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Author: ndubuisi orji

Displaying records 21 to 30 of 56 records.
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21. Comparison of Measurement Techniques for Linewidth Metrology on Advanced Photomasks
Published: 2/19/2009
Authors: Stewart Smith, Andreas Tsiamis, Martin McCallum, Andrew Hourd, J Stevenson, Anthony Walton, Ronald G Dixson, Richard A Allen, James Edward Potzick, Michael W Cresswell, Ndubuisi George Orji
Abstract: This paper compares electrical, optical, and atomic force microscope (AFM) measurements of critical dimension (CD)made on a chrome on quartz photomask. Test structures suitable for direct, on-mask electrical probing have been measured using the above ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=901862

22. 2nd Annual Tri-National Workshop on Standards for Nanotechnology - (NIST presentations)
Published: 12/10/2008
Authors: Ronald G Dixson, Jon Robert Pratt, Vincent A Hackley, James Edward Potzick, Richard A Allen, Ndubuisi George Orji, Michael T Postek, Herbert S Bennett, Theodore Vincent Vorburger, Jeffrey A Fagan, Robert L. Watters
Abstract: A new era of cooperation between North American National Measurement Institutes (NMIs) was ushered by the National Research Council of Canada Institute for National Measurement Standards (NRC-INMS) on February 7, 2007 when the first Tri-National wo ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824641

23. Re-calibration of the NIST SRM 2059 Master Standard using Traceable Atomic Force Microscope Metrology
Published: 10/17/2008
Authors: Ronald G Dixson, James Edward Potzick, Ndubuisi George Orji
Abstract: The National Institute of Standards and Technology (NIST) has had a robust program in photomask dimensional metrology since the late 70s when the late Diana Nyyssonen and coworkers developed the first chrome-on-glass (COG) Standard Reference Materi ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824724

24. Accuracy Considerations for Critical Dimension Semiconductor Metrology
Published: 9/9/2008
Authors: Ronald G Dixson, Ndubuisi George Orji, B Bunday, J Allgair
Abstract: As the size of integrated circuit features continues to decrease, the accuracy of measurements becomes more important. Due to greater emphasis on precision rather than accuracy, many of the measurements made in semiconductor fabs are not traceable to ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824699

25. Through-focus Scanning and Scatterfield Optical Methods for Advanced Overlay Target Analysis
Published: 9/1/2008
Authors: Ravikiran (Ravikiran) Attota, Michael T. Stocker, Richard M Silver, Nathanael A Heckert, Hui Zhou, Richard J Kasica, Lei Chen, Ronald G Dixson, Ndubuisi George Orji, Bryan M Barnes, Peter Lipscomb
Abstract: In this paper we present overlay measurement techniques that use small overlay targets for advanced semiconductor applications. We employ two different optical methods to measure overlay using modified conventional optical microscope platforms. They ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=902294

26. Comparison of Measurement Techniques for Advanced Photomask Metrology
Published: 3/24/2008
Authors: Stewart Smith, Martin McCallum, Andrew Hourd, J. Tom Stevenson, Anthony J Walton, Ronald G Dixson, Richard A Allen, James Edward Potzick, Michael W Cresswell, Ndubuisi George Orji
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=904605

27. Towards Accurate Feature Shape Metrology
Published: 3/22/2008
Authors: Ndubuisi George Orji, Ronald G Dixson, B Bunday, J Allgair
Abstract: Over the last few years, the need for shape metrology for process control has increased. A key component of shape metrology is sidewall angle (SWA). However, few instruments measure SWA directly. The critical dimension atomic force microscope (CD-AFM ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824629

28. Nano- and Atomic-Scale Length Metrology
Published: 12/14/2007
Authors: Theodore Vincent Vorburger, Ronald G Dixson, Joseph Fu, Ndubuisi George Orji, Shaw C Feng, Michael W Cresswell, Richard A Allen, William F Guthrie, Wei Chu
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=824603

29. Photoresist Cross-sectioning with Negligible Damage using a Dual-beam FIB-SEM: A High Throughput Method for Profile Imaging
Published: 11/1/2007
Authors: James Clarke, Martin Schmidt, Ndubuisi George Orji
Abstract: Imaging of photoresist cross sections in a focused ion beam (FIB)-scanning electron microscope (SEM) is demonstrated with negligible damage. An in situ chromium sputtering technique is used to deposit metal on the site of interest, replacing the co ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823232

30. Photomask Applications of Traceable Atomic Force Microscope Dimensional Metrology at NIST
Published: 10/1/2007
Authors: Ronald G Dixson, Ndubuisi George Orji, James Edward Potzick, Joseph Fu, Michael W Cresswell, Richard A Allen, S J Smith, Anthony J Walton
Abstract: The National Institute of Standards and Technology (NIST) has a multifaceted program in AFM dimensional metrology.  Two major instruments are being used for traceable measurements.  The first is a custom in-house metrology AFM, called the c ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=823242



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