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Displaying records 11 to 20 of 231 records.
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11. Nanomanufacturing concerns about Measurements made in the SEM I: Imaging and its Measurement
Published: 11/1/2013
Authors: Michael T Postek, Andras Vladar
Abstract: The high resolution of the SEM is especially useful for qualitative and quantitative applications for both nanotechnology and nanomanufacturing. But, should users be concerned about the imaging and measurements made with this instrument? Perhaps one ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914029

12. Production and Applications of Cellulose Nanomaterials
Published: 8/1/2013
Authors: Michael T Postek, Robert J Moon, Alan Rudie, Michael Bilodeau
Abstract: ,Production and Applications of Cellulosic NanomaterialsŠ was intended to help organize and highlight the wide range of research being conducted worldwide on the science and technology of cellulose nanomaterials. The format of this book consists of ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914189

13. Dimensional Metrology and Imaging of Cellulose Nanocrystals
Published: 6/14/2013
Authors: Michael T Postek, Andras Vladar
Abstract: Cellulose nanocrystals are one group of nanoparticles that have high potential economic value but, also present many basic research and manufacturing challenges. These challenges are not only in development of the fundamental processes needed for the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=914004

14. Nanoscale Reference Materials for Environmental, Health, and Safety Measurements: Needs, Gaps, and Opportunities
Published: 11/7/2012
Authors: Aleksandr B. Stefaniak, Vincent A Hackley, Gert Roebben, Kensei Ehara, Steve Hankin, Michael T Postek, Iseult Lynch, Wei-En Fu, Thomas P.J. Linsinger, Andreas Th?nemann
Abstract: There is a need to understand and manage potential risks posed to workers, the public, and the environment from exposure to engineered nanomaterials. In response, several organizations have developed lists of relevant nano-objects and of physico-che ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910519

15. Does Your SEM Really Tell the Truth?
Published: 8/1/2012
Authors: Michael T Postek, Andras Vladar
Abstract: The scanning electron microscope (SEM) has gone through a tremendous evolution to become a critical tool for many, diverse scientific and industrial applications. The high resolution of the SEM is especially useful for qualitative and quantitative ap ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910663

16. Microscopy for STEM Educators
Published: 5/21/2012
Authors: Michael T Postek, Mary B Satterfield, Bradley N Damazo, Robert Gordon
Abstract: The future of our nation hinges on our ability to prepare our next generation to be innovators in science, technology, engineering and math (STEM). Excitement for STEM must begin at the earliest stages of our education process. Yet, today far too few ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910648

17. Can We Get 3D CD Metrology Right?
Published: 4/19/2012
Authors: Andras Vladar, John S Villarrubia, Michael T Postek, Petr Cizmar
Abstract: Our world is three-dimensional, so are the integrated circuits (ICs), they have always been. In the past, for a long time, we‰ve been very fortunate, because it was enough to measure the critical dimension (CD), the width of the resist line to keep I ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=911117

18. Contour Metrology using Critical Dimension Atomic Force Microscopy
Published: 4/9/2012
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Bin Ming, Michael T Postek
Abstract: The critical dimension atomic force microscope (CD-AFM), which is used as a reference instrument in lithography metrology, has been proposed as a supplemental instrument for contour measurement and verification. However, although data from CD-AFM is ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=910915

19. Strategies for Nanoscale Contour Metrology using Critical Dimension Atomic Force Microscopy
Published: 9/30/2011
Authors: Ndubuisi George Orji, Ronald G Dixson, Andras Vladar, Michael T Postek
Abstract: Contour metrology is one of the techniques used to verify optical proximity correction (OPC) in lithography models. The use of these methods, which are known as resolution enhancement techniques (RET), are necessitated by the continued decrease in f ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=909559

20. Real-Time Image Composition with Correction of Drift Distortion
Published: 9/20/2011
Authors: Petr Cizmar, Andras Vladar, Michael T Postek
Abstract: In this article, a new scanning electron microscopy (SEM) image composition technique is de- scribed, which can significantly reduce drift-distortion related image corruptions. Drift-distortion commonly causes blur and distortions in the SEM ima ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=903741



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