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Author: james olthoff

Displaying records 11 to 20 of 133 records.
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11. Comparison of the Identities, Fluxes, and Energies of Ions Formed in High Density Fluorocarbon Discharges
Published: 1/1/2001
Authors: Amanda N Goyettes, Yicheng Wang, James K Olthoff
Abstract: Positive ion bombardment plays an essential role in plasma processing, influencing etch rates, materials selectivity and etching profiles. Experimental determination of ion identities and energies in processing plasmas provides complementary data nec ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=2759

12. Electron Attachment Cross Sections and Negative Ion States of SF6
Published: 1/1/2001
Authors: Loucas G. Christophorou, James K Olthoff
Abstract: A comprehensive and critical assessment of published data on the total, dissociative, and nondissociative electron attachment cross sections for SF^d6^ allowed us to recommend or suggest room temperature values for these cross sections over an energy ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=11326

13. Electron Interactions with c-C^d4^F^d8^
Series: J. Phys. & Chem. Ref. Data (JPCRD)
Published: 1/1/2001
Authors: Loucas G. Christophorou, James K Olthoff
Abstract: The limited electron collision cross-section and transport-coefficient data for the plasma processing gas perfluorocyclobutane (c-C^d4^F^d8^) are synthesized, assessed, and discussed. These include cross sections for total electron scattering, differ ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=27617

14. Ion Fluxes and Energies in Inductively Coupled Radio-Frequency Discharges Containing C^d2^F^d6^ and c-C^d4^F^d8^
Published: 11/1/2000
Authors: Yicheng Wang, Martin Misakian, Amanda N Goyettes, James K Olthoff
Abstract: We report ion energy distributions (IEDs), relative ion intensities, and absolute total ion current densities at the grounded electrode of an inductively coupled Gaseous Electronics Conference radio-frequency (rf) reference cell for discharges gener ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=773

15. Ion fluxes and Energies in Inductively Coupled Radio-Frequency Discharges Containing C2F6 and c-C4F8
Published: 11/1/2000
Authors: Amanda N Goyettes, Yicheng Wang, Martin Misakian, James K Olthoff
Abstract: Measurements of ion energy distributions relative ion intensities, and absolute total ion current densities were made at the grounded electrode of an inductively coupled Gaseous Electronics Conference (GEC) radio-frequency reference cell for discha ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=16166

16. Electron Interactions with Excited Atoms and Molecules
Published: 10/1/2000
Authors: Loucas G. Christophorou, James K Olthoff
Abstract: Elastic, inelastic, and superelastic scattering of electrons by and electron-impact ionization of excited atoms are reviewed and discussed and the role of the electric dipole polarizabilty in the interaction of slow electrons with excited atoms is in ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=21076

17. Electron Collision Data for Plasma-Processing Gases
Published: 10/1/2000
Authors: Loucas G. Christophorou, James K Olthoff
Abstract: Low-temperature plasma applications require detailed understanding of the physical and chemical processes occurring in the plasmas themselves. For instance, as the push for smaller feature sizes and higher quality devices in the semiconductor indu ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=7872

18. Electron Interactions with SF^d6^
Published: 9/1/2000
Authors: Loucas G. Christophorou, James K Olthoff
Abstract: We have comprehensively reviewed and critically assessed the state of knowledge on electron-interaction cross sections and electron-swarm parameters in SF^d6^. In this paper are presented our: (1) assessed data for the total electron scattering, elas ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=18072

19. Mass-resolved Studies of Positive Ions in High Density Plasmas Generated in CHF3, C2F6, and CH2FCF3 and Their Mixtures with Ar
Published: 9/1/2000
Authors: Yicheng Wang, Amanda N Goyettes, Martin Misakian, James K Olthoff
Abstract: We have determined the relative abundances and energy distributions of positive ions in high density plasmas generated in CHF^d3^, C^d2^F^d6^ and CH^d2^FCF^d3^ and their mixtures with Ar using an ion energy analyzer-mass spectrometer appended to the ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=11119

20. Inductively Coupled Plasmas in Low Global Warming Potential Gases
Published: 8/1/2000
Authors: Amanda N Goyettes, Yicheng Wang, James K Olthoff
Abstract: Many high density discharges used in microelectronics fabrication use fluorocarbon gases with coincidentally high global-warming potentials (GWPs). We have determined the identities, fluxes, and energy distributions of ions produced in high density d ...
http://www.nist.gov/manuscript-publication-search.cfm?pub_id=29982



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