scanning Electron Microscopy
Published: 1/1/1994
Author: Michael T Postek
Abstract: The emphasis on International Standards Organization (ISO) certification of laboratories has resulted in a renewed interest in NIST traceable standards for scanning electron microscopy (SEM). Under ISO certification, it is mandatory to calibrate and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820996

196. X-Ray Mask Metrology: The Development of Linewidth Standards for X-Ray Lithography
Published: 12/31/1993
Authors: Michael T Postek, J R. Lowney, Andras Vladar, William J. Keery, E Marx, Robert D. Larrabee
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=15044

197. Comparisons of Measured Linewidths of Sub-Micrometer Lines Using Optical, Electrical, and SEM Metrologies
Published: 9/1/1993
Authors: Richard A Allen, P. Troccolo, James C. OwenI, James Edward Potzick, Michael T Postek, Loren W. Linholm
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=29951

198. X-Ray Lithography Mask Metrology: Use of Transmitted Electrons in an SEM for Linewidth Measurement
Series: Journal of Research (NIST JRES)
Published: 8/1/1993
Authors: Michael T Postek, J R. Lowney, Andras Vladar, William J. Keery, E Marx, Robert D. Larrabee
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=10599

199. Cryopump Vibration Isolation System for an SEM
Published: 12/31/1991
Authors: Michael T Postek, William J. Keery
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=4348

200. Microchannel-Plate Detection Systems for Low Accelerating Voltage SEM
Published: 12/31/1991
Author: Michael T Postek
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=4008



Search NIST-wide:


(Search abstract and keywords)


Last Name:
First Name:







Special Publications:

Looking for a NIST Special Publication (NIST SP Series)? Place the series number and dash in the report number field (Example: 800-) and begin your search.

  • SP 250-XX: Calibration Services
  • SP 260-XX: Standard Reference Materials
  • SP 300-XX: Precision Measurement and Calibration
  • SP 400-XX: Semiconductor Measurement Technology
  • SP 480-XX: Law Enforcement Technology
  • SP 500-XX: Computer Systems Technology
  • SP 700-XX: Industrial Measurement Series
  • SP 800-XX: Computer Security Series
  • SP 823-XX: Integrated Services Digital Network Series