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You searched on: Author: michael postek

Displaying records 181 to 190 of 233 records.
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181. Statistical Models for Estimating the Measurement of Pitch in Metrology Instruments
Published: 1/1/1996
Authors: Nien F Zhang, Michael T Postek, Robert D. Larrabee
Abstract: The measurement of pitch in metrology instruments is through to be a benign self-compensating function. In the course of issuing the new scanning electron microscope standard SRM 2090, a new algorithm for the measurement of pitch was developed. This ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820885

182. Fabrication Issues for the Prototype NIST SRM 2090A SEM Magnification Calibration Standard
Published: 11/1/1995
Authors: B Newell, Michael T Postek, J VanDerZiel
Abstract: A new National Institute of Standards and Technology scanning electron microscope magnification calibration standard has been fabricated and distributed in production prototype form. The SRM 2090A samples contain structures ranging in pitch from 3000 ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820750

183. Application of the Prototype NIST SRM 2090a SEM Magnification Standard in a Manufacturing Environment
Published: 9/1/1995
Authors: B Newell, Michael T Postek, J VanDerZiel
Abstract: The first NIST-traceable SEM magnification calibration standard designed to meet the particular needs of the micromanufacturing industry has been fabricated and characterized in production prototype form. The SRM 2090A samples contain structures rang ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820799

184. Report of Investigation: Reference Material 8090 - SEM Magnification Calibration Reference Material
Published: 8/9/1995
Authors: Michael T Postek, R Gettings
Abstract: Reference Material (RM) 8090 is intended primarily for use in calibrating the magnification scale of a scanning electron microscope (SEM) over a wide range of magnifications, from less than 100X to greater than 300,000X. RM 8090 contains structures i ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820806

185. Workshop Report 3: Edge Positions From Scanning Electron Microscope Signals by Comparing Models With Measure
Published: 8/6/1995
Authors: J R. Lowney, Michael T Postek, Andras Vladar
Abstract: There is a pressing need in the semiconductor industry to determine the dimensions of lithographically produced features on wafers and masks down to the l0?nm level of accuracy. Such measurements involve the accurate location of line edges, the subtr ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820745

186. Performance of the Prototype NIST SRM 2090A SEM Magnification Standard in a Low-Acclerating Voltage SEM
Published: 5/22/1995
Authors: B Newell, Michael T Postek, J VanDerZiel
Abstract: A new NIST SEM magnification calibration standard has been fabricated and characterized in production prototype form. The SRM 2090A samples contain structures ranging in pitch from 3000 um to 0.2 um and are useful at both high and low accelerating vo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820751

187. Scanning Electron Microscopy at the National Institute of Standards and Technology
Published: 1/1/1995
Author: Michael T Postek
Abstract: An attitude has developed that the results of any SEM measurement arc absolutely true. If this were the case, there would be no need for standards and no metrological problems would exist in making submicrometer measurements. Multiple, basic errors a ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820755

188. Workshop Report 1: Scanning Electron Microscope Metrology as Related to a Defined Edge Structure
Published: 1/1/1995
Authors: Michael T Postek, Andras Vladar, G Banke, T Reilly
Abstract: An accurate electron beam model is primary to the understanding of the SEM image. Several independently developed Monte Carlo models have been introduced for this purpose and a modeling round-robin has just been conducted to compare the results of th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820756

189. A Monte Carlo Model for SEM Linewidth Metrology
Published: 12/31/1994
Authors: J R. Lowney, Michael T Postek, Andras Vladar
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=1721

190. Electron Beam Interaction Modeling as Applied to X-Ray Lithography Mask SEM Linewidth Metrology
Published: 12/31/1994
Authors: Michael T Postek, J R. Lowney, Andras Vladar, William J. Keery, E Marx, Robert D. Larrabee
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=28049



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