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Author: william penzes

Displaying records 11 to 20 of 22 records.
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11. The NIST Length Scale Interferometer
Published: 5/1/1999
Authors: John S Beers, William B. Penzes
Abstract: The National Institute of Standards and Technology (NIST) interferometer for measuring graduated length scales has been in use since 1965. It was developed in response to the redefinition of the meter in 1960 from the prototype platinum-iridium bar t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820924

12. The Molecular Measuring Machine
Published: 1/1/1998
Authors: John A Kramar, E Gilsinn, E Amatucci, C Villarrubia, E Clayton Teague, W Scire, William B. Penzes
Abstract: To help meet the measurement needs of industries preparing to manufacture future generations of nanoelectronic devices and circuits, the National Institute of Standards and Technology (NIST) has designed and built an instrument¿called the Molecular ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820127

13. Hybrid Optical-Electrical Overlay Test Structure
Published: 5/1/1997
Authors: Michael W Cresswell, Richard A Allen, Loren W. Linholm, William F Guthrie, William B. Penzes, A. W. Gurnell
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=23722

14. Hybrid Optical-Electrical Overlay Test Structure
Published: 1/1/1997
Authors: Michael W Cresswell, Robert Allen, L Linholm, William F Guthrie, William B. Penzes, A Gurnell
Abstract: This paper describes the exploratory use of electrical test structures to enable the calibration of optical overlay instruments of the type used to monitor semiconductor-device fabrication processes. Such optical instruments are known to be vulnerabl ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820834

15. A New Method to Measure the Distance Between Graduation Lines on Graduated Scales
Published: 12/31/1994
Authors: William B. Penzes, Richard A Allen, Michael W Cresswell, E Clayton Teague
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=28768

16. Electrical Test Structure for Overlay Metrology Referenced to Absolute Length Standards
Published: 12/31/1994
Authors: Michael W Cresswell, William B. Penzes, Richard A Allen, Loren W. Linholm, Colleen E. Hood, E Clayton Teague
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=27496

17. New Test Structure for Nanometer-Level Overlay and Feature-Placement Metrology
Published: 8/1/1994
Authors: Michael W Cresswell, Richard A Allen, Loren W. Linholm, Colleen E. Hood, William B. Penzes
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=10192

18. Electrical Test Structure for Overlay Metrology Referenced to Absolute Length Standards
Published: 5/1/1994
Authors: Michael W Cresswell, William B. Penzes, Robert Allen, L Linholm, C Ellenwood, E Clayton Teague
Abstract: This test structure is based on the voltage-dividing potentiometer principle and was originally replicated in a single lithography cycle to evaluate feature placement by a primary pattern generator. A new test structure has now been developed from th ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820676

19. A New Method to Measure the Distance Between Graduation Lines on Graduated Scales
Published: 1/1/1994
Authors: William B. Penzes, Robert Allen, Michael W Cresswell, L Linholm, E Clayton Teague
Abstract: Line scales are used throughout industry for a variety of applications. The most common is the stage micrometer, a small graduated glass scale for the calibration of optical instruments such as microscopes. However, stage micrometers are generally no ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=820698

20. Metrology Standards For Advanced Semiconductor Lithography Referenced to Atomic Spacings and Geometry
Published: 12/31/1993
Authors: E Clayton Teague, Loren W. Linholm, Michael W Cresswell, William B. Penzes, John A Kramar, Fredric Scire, John S Villarrubia, Jay Shi Jun
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=2653



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