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You searched on: Author: michael postek

Displaying records 191 to 200 of 233 records.
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191. National Institute of Standards and Technology (NIST) J93 Project Interim Report
Published: 12/22/1994
Authors: Michael T Postek, James Edward Potzick, J Schneir, T Mcwaid, Robert D. Larrabee
Abstract: Unavailable.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820705

192. Parameters Characterizing a Critical Dimension Measurement
Published: 12/1/1994
Authors: Robert D. Larrabee, Michael T Postek
Abstract: There are a number of parameters used to characterize a measurement result for the purposes of specifying its value for the intended purpose. Precision (variability) and accuracy (correctness) are two of the more often used parameters and, like many ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820687

193. National Institute of Standards and Technology (NIST) J93 Project Proposal Report
Published: 6/15/1994
Authors: Michael T Postek, Robert D. Larrabee, L Linholm, James Edward Potzick, J Schneir, T Mcwaid, Michael W Cresswell, Richard A Allen, E Clayton Teague
Abstract: Unavailable.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820703

194. A Monte Carlo Model for SEM Linewidth Metrology
Published: 5/1/1994
Authors: J R. Lowney, Michael T Postek, Andras Vladar
Abstract: A scanning electron microscope (SEM) can be used to measure the dimensions of the microlithographic features of integrated circuits. However, without a good model of the electron-beam / specimen interaction, accurate edge location cannot be obtained. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820689

195. Critical Issues in Scanning Electron Microscope Metrology
Published: 1/1/1994
Author: Michael T Postek
Abstract: During the manufacturing of present-day integrated circuits, certain measurements must be made of the submicrometer structures composing the device with a high degree of repeatability. Optical microscopy, scanning electron microscopy, and the various ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820701

196. Electron Beam Interaction Modeling as Applied to X-Ray Lithography Mask SEM Linewidth Metrology
Published: 1/1/1994
Authors: Michael T Postek, J R. Lowney, Andras Vladar, William J. Keery, Egon Marx, Robert D. Larrabee
Abstract: This work provides an approach to improved x?ray mask linewidth metrology and a more precise edge location algorithm for measurement of feature sizes on x?ray masks in commercial instrumentation. The transmitted electron detection mode is also useful ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820704

197. Scanning Electron Microscope Metrology
Published: 1/1/1994
Author: Michael T Postek
Abstract: During the manufacturing of present-day integrated circuits, certain measurements must be made of the submicrometer structures composing the device with a high degree of precision. Optical microscopy, scanning electron microscopy and the various form ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820702

198. Traceable Standards for Scanning Electron Microscopy
Published: 1/1/1994
Author: Michael T Postek
Abstract: The emphasis on International Standards Organization (ISO) certification of laboratories has resulted in a renewed interest in NIST traceable standards for scanning electron microscopy (SEM). Under ISO certification, it is mandatory to calibrate and ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820996

199. X-Ray Mask Metrology: The Development of Linewidth Standards for X-Ray Lithography
Published: 12/31/1993
Authors: Michael T Postek, J R. Lowney, Andras Vladar, William J. Keery, E Marx, Robert D. Larrabee
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=15044

200. Comparisons of Measured Linewidths of Sub-Micrometer Lines Using Optical, Electrical, and SEM Metrologies
Published: 9/1/1993
Authors: Richard A Allen, P. Troccolo, James C. OwenI, James Edward Potzick, Michael T Postek, Loren W. Linholm
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=29951



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