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Author: michael postek

Displaying records 181 to 190 of 229 records.
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181. Workshop Report 3: Edge Positions From Scanning Electron Microscope Signals by Comparing Models With Measure
Published: 8/6/1995
Authors: J R. Lowney, Michael T Postek, Andras Vladar
Abstract: There is a pressing need in the semiconductor industry to determine the dimensions of lithographically produced features on wafers and masks down to the l0?nm level of accuracy. Such measurements involve the accurate location of line edges, the subtr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820745

182. Performance of the Prototype NIST SRM 2090A SEM Magnification Standard in a Low-Acclerating Voltage SEM
Published: 5/22/1995
Authors: B Newell, Michael T Postek, J VanDerZiel
Abstract: A new NIST SEM magnification calibration standard has been fabricated and characterized in production prototype form. The SRM 2090A samples contain structures ranging in pitch from 3000 um to 0.2 um and are useful at both high and low accelerating vo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820751

183. Scanning Electron Microscopy at the National Institute of Standards and Technology
Published: 1/1/1995
Author: Michael T Postek
Abstract: An attitude has developed that the results of any SEM measurement arc absolutely true. If this were the case, there would be no need for standards and no metrological problems would exist in making submicrometer measurements. Multiple, basic errors a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820755

184. Workshop Report 1: Scanning Electron Microscope Metrology as Related to a Defined Edge Structure
Published: 1/1/1995
Authors: Michael T Postek, Andras Vladar, G Banke, T Reilly
Abstract: An accurate electron beam model is primary to the understanding of the SEM image. Several independently developed Monte Carlo models have been introduced for this purpose and a modeling round-robin has just been conducted to compare the results of th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820756

185. A Monte Carlo Model for SEM Linewidth Metrology
Published: 12/31/1994
Authors: J R. Lowney, Michael T Postek, Andras Vladar
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=1721

186. Electron Beam Interaction Modeling as Applied to X-Ray Lithography Mask SEM Linewidth Metrology
Published: 12/31/1994
Authors: Michael T Postek, J R. Lowney, Andras Vladar, William J. Keery, E Marx, Robert D. Larrabee
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=28049

187. National Institute of Standards and Technology (NIST) J93 Project Interim Report
Published: 12/22/1994
Authors: Michael T Postek, James Edward Potzick, J Schneir, T Mcwaid, Robert D. Larrabee
Abstract: Unavailable.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820705

188. Parameters Characterizing a Critical Dimension Measurement
Published: 12/1/1994
Authors: Robert D. Larrabee, Michael T Postek
Abstract: There are a number of parameters used to characterize a measurement result for the purposes of specifying its value for the intended purpose. Precision (variability) and accuracy (correctness) are two of the more often used parameters and, like many ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820687

189. National Institute of Standards and Technology (NIST) J93 Project Proposal Report
Published: 6/15/1994
Authors: Michael T Postek, Robert D. Larrabee, L Linholm, James Edward Potzick, J Schneir, T Mcwaid, Michael W Cresswell, Richard A Allen, E Clayton Teague
Abstract: Unavailable.
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820703

190. A Monte Carlo Model for SEM Linewidth Metrology
Published: 5/1/1994
Authors: J R. Lowney, Michael T Postek, Andras Vladar
Abstract: A scanning electron microscope (SEM) can be used to measure the dimensions of the microlithographic features of integrated circuits. However, without a good model of the electron-beam / specimen interaction, accurate edge location cannot be obtained. ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820689



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