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You searched on: Author: ndubuisi orji

Displaying records 41 to 50 of 60 records.
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41. Higher Order Tip Effects in CD-AFM Linewidth Measurements
Published: 1/1/2007
Authors: Ndubuisi George Orji, Ronald G Dixson
Abstract: In critical dimension Atomic force microscopy (CD-AFM), a source of uncertainty is the tip.  Measurements made using a CD-AFM tip show an apparent broadening of the width. Usually the results can be approximated if the tip-width is known. In add ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823201

42. Advanced Metrology Needs for Nanoelectronics Lithography
Published: 10/1/2006
Authors: Stephen Knight, Ronald Dixon, Ronald Leland Jones, Eric Lin, Ndubuisi G Orji, Richard M Silver, Andras Vladar, Wen-li Wu
Abstract: The semiconductor industry has exploited productivity improvements through aggressive feature size reduction for over four decades. While enormous effort has been expended in developing the optical lithography tools to print ever finer features, sign ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32439

43. Progress on Implementation of a CD-AFM Based Reference Measurement System
Published: 3/1/2006
Authors: Ndubuisi George Orji, Angela Martinez, Ronald G Dixson, J Allgair
Abstract: The National Institute of Standards and Technology (NIST) and SEMATECH are working to address traceability issues in semiconductor dimensional metrology.  In semiconductor manufacturing, many of the measurements made in the fab are not traceable ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823197

44. Traceable Atomic Force Microscope Dimensional Metrology at NIST
Published: 3/1/2006
Authors: Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, Michael W. Cresswell, Richard A Allen, William F Guthrie
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology.  There are two major instruments being used for traceable measurements at NIST.  The first is a cus ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823204

45. Nano- and Atomic-Scale Length Metrology
Published: 1/1/2006
Authors: Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Ndubuisi George Orji, Shaw C Feng, Michael W. Cresswell, Richard A Allen, William F Guthrie, Wei Chu
Abstract: We discuss nano-scale length metrology of linewidth, step height, and line edge roughness (LER). These properties are of growing importance to the function and specification of semiconductor devices as the dimensions of semiconductor devices shrink t ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823216

46. CD-AFM Reference Metrology at NIST and SEMATECH
Published: 2/27/2005
Authors: Ronald G Dixson, Jing Fu, Ndubuisi G Orji, William F Guthrie, Richard A Allen, Michael W. Cresswell
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=32108

47. Line Edge Roughness Metrology Using Atomic Force Microscopes
Published: 1/1/2005
Authors: Ndubuisi George Orji, Theodore Vincent Vorburger, Joseph Fu, Ronald G Dixson, C Nguyen, Jayaraman Raja
Abstract: Line edge roughness measurements using two types of atomic force microscopes and two types of tips are compared. Measurements were made on specially prepared samples with inscribed edge roughness of different amplitudes and wavelengths. The spatial w ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823182

48. Linewidth Measurement from a Stitched AFM Image
Published: 1/1/2005
Authors: Joseph Fu, Ronald G Dixson, Ndubuisi George Orji, Theodore Vincent Vorburger, C Nguyen
Abstract: Image stitching is a technique that combines two or more images to form one composite image, which provides a field of view that the originals cannot.  It has been widely used in photography, medical imaging, and computer vision and graphics. &n ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823186

49. Traceable Pico-Meter Level Step Height Metrology
Published: 12/1/2004
Authors: Ndubuisi George Orji, Ronald G Dixson, Joseph Fu, Theodore Vincent Vorburger
Abstract: The atomic force microscope (AFM) increasingly being used as a metrology tool in the semiconductor industry where the features measured are at the nanometer level and continue to decrease. Usually the height sensors of the AFM are calibrated using st ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822142

50. Determination of Optimal Parameters for CD-SEM Measurement of Line Edge Roughness
Published: 5/1/2004
Authors: B Bunday, M R Bishop, D Mccormack, John S Villarrubia, Andras Vladar, Theodore Vincent Vorburger, Ndubuisi George Orji, J Allgair
Abstract: The measurement of line-edge roughness (LER) has recently become a topic of concern in the litho-metrology community and the semiconductor industry as a whole. The Advanced Metrology Advisory Group (AMAG), a council composed of the chief metrologists ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=822538



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