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You searched on: Author: ndubuisi orji

Displaying records 41 to 50 of 64 records.
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41. TEM Calibration Methods for Critical Dimension Standards
Published: 4/5/2007
Authors: Ndubuisi George Orji, Ronald G Dixson, B Bunday, M R Bishop, Michael W. Cresswell, J Allgair
Abstract: One of the key challenges in critical dimension (CD) metrology is finding suitable calibration standards. Over the last few years there has been some interest in using features measured with transmission electron microscope (TEM) as primary standards ...

42. Progress on Implementation of a Reference Measurement System based on a Critical-dimension Atomic Force Microscope
Published: 4/1/2007
Authors: Ndubuisi George Orji, Angela Martinez, B Bunday, J Allgair, Theodore Vincent Vorburger

43. Application of Carbon Nanotube Probes in a Critical Dimension Atomic Force Microscope
Published: 3/1/2007
Authors: B C. Park, J Choi, S J Ahn, D H Kim, L Joon, Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, Theodore Vincent Vorburger
Abstract: The ever decreasing size of semiconductor features demands the advancement of critical dimension atomic force microscope (CD-AFM) technology, for which the fabrication and use of more ideal probes like carbon nanotubes (CNT) is of considerable intere ...

44. The Coming of Age of Tilt CD-SEM
Published: 3/1/2007
Authors: B Bunday, J Allgair, E Solecky, C Archie, Ndubuisi George Orji
Abstract: The need for 3D metrology is becoming more urgent to address critical gaps in metrology for both lithographic and etch processes. Current generation lithographic processing (ArF source, where lambda=193 nm) sometimes results in photoresist lines with ...

45. Higher Order Tip Effects in CD-AFM Linewidth Measurements
Published: 1/1/2007
Authors: Ndubuisi George Orji, Ronald G Dixson
Abstract: In critical dimension Atomic force microscopy (CD-AFM), a source of uncertainty is the tip.  Measurements made using a CD-AFM tip show an apparent broadening of the width. Usually the results can be approximated if the tip-width is known. In add ...

46. Advanced Metrology Needs for Nanoelectronics Lithography
Published: 10/1/2006
Authors: Stephen Knight, Ronald Dixon, Ronald Leland Jones, Eric Lin, Ndubuisi G Orji, Richard M Silver, Andras Vladar, Wen-li Wu
Abstract: The semiconductor industry has exploited productivity improvements through aggressive feature size reduction for over four decades. While enormous effort has been expended in developing the optical lithography tools to print ever finer features, sign ...

47. Progress on Implementation of a CD-AFM Based Reference Measurement System
Published: 3/1/2006
Authors: Ndubuisi George Orji, Angela Martinez, Ronald G Dixson, J Allgair
Abstract: The National Institute of Standards and Technology (NIST) and SEMATECH are working to address traceability issues in semiconductor dimensional metrology.  In semiconductor manufacturing, many of the measurements made in the fab are not traceable ...

48. Traceable Atomic Force Microscope Dimensional Metrology at NIST
Published: 3/1/2006
Authors: Ronald G Dixson, Ndubuisi George Orji, Joseph Fu, Michael W. Cresswell, Richard A Allen, William F Guthrie
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology.  There are two major instruments being used for traceable measurements at NIST.  The first is a cus ...

49. Nano- and Atomic-Scale Length Metrology
Published: 1/1/2006
Authors: Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Ndubuisi George Orji, Shaw C Feng, Michael W. Cresswell, Richard A Allen, William F Guthrie, Wei Chu
Abstract: We discuss nano-scale length metrology of linewidth, step height, and line edge roughness (LER). These properties are of growing importance to the function and specification of semiconductor devices as the dimensions of semiconductor devices shrink t ...

50. CD-AFM Reference Metrology at NIST and SEMATECH
Published: 2/27/2005
Authors: Ronald G Dixson, Jing Fu, Ndubuisi G Orji, William F Guthrie, Richard A Allen, Michael W. Cresswell

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