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Author: william penzes
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1. Molecular Measuring Machine Design and Performance
Published: 1/1/2001
Authors: John A Kramar, Jay Shi Jun, William B. Penzes, Vincent P. Scheuerman, Fredric Scire, E Clayton Teague
Abstract: We have developed a metrology instrument called the Molecular Measuring Machine (M3) with the goal of performing two-dimensional point-to-point measurements with nanometer-level uncertainties over a 50 mm by 50 mm area. The scanning tunneling microsc ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821689

2. A New Method to Measure the Distance Between Graduation Lines on Graduate Scales
Published: 12/1/2000
Authors: William B. Penzes, Richard A Allen, Michael W Cresswell, Loren W. Linholm, E Clayton Teague
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=8085

3. Molecular Measuring Machine Design and Measurements
Published: 5/1/2000
Authors: John A Kramar, Jay Shi Jun, William B. Penzes, Fredric Scire, E Clayton Teague, John S Villarrubia
Abstract: We at the National Institute of Standards and Technology are building a metrology instrument called the Molecular Measuring Machine (M3) with the goal of performing nanometer-accuracy, two-dimensional, point-to-point measurements over a 50 mm by 50 m ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=821763

4. A New Method to Measure the Distance Between Graduation Lines on Graduate Scales
Published: 12/1/1999
Authors: William B. Penzes, Richard A Allen, Michael W Cresswell, Loren W. Linholm, E Clayton Teague
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=30330

5. A New Method to Measure the Distance Between Graduation Lines on Graduated Scales
Published: 12/1/1999
Authors: William B. Penzes, Robert Allen, Michael W Cresswell, L Linholm, E Clayton Teague
Abstract: Line scales are used throughout industry for a variety of applications. The most common is the stage micrometer, a small graduated glass scale for the calibration of optical instruments such as microscopes. However, stage micrometers are generally no ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820939

6. Grating Pitch Measurements With the Molecular Measuring Machine
Published: 11/1/1999
Authors: John A Kramar, Jay Shi Jun, William B. Penzes, Fredric Scire, E Clayton Teague, John S Villarrubia
Abstract: At the National Institute of Standards and Technology, we are building a metrology instrument called the Molecular Measuring Machine (M^3) with the goal of performing nanometer- accuracy two-dimensional feature placement measurements over a 50 mm by ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820932

7. Grating Pitch Measurements with the Molecular Measuring Machine
Published: 11/1/1999
Authors: John A Kramar, C Villarrubia, E Clayton Teague, W Scire, William B. Penzes
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820128

8. The NIST Length Scale Interferometer
Series: Journal of Research (NIST JRES)
Published: 7/23/1999
Authors: John S Beers, William B. Penzes
Abstract: The National Institute of Standards and Technology (NIST) interferometer for measuring graduated length scales has been in use since 1965. It was developed in response to the redefinition of the meter in 1960 from the prototype platinum-iridium bar t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823093

9. Toward Nanometer Accuracy Measurements
Published: 6/1/1999
Authors: John A Kramar, E Amatucci, David E. Gilsinn, Jay Shi Jun, William B. Penzes, Fredric Scire, E Clayton Teague, John S Villarrubia
Abstract: We at NIST are building a metrology instrument called the Molecular Measuring Machine (MMM) with the goal of performing 2D point-to-point measurements with one nanometer accuracy cover a 50 mm by 50 mm area. The instrument combines a scanning tunneli ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820933

10. Two-Dimensional Calibration Artifact and Measurement Methodology
Published: 6/1/1999
Authors: Richard M Silver, Theodore D Doiron, William B. Penzes, S Fox, Edward A Kornegay, S Rathjen, M Takac, D Owen
Abstract: In this paper, we describe our design and the manufacturing of a two-dimensional grid artifact of chrome on quartz on a 6 inch by 6 inch by .250 glass blank. The design has been agreed upon by a number of SEMI participants working on a two-dimensiona ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820948



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